JPS5629230A - Photosensitive image forming material and image forming method using it - Google Patents

Photosensitive image forming material and image forming method using it

Info

Publication number
JPS5629230A
JPS5629230A JP10468079A JP10468079A JPS5629230A JP S5629230 A JPS5629230 A JP S5629230A JP 10468079 A JP10468079 A JP 10468079A JP 10468079 A JP10468079 A JP 10468079A JP S5629230 A JPS5629230 A JP S5629230A
Authority
JP
Japan
Prior art keywords
image forming
resin composition
layer
forming layer
composition layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10468079A
Other languages
English (en)
Inventor
Minoru Wada
Fumiaki Shinozaki
Yonosuke Takahashi
Satoshi Yoshida
Tomoaki Ikeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP10468079A priority Critical patent/JPS5629230A/ja
Priority to US06/177,965 priority patent/US4292395A/en
Priority to DE19803030816 priority patent/DE3030816A1/de
Publication of JPS5629230A publication Critical patent/JPS5629230A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP10468079A 1979-08-17 1979-08-17 Photosensitive image forming material and image forming method using it Pending JPS5629230A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP10468079A JPS5629230A (en) 1979-08-17 1979-08-17 Photosensitive image forming material and image forming method using it
US06/177,965 US4292395A (en) 1979-08-17 1980-08-14 Photographic process of developing and etching an element containing a tin sulfide
DE19803030816 DE3030816A1 (de) 1979-08-17 1980-08-14 Lichtempfindliche bildausbildungsmaterialien und bildausbildungsverfahren unter anwendung derselben

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10468079A JPS5629230A (en) 1979-08-17 1979-08-17 Photosensitive image forming material and image forming method using it

Publications (1)

Publication Number Publication Date
JPS5629230A true JPS5629230A (en) 1981-03-24

Family

ID=14387179

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10468079A Pending JPS5629230A (en) 1979-08-17 1979-08-17 Photosensitive image forming material and image forming method using it

Country Status (3)

Country Link
US (1) US4292395A (ja)
JP (1) JPS5629230A (ja)
DE (1) DE3030816A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5879246A (ja) * 1981-11-05 1983-05-13 Toyobo Co Ltd 金属系画像形成方法および金属系画像減力方法

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56122130A (en) * 1980-02-28 1981-09-25 Sharp Corp Method for forming pattern of thin film transistor
US4423137A (en) * 1980-10-28 1983-12-27 Quixote Corporation Contact printing and etching method of making high density recording medium
DE3134054A1 (de) * 1981-08-28 1983-05-05 Hoechst Ag, 6230 Frankfurt Elektrochemisches entwicklungsverfahren fuer reproduktionsschichten
JPS59121336A (ja) * 1982-12-28 1984-07-13 Fuji Photo Film Co Ltd 感光性平版印刷版の現像液
JPS6270835A (ja) * 1985-09-24 1987-04-01 Kimoto & Co Ltd 剥離による画像形成材料
CN105131741B (zh) * 2015-10-20 2017-11-21 广州慧谷工程材料有限公司 一种体吸收型太阳能选择性吸热涂料及其制备方法与应用
KR101933477B1 (ko) * 2018-05-02 2018-12-31 인천대학교 산학협력단 황화 주석막 트랜스퍼 방법 및 이를 이용한 광전 소자

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50155302A (ja) * 1974-06-10 1975-12-15
JPS516530A (ja) * 1974-07-04 1976-01-20 Toray Industries Gazokeiseizairyo

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3762325A (en) * 1967-11-27 1973-10-02 Teeg Research Inc Electromagnetic radiation sensitive lithographic plates
US4205989A (en) * 1976-04-14 1980-06-03 Kimoto & Co., Ltd. Dry system image producing element

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50155302A (ja) * 1974-06-10 1975-12-15
JPS516530A (ja) * 1974-07-04 1976-01-20 Toray Industries Gazokeiseizairyo

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5879246A (ja) * 1981-11-05 1983-05-13 Toyobo Co Ltd 金属系画像形成方法および金属系画像減力方法

Also Published As

Publication number Publication date
DE3030816A1 (de) 1981-03-26
US4292395A (en) 1981-09-29

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