JPS5624351A - Gravure resist inspecting method - Google Patents

Gravure resist inspecting method

Info

Publication number
JPS5624351A
JPS5624351A JP9884579A JP9884579A JPS5624351A JP S5624351 A JPS5624351 A JP S5624351A JP 9884579 A JP9884579 A JP 9884579A JP 9884579 A JP9884579 A JP 9884579A JP S5624351 A JPS5624351 A JP S5624351A
Authority
JP
Japan
Prior art keywords
resist
liq
gravure
inspecting
satisfactory
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9884579A
Other languages
Japanese (ja)
Other versions
JPS6161379B2 (en
Inventor
Satoru Horiguchi
Shinichi Amamiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP9884579A priority Critical patent/JPS5624351A/en
Priority to US06/173,816 priority patent/US4406160A/en
Priority to CH582880A priority patent/CH642447A5/en
Priority to DE19803029274 priority patent/DE3029274A1/en
Publication of JPS5624351A publication Critical patent/JPS5624351A/en
Priority to US06/372,572 priority patent/US4539839A/en
Publication of JPS6161379B2 publication Critical patent/JPS6161379B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/02Engraving; Heads therefor
    • B41C1/025Engraving; Heads therefor characterised by means for the liquid etching of substrates for the manufacturing of relief or intaglio printing forms, already provided with resist pattern

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)

Abstract

PURPOSE:To inspect the state of a resist prior to an etching process by detecting the time required for a dropped inspecting liq. to reach a gravure material through the resist with a short-circuit formation and judging whether the resist quality is satisfactory or not. CONSTITUTION:When electrically conductive inspecting liq. 13 dropped onto resist 12 reaches gravure material 11 through resist 12, a short circuit is formed and detected with probe 10 having detecting pieces 1, 2 contacted to liq. 13. By this detection output the counter of time measuring circuit 20 starting counting simultaneously with the liq. 13 dropping stops counting, and the time required for liq. 13 to reach material 11 through resist 12 is displayed. Thus, whether the quality of resist 12 is satisfactory or not is judged simply prior to an etching process. In case of unsatisfactory resist 12, the resist alone is made again and plate 11 can be reused as it is.
JP9884579A 1979-02-08 1979-08-02 Gravure resist inspecting method Granted JPS5624351A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP9884579A JPS5624351A (en) 1979-08-02 1979-08-02 Gravure resist inspecting method
US06/173,816 US4406160A (en) 1979-08-02 1980-07-30 Method of inspecting a resist layer on a gravure printing plate, and device for practicing same
CH582880A CH642447A5 (en) 1979-08-02 1980-07-31 METHOD FOR CONTROLLING THE RESERVE LAYER ON A PRINTING FORM FOR HELIOGRAVURE AND APPARATUS FOR CARRYING OUT SAID METHOD.
DE19803029274 DE3029274A1 (en) 1979-08-02 1980-08-01 METHOD FOR TESTING A BASE LAYER ON A PRINTING PLATE AND DEVICE FOR IMPLEMENTING THE METHOD
US06/372,572 US4539839A (en) 1979-02-08 1982-04-28 Device for testing a resist layer on a gravure printing plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9884579A JPS5624351A (en) 1979-08-02 1979-08-02 Gravure resist inspecting method

Publications (2)

Publication Number Publication Date
JPS5624351A true JPS5624351A (en) 1981-03-07
JPS6161379B2 JPS6161379B2 (en) 1986-12-25

Family

ID=14230578

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9884579A Granted JPS5624351A (en) 1979-02-08 1979-08-02 Gravure resist inspecting method

Country Status (1)

Country Link
JP (1) JPS5624351A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58132748A (en) * 1982-02-03 1983-08-08 Dainippon Printing Co Ltd Inspecting liquid of resist for gravure printing
JPS58139142A (en) * 1982-02-12 1983-08-18 Dainippon Printing Co Ltd One liquid type etching device for gravure plate making
JPS58214158A (en) * 1982-02-12 1983-12-13 Dainippon Printing Co Ltd Device for calculating etching condition in gravure plate making
JPS59158081A (en) * 1983-02-28 1984-09-07 東芝コンポ−ネンツ株式会社 Method of producing airtight terminal

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58132748A (en) * 1982-02-03 1983-08-08 Dainippon Printing Co Ltd Inspecting liquid of resist for gravure printing
JPH0244055B2 (en) * 1982-02-03 1990-10-02 Dainippon Printing Co Ltd
JPS58139142A (en) * 1982-02-12 1983-08-18 Dainippon Printing Co Ltd One liquid type etching device for gravure plate making
JPS58214158A (en) * 1982-02-12 1983-12-13 Dainippon Printing Co Ltd Device for calculating etching condition in gravure plate making
JPH0332060B2 (en) * 1982-02-12 1991-05-09 Dainippon Printing Co Ltd
JPS59158081A (en) * 1983-02-28 1984-09-07 東芝コンポ−ネンツ株式会社 Method of producing airtight terminal
JPH036630B2 (en) * 1983-02-28 1991-01-30 Toshiba Components

Also Published As

Publication number Publication date
JPS6161379B2 (en) 1986-12-25

Similar Documents

Publication Publication Date Title
JPS6450948A (en) Ion activity measuring sensor, manufacture thereof and sensor attachment circuit therefor
JPS5624351A (en) Gravure resist inspecting method
KR830009475A (en) Coordinate Measuring Device
JPS5457968A (en) Electrical testing unit of semiconductor device and its production
JPS5337077A (en) Probe for tester
JPS55157232A (en) Method of inspecting pattern
JPS54112174A (en) Testing method for semiconductor device
JPS548465A (en) Etching method
JPS5412840A (en) Measuring method for surface potential of electrophotographic photoreceptor by time series
JPS5683045A (en) Wafer probe
JPS56116637A (en) Detector for semiconductor device
JPS56118653A (en) Contact-type potential difference measuring method for structure of different thickness
JPS5563835A (en) Defect detector for insulation film
JPS5717873A (en) Inspection method of semiconductor element
JPS56112602A (en) Measuring device for thickness of nonmagnetic thin metal plate
JPS5269393A (en) Bacteria inspecting device
JPS57148239A (en) Detecting method for wiring pattern of printed circuit board
JPS5717872A (en) Defect indication method of semiconductor chip
JPS55120147A (en) Semiconductor substrate detector
JPS5585210A (en) Defect inspection system for repeated pattern
JPS539563A (en) Side edge defect detection and size measurement apparatus of traveling materials
JPS54128390A (en) Probe of electric resistance flaw detector with contact monitor
JPS5299823A (en) Developing liquid concentration detector for developing device of wet type diazo copying machine
JPS5363083A (en) Detecting circuit for minute changing quantity
JPS539186A (en) Discrimination level setter of defect inspecting apparatus