JPS5630729A - Formation of thin film pattern - Google Patents
Formation of thin film patternInfo
- Publication number
- JPS5630729A JPS5630729A JP10697479A JP10697479A JPS5630729A JP S5630729 A JPS5630729 A JP S5630729A JP 10697479 A JP10697479 A JP 10697479A JP 10697479 A JP10697479 A JP 10697479A JP S5630729 A JPS5630729 A JP S5630729A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- film
- pattern
- sputter
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title abstract 10
- 230000015572 biosynthetic process Effects 0.000 title abstract 2
- 239000010408 film Substances 0.000 abstract 7
- 238000000034 method Methods 0.000 abstract 6
- 229920002120 photoresistant polymer Polymers 0.000 abstract 3
- 238000000992 sputter etching Methods 0.000 abstract 3
- 238000004519 manufacturing process Methods 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 238000004299 exfoliation Methods 0.000 abstract 1
- 230000000630 rising effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10697479A JPS5630729A (en) | 1979-08-22 | 1979-08-22 | Formation of thin film pattern |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10697479A JPS5630729A (en) | 1979-08-22 | 1979-08-22 | Formation of thin film pattern |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5630729A true JPS5630729A (en) | 1981-03-27 |
Family
ID=14447257
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10697479A Pending JPS5630729A (en) | 1979-08-22 | 1979-08-22 | Formation of thin film pattern |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5630729A (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57201020A (en) * | 1981-06-05 | 1982-12-09 | Hitachi Ltd | Reactive sputter etching method |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4983764A (ja) * | 1972-12-15 | 1974-08-12 |
-
1979
- 1979-08-22 JP JP10697479A patent/JPS5630729A/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4983764A (ja) * | 1972-12-15 | 1974-08-12 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57201020A (en) * | 1981-06-05 | 1982-12-09 | Hitachi Ltd | Reactive sputter etching method |
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