JPS5647403A - Method of forming multilayered thin film of high polymer - Google Patents

Method of forming multilayered thin film of high polymer

Info

Publication number
JPS5647403A
JPS5647403A JP12264079A JP12264079A JPS5647403A JP S5647403 A JPS5647403 A JP S5647403A JP 12264079 A JP12264079 A JP 12264079A JP 12264079 A JP12264079 A JP 12264079A JP S5647403 A JPS5647403 A JP S5647403A
Authority
JP
Japan
Prior art keywords
plasma
thin film
layer
rare gas
monomer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12264079A
Other languages
Japanese (ja)
Other versions
JPH0248563B2 (en
Inventor
Kenji Yanagihara
Keikichi Yanagii
Teizo Kotani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP12264079A priority Critical patent/JPS5647403A/en
Publication of JPS5647403A publication Critical patent/JPS5647403A/en
Publication of JPH0248563B2 publication Critical patent/JPH0248563B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Polymerisation Methods In General (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)

Abstract

PURPOSE: The plasma polymerizations of different kinds of monomers are effected in a plasma reactor in sequence to form polymer layers of desired film thickness on the solid surface, whereby the titled thin film is formed that is used to protect semiconductors because of its high peeling resistance due to chemical linkages with each other.
CONSTITUTION: The first plasma-polymerizable monomer such as benzene is introduced into the plasma reactor 12 equipped with the coil 4 for exciting plasma that is connected to high-frequency power source 3 from monomer bomb 10 through inlet 1 at a certain flow rate. At the same time, a rare gas such as argon is introduced from a rare gas bomb 11 through inlet 2 at a prescribed flow rate. Then, plasma is excited to form the first layer of the plasma polymerization film on the surface of the substrate. Subsequently, the second monomer such as allylamine and a rare gas are introduced to form the second layer so that the objective thin film is obtained with thickness of less than 1,000Å in each layer.
COPYRIGHT: (C)1981,JPO&Japio
JP12264079A 1979-09-26 1979-09-26 Method of forming multilayered thin film of high polymer Granted JPS5647403A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12264079A JPS5647403A (en) 1979-09-26 1979-09-26 Method of forming multilayered thin film of high polymer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12264079A JPS5647403A (en) 1979-09-26 1979-09-26 Method of forming multilayered thin film of high polymer

Publications (2)

Publication Number Publication Date
JPS5647403A true JPS5647403A (en) 1981-04-30
JPH0248563B2 JPH0248563B2 (en) 1990-10-25

Family

ID=14840965

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12264079A Granted JPS5647403A (en) 1979-09-26 1979-09-26 Method of forming multilayered thin film of high polymer

Country Status (1)

Country Link
JP (1) JPS5647403A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63112738A (en) * 1986-10-31 1988-05-17 尾池工業株式会社 Highly heat resistant tinsel yarn

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5347398A (en) * 1976-10-13 1978-04-27 Du Pont Selective recovery process for metallic chloride from gas effusing material
JPS5449599A (en) * 1977-09-27 1979-04-18 Toshiba Corp High molecular piezo-electric body and method of fabricating the same

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5347398A (en) * 1976-10-13 1978-04-27 Du Pont Selective recovery process for metallic chloride from gas effusing material
JPS5449599A (en) * 1977-09-27 1979-04-18 Toshiba Corp High molecular piezo-electric body and method of fabricating the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63112738A (en) * 1986-10-31 1988-05-17 尾池工業株式会社 Highly heat resistant tinsel yarn

Also Published As

Publication number Publication date
JPH0248563B2 (en) 1990-10-25

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