JPS5648029A - Electron gun - Google Patents

Electron gun

Info

Publication number
JPS5648029A
JPS5648029A JP12368779A JP12368779A JPS5648029A JP S5648029 A JPS5648029 A JP S5648029A JP 12368779 A JP12368779 A JP 12368779A JP 12368779 A JP12368779 A JP 12368779A JP S5648029 A JPS5648029 A JP S5648029A
Authority
JP
Japan
Prior art keywords
face
electron beam
single crystal
appear
chip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12368779A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0130247B2 (enrdf_load_stackoverflow
Inventor
Tadahiro Takigawa
Isao Sasaki
Kakuki Motoyama
Takashi Meguro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Shibaura Machine Co Ltd
Original Assignee
Toshiba Corp
Toshiba Machine Co Ltd
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Toshiba Machine Co Ltd, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP12368779A priority Critical patent/JPS5648029A/ja
Publication of JPS5648029A publication Critical patent/JPS5648029A/ja
Publication of JPH0130247B2 publication Critical patent/JPH0130247B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/13—Solid thermionic cathodes
    • H01J1/15—Cathodes heated directly by an electric current

Landscapes

  • Solid Thermionic Cathode (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
JP12368779A 1979-09-26 1979-09-26 Electron gun Granted JPS5648029A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12368779A JPS5648029A (en) 1979-09-26 1979-09-26 Electron gun

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12368779A JPS5648029A (en) 1979-09-26 1979-09-26 Electron gun

Publications (2)

Publication Number Publication Date
JPS5648029A true JPS5648029A (en) 1981-05-01
JPH0130247B2 JPH0130247B2 (enrdf_load_stackoverflow) 1989-06-19

Family

ID=14866828

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12368779A Granted JPS5648029A (en) 1979-09-26 1979-09-26 Electron gun

Country Status (1)

Country Link
JP (1) JPS5648029A (enrdf_load_stackoverflow)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5686331U (enrdf_load_stackoverflow) * 1979-12-10 1981-07-10
JPS5693244A (en) * 1979-12-26 1981-07-28 Toshiba Corp Electron gun
JPS57196444A (en) * 1981-05-26 1982-12-02 Ibm Electron beam emission device
JPS57205935A (en) * 1981-06-12 1982-12-17 Toshiba Corp Electron gun
JPS5818833A (ja) * 1981-07-27 1983-02-03 Denki Kagaku Kogyo Kk 高密度電子ビ−ムの低温発生方法及びその装置
JPS58223323A (ja) * 1982-06-22 1983-12-24 Toshiba Corp 電子ビ−ム描画装置
JPH10106926A (ja) * 1996-10-01 1998-04-24 Nikon Corp 荷電粒子線リソグラフィ装置、荷電粒子線リソグラフィ装置の評価方法およびパターン形成方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5299761A (en) * 1976-02-18 1977-08-22 Hitachi Ltd Thermion radiation cathode

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5299761A (en) * 1976-02-18 1977-08-22 Hitachi Ltd Thermion radiation cathode

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5686331U (enrdf_load_stackoverflow) * 1979-12-10 1981-07-10
JPS5693244A (en) * 1979-12-26 1981-07-28 Toshiba Corp Electron gun
JPS57196444A (en) * 1981-05-26 1982-12-02 Ibm Electron beam emission device
JPS57205935A (en) * 1981-06-12 1982-12-17 Toshiba Corp Electron gun
JPS5818833A (ja) * 1981-07-27 1983-02-03 Denki Kagaku Kogyo Kk 高密度電子ビ−ムの低温発生方法及びその装置
JPS58223323A (ja) * 1982-06-22 1983-12-24 Toshiba Corp 電子ビ−ム描画装置
JPH10106926A (ja) * 1996-10-01 1998-04-24 Nikon Corp 荷電粒子線リソグラフィ装置、荷電粒子線リソグラフィ装置の評価方法およびパターン形成方法

Also Published As

Publication number Publication date
JPH0130247B2 (enrdf_load_stackoverflow) 1989-06-19

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