JPS5647403A - Method of forming multilayered thin film of high polymer - Google Patents

Method of forming multilayered thin film of high polymer

Info

Publication number
JPS5647403A
JPS5647403A JP12264079A JP12264079A JPS5647403A JP S5647403 A JPS5647403 A JP S5647403A JP 12264079 A JP12264079 A JP 12264079A JP 12264079 A JP12264079 A JP 12264079A JP S5647403 A JPS5647403 A JP S5647403A
Authority
JP
Japan
Prior art keywords
plasma
thin film
layer
rare gas
monomer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12264079A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0248563B2 (enrdf_load_stackoverflow
Inventor
Kenji Yanagihara
Keikichi Yanagii
Teizo Kotani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP12264079A priority Critical patent/JPS5647403A/ja
Publication of JPS5647403A publication Critical patent/JPS5647403A/ja
Publication of JPH0248563B2 publication Critical patent/JPH0248563B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Polymerisation Methods In General (AREA)
JP12264079A 1979-09-26 1979-09-26 Method of forming multilayered thin film of high polymer Granted JPS5647403A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12264079A JPS5647403A (en) 1979-09-26 1979-09-26 Method of forming multilayered thin film of high polymer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12264079A JPS5647403A (en) 1979-09-26 1979-09-26 Method of forming multilayered thin film of high polymer

Publications (2)

Publication Number Publication Date
JPS5647403A true JPS5647403A (en) 1981-04-30
JPH0248563B2 JPH0248563B2 (enrdf_load_stackoverflow) 1990-10-25

Family

ID=14840965

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12264079A Granted JPS5647403A (en) 1979-09-26 1979-09-26 Method of forming multilayered thin film of high polymer

Country Status (1)

Country Link
JP (1) JPS5647403A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63112738A (ja) * 1986-10-31 1988-05-17 尾池工業株式会社 超耐熱金銀糸

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5347398A (en) * 1976-10-13 1978-04-27 Du Pont Selective recovery process for metallic chloride from gas effusing material
JPS5449599A (en) * 1977-09-27 1979-04-18 Toshiba Corp High molecular piezo-electric body and method of fabricating the same

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5347398A (en) * 1976-10-13 1978-04-27 Du Pont Selective recovery process for metallic chloride from gas effusing material
JPS5449599A (en) * 1977-09-27 1979-04-18 Toshiba Corp High molecular piezo-electric body and method of fabricating the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63112738A (ja) * 1986-10-31 1988-05-17 尾池工業株式会社 超耐熱金銀糸

Also Published As

Publication number Publication date
JPH0248563B2 (enrdf_load_stackoverflow) 1990-10-25

Similar Documents

Publication Publication Date Title
KR930021814A (ko) 연속 박막 형성방법
JPS55129345A (en) Electron beam plate making method by vapor phase film formation and vapor phase development
GB2155862A (en) Plasma surface processing
JPS55154582A (en) Gas plasma etching method
US4588641A (en) Three-step plasma treatment of copper foils to enhance their laminate adhesion
JPS56133884A (en) Manufacture of photoelectric transducer
JPS5647413A (en) Production of cyclopentadiene resin
JPS5647403A (en) Method of forming multilayered thin film of high polymer
JPS56123377A (en) Plasma cleaning and etching method
Tamano et al. Vacuum lithography—A completely dry lithography using plasma processing
JPS56163127A (en) Treatment of polymer
JPS56147830A (en) Formation of hard coating film
JPS5647414A (en) Production of polyvinylidene chloride latex
JPS5730528A (en) Vapor-separating member
Yasuda Formation of polymeric materials by a nonpolymerization process: Glow discharge polymerization
JPS57150154A (en) Manufacture for information recording body
JPS61159426A (ja) プラズマ重合体膜の形成方法
JPS5595327A (en) Reactive sputter-etching
JPS57195754A (en) Continuous vacuum treatment apparatus
JPS5783034A (en) Method for taper etching
AI et al. Thin polymer films synthesized by low frequency glow discharge with applications to electronics and microelectronics
JPS5511167A (en) Dry etching method
JPS61121440A (ja) ドライエツチング方法
JPS5731140A (en) Etching method by reactive ion
JPS5785821A (en) Production of high-molecular semiconductive film