JPS6161379B2 - - Google Patents
Info
- Publication number
- JPS6161379B2 JPS6161379B2 JP9884579A JP9884579A JPS6161379B2 JP S6161379 B2 JPS6161379 B2 JP S6161379B2 JP 9884579 A JP9884579 A JP 9884579A JP 9884579 A JP9884579 A JP 9884579A JP S6161379 B2 JPS6161379 B2 JP S6161379B2
- Authority
- JP
- Japan
- Prior art keywords
- resist
- detection
- time
- printing plate
- plate material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001514 detection method Methods 0.000 claims description 28
- 239000007788 liquid Substances 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 24
- 239000000463 material Substances 0.000 claims description 19
- 238000012360 testing method Methods 0.000 claims description 19
- 238000007646 gravure printing Methods 0.000 claims description 11
- 230000035515 penetration Effects 0.000 claims description 3
- 230000009972 noncorrosive effect Effects 0.000 claims description 2
- 238000009434 installation Methods 0.000 claims 1
- 238000005260 corrosion Methods 0.000 description 21
- 230000007797 corrosion Effects 0.000 description 21
- 238000007689 inspection Methods 0.000 description 18
- 239000010949 copper Substances 0.000 description 16
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 14
- 108010010803 Gelatin Proteins 0.000 description 14
- 229910052802 copper Inorganic materials 0.000 description 14
- 229920000159 gelatin Polymers 0.000 description 14
- 239000008273 gelatin Substances 0.000 description 14
- 235000019322 gelatine Nutrition 0.000 description 14
- 235000011852 gelatine desserts Nutrition 0.000 description 14
- 238000010586 diagram Methods 0.000 description 10
- 239000000523 sample Substances 0.000 description 9
- 238000007639 printing Methods 0.000 description 7
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 5
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 5
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 3
- 230000002950 deficient Effects 0.000 description 3
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 3
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 108010025899 gelatin film Proteins 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 210000004899 c-terminal region Anatomy 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 229960002089 ferrous chloride Drugs 0.000 description 1
- NMCUIPGRVMDVDB-UHFFFAOYSA-L iron dichloride Chemical compound Cl[Fe]Cl NMCUIPGRVMDVDB-UHFFFAOYSA-L 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 239000001054 red pigment Substances 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/02—Engraving; Heads therefor
- B41C1/025—Engraving; Heads therefor characterised by means for the liquid etching of substrates for the manufacturing of relief or intaglio printing forms, already provided with resist pattern
Description
【発明の詳細な説明】
この発明はグラビア刷版レジストの検査方法に
関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for inspecting gravure printing plate resists.
ところで、いわゆるコンベンシヨナルグラビア
では版材は通常銅であり、画像の濃淡に応じて深
度の異なる凹部をこれに形成して印刷用の版とし
ている。しかして、版材の銅に凹部を形成する方
法としては、塩化第二鉄を主成分とする腐食液で
銅を腐食するのであるが、腐食のレジストとして
ゼラチン膜のレジスト（カーボンテイツシユ）が
用いられる。ここにゼラチンレジストはグラビア
刷版の腐食工程の前工程において画像の濃淡に応
じた膜厚を有し、腐食液はゼラチンレジストの膜
厚に応じて版材の銅に到達する時間が異なる。す
なわち、ゼラチンレジストの働きによつて腐食工
程において版材の銅を腐食する総時間が制御され
るため、画像の濃淡に応じた深度の凹部が形成さ
れるのである。 By the way, in so-called conventional gravure, the plate material is usually copper, and concave portions having different depths are formed therein depending on the shading of the image to form a printing plate. However, the method of forming recesses in the copper of the printing plate is to corrode the copper with a corrosive solution containing ferric chloride as the main component, but a gelatin film resist (carbon stain) is used as a corrosion resist. used. Here, the gelatin resist has a film thickness that corresponds to the density of the image in the pre-corrosion process of the gravure printing plate, and the time for the etchant to reach the copper of the plate material differs depending on the film thickness of the gelatin resist. In other words, the total time for corroding the copper of the plate material in the corrosion process is controlled by the action of the gelatin resist, so that a recess is formed with a depth that corresponds to the density of the image.
またゼラチンレジストが腐食液を浸透する時間
はゼラチン膜の厚さだけでなく、腐食液の濃度、
ゼラチンの含有水分量、温度やその他の多くの因
子によつて左右される。このため、グラビア刷版
における工程管理は厳密なものとなつているが、
それでも予測できない外乱等の要因によつてゼラ
チンレジストの特性には幅がある。通常、腐食工
程において腐食を行ないつつ腐食条件を修正する
ことによつて、ゼラチンレジストの特性のばらつ
きを補正する方法が採られる。しかしながら、こ
の方法はゼラチンレジストの特性のばらつきが小
さい場合には有効であるが、そのばらつきが大き
い場合には補正領域からはずれ、腐食された版材
の凹部はその深度が許容範囲外となる。その結
果、刷版の加工工程を無駄にするだけでなく、製
造に多くの時間と費用を要し刷材（通常はシリン
ダ）を労費することになる。 Also, the time it takes for the gelatin resist to penetrate the corrosive liquid depends not only on the thickness of the gelatin film, but also on the concentration of the corrosive liquid.
It depends on the moisture content of gelatin, temperature and many other factors. For this reason, process control for gravure printing plates has become strict;
Even so, the properties of gelatin resists vary depending on factors such as unpredictable disturbances. Usually, a method is used to correct variations in the properties of gelatin resist by modifying the corrosion conditions while performing corrosion in the corrosion process. However, although this method is effective when the variation in the characteristics of the gelatin resist is small, when the variation is large, the correction area is deviated from, and the depth of the corroded concave portion of the plate material is outside the permissible range. As a result, not only is the processing step of the printing plate wasted, but the manufacturing process is time consuming and costly, and the printing material (usually a cylinder) is labor-intensive.
このため、従来は実際に腐食を行なつて腐食の
進み具合を階調スケール又は絵柄上で、目視によ
つて判定するレジストの検査方法を行なつてい
る。すなわち、塩化第二鉄（FeCl3）を主成分と
する腐食液がゼラチンレジストに浸透して版材の
銅表面に達すると反応し、銅（Cu）は塩化第二
銅（CuCl2）となり、塩化第二鉄（FeCl3）は塩化
第一鉄（FeCl2）となる。 For this reason, conventionally, a resist inspection method has been used in which corrosion is actually performed and the progress of corrosion is visually determined on a gradation scale or pattern. In other words, when a corrosive liquid whose main component is ferric chloride (FeCl 3 ) penetrates the gelatin resist and reaches the copper surface of the printing plate, it reacts, and the copper (Cu) turns into cupric chloride (CuCl 2 ). Ferric chloride (FeCl 3 ) becomes ferrous chloride (FeCl 2 ).
FeCl3＋3H2OFe（OH）3＋3HCl
Cu＋FeCl3→CuCl＋FeCl2 CuCl＋FeCl3→CuCl2＋FeCl2
Cu＋2FeCl3→CuCl2＋2FeCl2
しかして、通常ゼラチンレジストには赤色の顔
料が含まれており銅表面の色と同系統の色である
が、銅の腐食反応によりゼラチンレジストの色は
外部から見て黒色に変化するので、これを目視観
察することによつて腐食液が浸透したことを確認
することができる。そして、腐食液がゼラチンレ
ジストに滴下されてから腐食が開始されるまでの
時間を標準時間と対比させることにより、ゼラチ
ンレジストの特性を検査する。この検査方法は、
ゼラチンレジストの予め定められた印刷物の障害
とならない被検査部分に腐食液を滴下することに
よつて、容易に行なうことができる。しかしなが
ら、この検査方法には次のような欠点がある。FeCl 3 +3H 2 OFe(OH) 3 +3HCl Cu+FeCl 3 →CuCl +FeCl 2 CuCl+FeCl 3 →CuCl 2 +FeCl 2 Cu +2FeCl 3 →CuCl 2 +2FeCl 2However , gelatin resist usually contains a red pigment, which matches the color of the copper surface. Although the colors are similar, the color of the gelatin resist changes to black when viewed from the outside due to the corrosion reaction of copper, so by visually observing this, it can be confirmed that the corrosive liquid has penetrated. Then, the characteristics of the gelatin resist are examined by comparing the time from when the corrosive liquid is dropped onto the gelatin resist until corrosion starts with a standard time. This inspection method is
This can be easily done by dropping a corrosive liquid onto a predetermined portion of the gelatin resist to be inspected that does not interfere with the print. However, this inspection method has the following drawbacks.
(1) 実際に腐食を行なう場合と同じ程度の検査時
間を必要とする。(1) It requires the same amount of inspection time as when actually performing corrosion.
(2) 濃度の低い浸透速度の速い腐食液を検査用の
腐食液とし、当該腐食との相関関係をとること
により検査時間を短かくすることは可能であ
る。しかしながら、腐食液が銅表面に到達した
ことを示すレジストの色変化は急峻なものでは
なく、到達した時点の判定は目視によるため、
大きな誤差を生じ易い点では同じである。(2) It is possible to shorten the inspection time by using a corrosive liquid with a low concentration and a high penetration rate as the corrosive liquid for inspection, and by correlating it with the corrosion concerned. However, the color change in the resist that indicates that the corrosive liquid has reached the copper surface is not sudden, and the time when it has reached the copper surface can be determined by visual inspection.
They are the same in that they tend to cause large errors.
(3) 検査することによつて検査部分が腐食されて
しまうため、障害とならないような被検査部分
を選定しなければならないが、実際には選定困
難な場合が多い。(3) Since the parts to be inspected will be corroded during inspection, it is necessary to select parts to be inspected that will not cause any obstruction, but in practice this is often difficult.
(4) 検査の結果、レジストが不良で後工程の条件
変更で補正しきれない場合、レジストを剥離し
て再度版材を利用することになるが、検査した
部分が再利用の際の障害となる。(4) If the inspection results show that the resist is defective and cannot be corrected by changing conditions in the post-process, the resist will be peeled off and the plate material will be used again, but the inspected area may be an obstacle to reuse. Become.
このように腐食工程の前における検査でメリツ
トを出し難いため、現状ではレジストの特性を検
査しながら上述の如き腐食を行なうようにしてい
る。つまり、腐食の進み具合を階調スケール又は
絵柄上で目視判定しながら、腐食の進行速度が規
準値に比べて速いか遅いかに応じて、浸透速度の
異なる腐食液を選択使用して規準内の腐食を行な
うようにしている。しかしながら、かかる方法で
は腐食の制御過程で間接的にレジストの特性検査
が行なわれており、いかなる腐食工程の制御方法
でもレジストの状態によつては制御範囲外となつ
てしまい、刷版が不良になつてしまうといつた欠
点がある。よつて、この発明の目的は上述の如き
欠点のないグラビア刷版レジストの検査方法を提
供することにある。 As described above, since it is difficult to obtain any merit from the inspection before the corrosion process, the current practice is to carry out the above-mentioned corrosion while inspecting the characteristics of the resist. In other words, while visually determining the progress of corrosion on a gradation scale or pattern, a corrosive solution with a different penetration rate is selected and used depending on whether the progress rate of corrosion is faster or slower than the standard value. Corrosion is carried out. However, in this method, the characteristics of the resist are inspected indirectly during the corrosion control process, and no matter how the corrosion process is controlled, depending on the condition of the resist, it may fall out of the control range and the printing plate may be defective. There are some drawbacks that you get used to. SUMMARY OF THE INVENTION Therefore, it is an object of the present invention to provide a method for inspecting gravure printing plate resists that does not have the above-mentioned drawbacks.
以下にこの発明を説明する。 This invention will be explained below.
この発明はグラビア刷版レジストの検査方法に
関し、グラビア刷版のレジストの被検査部分に導
電性の検査液を滴下し、この検査液をレジストに
浸透させることによつてグラビア刷版の版材と検
査液との間に短絡回路を形成し、その短絡までに
要した時間に基づいてレジストの検査を行なうよ
うにしたものである。すなわち、この発明では第
１図に示すようなレジスト抵抗と並列接続となる
抵抗Ｒを内蔵し、対向した１対の導体で成る検出
片１，２を先端部に有すると共に、出力端子Ａ，
Ｂ，Ｃを有する検出プローブ１０を用いる。しか
して第２図に示すように、この検出プローブ１０
の出力端子Ｃを版材（銅）１１に接触すると共
に、版材１１上のレジストの所望の被検査部分上
に検出プローブの検出片１，２を置き、導電性の
検査液１３を検出片１，２上から滴下注入する。
なお出力端子Ａ，Ｂを第３図に示すような時間測
定回路２０に接続されている。ここに、時間測定
回路２０は接続ブロツク２１を経て端子Ｄ１，Ｄ
２に接続され、端子Ｄ１は演算増幅器２２の出力
に、端子Ｄ２は演算増幅器２２の負入力端子にそ
れぞれ接続されている。また、演算増幅器２２の
負入力端子は感度調整用の可変抵抗器Ｒ１を経て
負電圧源−Ｖに接続されると共に、正入力端子は
接地されており、その出力及び負入力端子間には
フイードバツクの抵抗R2（R2はレジスト抵抗と
並列接続となる）が接続されている。しかして、
演算増幅器２２の出力ASはコンパレータ２３，
２４に接続され、基準電圧源VS１，VS２との各
比較出力Ｃ１，Ｃ２がそれぞれ回路ND１に入力
され、その出力Ｃ３が発振器２５のパルス出力
PSと共にアンド回路ADに入力され、その出力
PCがカウンタ２６に入力される。カウンタ２６
の計数値はデコーダ２７を経て表示回路２８で表
示される。またカウンタ２６はスイツチSW１で
リセツトされるようになつており、発振器２５の
出力パルスPSは予め定められた一定周波数の繰
返パルスであり、コンパレータ２３及び２４の基
準電圧VS１及びVS２はそれぞれ予め調整されて
いる。 The present invention relates to a gravure printing plate resist inspection method, in which a conductive test liquid is dropped onto a portion to be inspected of a gravure printing plate resist, and the test liquid is allowed to permeate into the resist. A short circuit is formed between the test liquid and the resist, and the resist is inspected based on the time required until the short circuit occurs. That is, the present invention incorporates a resistor R connected in parallel with the resist resistor as shown in FIG.
A detection probe 10 having B and C is used. As shown in FIG. 2, this detection probe 10
While contacting the output terminal C of the plate material (copper) 11, the detection pieces 1 and 2 of the detection probe are placed on the desired portion to be inspected of the resist on the plate material 11, and the conductive test liquid 13 is placed on the detection piece. 1, 2 Inject dropwise from above.
Note that the output terminals A and B are connected to a time measuring circuit 20 as shown in FIG. Here, the time measuring circuit 20 is connected to the terminals D1 and D via the connection block 21.
2, the terminal D1 is connected to the output of the operational amplifier 22, and the terminal D2 is connected to the negative input terminal of the operational amplifier 22. Further, the negative input terminal of the operational amplifier 22 is connected to a negative voltage source -V via a variable resistor R1 for sensitivity adjustment, and the positive input terminal is grounded, and there is no feedback between the output and the negative input terminal. A resistor R 2 (R 2 is connected in parallel with the resist resistance) is connected. However,
The output AS of the operational amplifier 22 is sent to the comparator 23,
The comparison outputs C1 and C2 with the reference voltage sources VS1 and VS2 are respectively input to the circuit ND1, and the output C3 is the pulse output of the oscillator 25.
It is input to AND circuit AD along with PS, and its output
The PC is input to the counter 26. counter 26
The count value is displayed on the display circuit 28 via the decoder 27. Further, the counter 26 is reset by the switch SW1, the output pulse PS of the oscillator 25 is a repetitive pulse with a predetermined constant frequency, and the reference voltages VS1 and VS2 of the comparators 23 and 24 are adjusted in advance, respectively. has been done.
ここにおいて、検出プローブ１０の検出片１，
２上に検査液１３が滴下されていない場合、端子
Ａ−Ｂ間は電気的に遮断されていることになるの
で、その間の抵抗値は第４図の時点t0における如
くほぼ無限大となる。したがつて、演算増幅器２
２のフイドバツク抵抗値は抵抗R2だけとなり、
コンパレータ２３及び２４の出力Ｃ１は「１」、
Ｃ２は「０」となるので、アンド回路ADの出力
Ｃ３は「０」となる。これにより発振器２５の出
力パルスPSはナンド回路ND２で阻止され、カウ
ンタ２６は計数動作を行なわない。次に、検出プ
ローブ１０の検出片１，２に第２図の如く検査液
１３を滴下注入する（時点t1）と、検査液１３が
導電性であることからこの時点t1から検出片１，
２が導通し、端子Ａ−Ｂ間の装置側からみた抵抗
値は時点t1よりＲとなる。この抵抗Ｒは抵抗R2に
並列に挿入されることになるので、演算増幅器２
２のフイードバツク抵抗値がＲＲ２／Ｒ＋Ｒ２となるこ
とに
より、コンパレータ２４の出力Ｃ２が「１」とな
る。なお、コンパレータ２３の出力は前の状態と
同じ「１」である。したがつてアンド回路ADの
出力Ｃ３が第５図に示す如く時点ｔから「１」と
なり、発振器２５からのパルス出力PSはナンド
回路NDを経てカウンタ２６に入力されて計数が
開始される。このカウンタ２６の計数値はデコー
ダ２７で時間データに換算され、計数開始時点か
らの経過時間が表示回路２８で表示される。 Here, the detection piece 1 of the detection probe 10,
If the test liquid 13 is not dropped on 2, terminals A and B are electrically disconnected, so the resistance value therebetween becomes almost infinite as at time t0 in Figure 4. . Therefore, operational amplifier 2
The feedback resistance value of 2 is only resistor R 2 ,
Output C1 of comparators 23 and 24 is "1",
Since C2 becomes "0", the output C3 of AND circuit AD becomes "0". As a result, the output pulse PS of the oscillator 25 is blocked by the NAND circuit ND2, and the counter 26 does not perform a counting operation. Next, when the test liquid 13 is dripped into the detection pieces 1 and 2 of the detection probe 10 as shown in FIG. 2 (time t 1 ), since the test liquid 13 is conductive, the detection piece 1 ，
2 becomes conductive, and the resistance value between terminals A and B as seen from the device side becomes R from time t1 . This resistor R will be inserted in parallel with resistor R2 , so operational amplifier 2
Since the feedback resistance value of 2 becomes RR 2 /R+R 2 , the output C2 of the comparator 24 becomes "1". Note that the output of the comparator 23 is "1", which is the same as the previous state. Therefore, the output C3 of the AND circuit AD becomes "1" from time t as shown in FIG. 5, and the pulse output PS from the oscillator 25 is input to the counter 26 via the NAND circuit ND to start counting. The count value of the counter 26 is converted into time data by a decoder 27, and the elapsed time from the start of counting is displayed on a display circuit 28.
しかして、レジスト１２上に検査液１３が滴下
されると、徐々に検査液１３がレジスト１２を浸
透し遂には版材１１に達し（時点t2）、Ｃ端子と
Ａ端子とが版材１１を導通するので、結局端子Ａ
−Ｂ間の抵抗は導通して第４図の時点t2以降の如
く低くなつてゆく。よつて、演算増幅器２２のフ
イドバツク抵抗も小さくなり、コンパレータ２３
の出力Ｃ２は「０」、コンパレータ２４の出力Ｃ
３は「１」となるのでアンド回路ADの出力Ｃ３
が第５図に示す如く時点t2以降「０」となる。よ
つて、時点t2以降は発振器２５からの出力パルス
PSがナンド回路NDで遮断され、これによりカウ
ンタ２６の計数動作が停止する。かくして、カウ
ンタ２６は時点t1からt2まで、つまりレジスト１
２上に検査液１３を滴下してからその検査液１３
が版材１１に浸透するまで、発振器２５からの出
力パルスPSを計数し、それをデコーダ２７で時
間データに変換してから表示回路２８に表示す
る。 When the test liquid 13 is dropped onto the resist 12, the test liquid 13 gradually penetrates the resist 12 and finally reaches the plate material 11 (time t2 ), and the C terminal and the A terminal are connected to the plate material 11. Because it conducts, eventually terminal A
-B becomes conductive and becomes lower as shown after time t2 in FIG. Therefore, the feedback resistance of the operational amplifier 22 is also reduced, and the comparator 23
The output C2 of the comparator 24 is "0", and the output C2 of the comparator 24 is "0".
3 becomes "1", so the output C3 of the AND circuit AD
becomes "0" after time t2 as shown in FIG. Therefore, after time t2 , the output pulse from the oscillator 25
PS is cut off by the NAND circuit ND, thereby stopping the counting operation of the counter 26. Thus, the counter 26 counts from time t 1 to t 2 , i.e. register 1
After dropping the test liquid 13 onto 2,
The output pulse PS from the oscillator 25 is counted until it penetrates into the plate material 11, and the decoder 27 converts it into time data, which is then displayed on the display circuit 28.
ところで、上述の実施例は直流動作で検査を行
なうものであるが、交流動作で検査を行ない、検
査液を電気分解させないようにするためには、接
続ブロツク２１を第６図の如く構成すればよい。
すなわち、端子Ａ，Ｂ及びＤ１，Ｄ２間に４つの
切換スイツチSW２〜SW５をブリツジ状に接続
し、これら切換スイツチSW２〜SW５を第７図
Ａ〜Ｄに示す如くオンオフ制御すればよい。な
お、この場合、スイツチング時に発生するノイズ
成分を除去して、平滑化された信号成分を得るた
めに演算増幅器２２の抵抗R2に並列にコンデン
サを介挿する。また、第３図の実施例では演算増
幅器２２の負入力端子は、可変抵抗抗器R1を経
て直流の電圧源−Ｖに接続されているが、この電
圧源−Ｖを交流パルス源にしても交流動作が可能
である。 By the way, in the above-mentioned embodiment, the test is performed using DC operation, but in order to perform the test using AC operation and to prevent the test liquid from being electrolyzed, the connection block 21 can be configured as shown in FIG. good.
That is, four changeover switches SW2 to SW5 may be connected in a bridge manner between terminals A, B and D1 and D2, and these changeover switches SW2 to SW5 may be controlled on and off as shown in FIGS. 7A to D. In this case, a capacitor is inserted in parallel with the resistor R2 of the operational amplifier 22 in order to remove noise components generated during switching and obtain a smoothed signal component. In the embodiment shown in FIG. 3, the negative input terminal of the operational amplifier 22 is connected to the DC voltage source -V via the variable resistance resistor R1 , but this voltage source -V is used as an AC pulse source. AC operation is also possible.
一方、検出プローブ１０の検出片を版材１１の
銅とは異なる、たとえば白金とすると、検査液が
電解質ならば検査液が版材１１に達した時に電気
的に導通し、版材１１の銅と検出片の白金との間
に電位を生じる。したがつて、この電位を検出す
ることによつても時間を測定することができる。
なお、この場合の検出回路は第８図の如く抵抗
R3〜R5と演算増幅器２９とを組合せて構成すれ
ば良く、その出力ASは第９図Ａの如くなる。し
たがつて、VS１及びVS２でスレツシヨルドを設
定するようにすれば、同図Ｂに示すようなパルス
が得られ、上述と同様の測定を行なうことができ
る。 On the other hand, if the detection piece of the detection probe 10 is made of platinum, which is different from the copper of the plate material 11, if the test liquid is an electrolyte, it becomes electrically conductive when the test liquid reaches the plate material 11, and the copper of the plate material 11 becomes electrically conductive. A potential is generated between the electrode and the platinum of the detection piece. Therefore, time can also be measured by detecting this potential.
Note that the detection circuit in this case is a resistor as shown in Figure 8.
It may be configured by combining R 3 to R 5 and an operational amplifier 29, and its output AS is as shown in FIG. 9A. Therefore, by setting the threshold at VS1 and VS2, a pulse as shown in FIG.
以上のようにこの発明の検出方法によれば、腐
食工程の前にレジストの状態を検査することがで
きるので、不良レジストの場合にはレジストのみ
再度造り直せば良く、製造に時間がかかりかつ高
価な版材をそのまま再使用することができる。ま
た、レジストの検査結果に応じて腐食条件を最適
化することが可能であり、グラビア刷版の品質が
向上すると共に、後工程における版修正の負荷が
軽減される。さらに、検査結果から前工程におけ
る処理条件の適否が判るから、各工程の管理デー
タとして利用することができる。しかして、検査
液としては導電性を有する液であれば良く、腐食
性は無関係であるから、非腐食性の液を使用すれ
ば版材に痕跡を残すことなく検査することができ
る。この結果、印刷における汚れが出ないから、
グラビア刷版の中央部分など検査部位の選択に自
由度があり検査精度が向上する。また、人間の目
視判定による検査方法と異なり、抵抗値の２段階
変化を電子回路により検出しているので検査結果
は客観的なものであり、個人誤差等のない精度の
高い検査を行なうことができる。さらに、検査方
法が簡単であり、熟練を必要としないから取扱い
が容易である。 As described above, according to the detection method of the present invention, the state of the resist can be inspected before the corrosion process, so in the case of a defective resist, only the resist needs to be remade, which takes time and is expensive to manufacture. The plate material can be reused as is. Furthermore, it is possible to optimize the corrosion conditions according to the resist inspection results, which improves the quality of the gravure printing plate and reduces the burden of plate correction in the post-process. Furthermore, since the inspection results determine whether the processing conditions in the previous process are appropriate, they can be used as management data for each process. The test liquid may be any conductive liquid, and corrosivity is irrelevant, so if a non-corrosive liquid is used, the plate material can be inspected without leaving any traces. As a result, there are no stains in printing,
There is a degree of freedom in selecting the inspection area, such as the central part of the gravure printing plate, improving inspection accuracy. In addition, unlike inspection methods that rely on human visual judgment, the two-step change in resistance value is detected using an electronic circuit, so the inspection results are objective and highly accurate inspections can be performed without individual errors. can. Furthermore, the inspection method is simple and does not require any skill, making it easy to handle.
第１図はこの発明に用いる検出プローブの構造
を示す概略構成図、第２図はその検出時の様子を
示す図、第３図は時間の測定回路の一例を示す回
路図、第４図は検出時における特性を示す図、第
５図はその一部波形を示す図、第６図はこの発明
の他の実施例に用いる接続ブロツクの構成を示す
図、第７図Ａ〜Ｄはその動作例を示す図、第８図
はこの発明の更に他の実施例を説明するための
図、第９図Ａ，Ｂはその動作を説明するための図
である。
１，２，１Ａ，２Ａ……検出片、１０……検出
プローブ、１１……版材、１２……レジスト、１
３……検査液、２０……時間測定回路、２５……
発振器、２６……カウンタ。
Fig. 1 is a schematic configuration diagram showing the structure of the detection probe used in the present invention, Fig. 2 is a diagram showing the state during detection, Fig. 3 is a circuit diagram showing an example of a time measurement circuit, and Fig. 4 is a diagram showing the structure of the detection probe used in the present invention. FIG. 5 is a diagram showing the characteristics at the time of detection, FIG. 5 is a diagram showing a part of the waveform, FIG. 6 is a diagram showing the configuration of a connection block used in another embodiment of the present invention, and FIGS. 7 A to D are its operation. FIG. 8 is a diagram showing an example, and FIG. 8 is a diagram for explaining still another embodiment of the present invention, and FIGS. 9A and 9B are diagrams for explaining its operation. 1, 2, 1A, 2A...Detection piece, 10...Detection probe, 11...Plate material, 12...Resist, 1
3... Test liquid, 20... Time measurement circuit, 25...
Oscillator, 26...counter.
Claims (1)
をグラビア刷版のレジストの被検査部分に近接さ
せ、 前記レジストの被検査部分に非腐食性の導電性
の検査液を滴下して前記１対の探知片により前記
所定抵抗値を検出し、 前記検査液がレジストに浸透して前記グラビア
刷版の版材に達したことを、前記抵抗を有する一
方側探知片の取付側から引出されて前記版材に取
付けられた短絡検出電極と他方側探知片との間の
抵抗がほぼ０になることにより検出し、 前記所定抵抗値の検出時から前記ほぼ０の抵抗
値の検出時までの時間からレジストの浸透特性を
検出するようにしたことを特徴とするグラビア刷
版レジストの検査方法。[Scope of Claims] 1. A pair of detection pieces having a predetermined resistance on one side are brought close to a portion to be inspected of a resist of a gravure printing plate, and a non-corrosive conductive test is performed on the portion to be inspected of the resist. A liquid is dropped and the pair of detection pieces detects the predetermined resistance value, and the detection piece on one side having the resistance detects that the test liquid has penetrated the resist and reached the plate material of the gravure printing plate. Detection is made when the resistance between the short-circuit detection electrode pulled out from the installation side and attached to the plate material and the other side detection piece becomes almost 0, and from the time of detection of the predetermined resistance value, the resistance is almost 0. A method for inspecting a gravure printing plate resist, characterized in that the penetration characteristics of the resist are detected from the time taken until the value is detected.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9884579A JPS5624351A (en) | 1979-08-02 | 1979-08-02 | Gravure resist inspecting method |
| US06/173,816 US4406160A (en) | 1979-08-02 | 1980-07-30 | Method of inspecting a resist layer on a gravure printing plate, and device for practicing same |
| CH582880A CH642447A5 (en) | 1979-08-02 | 1980-07-31 | METHOD FOR CONTROLLING THE RESERVE LAYER ON A PRINTING FORM FOR HELIOGRAVURE AND APPARATUS FOR CARRYING OUT SAID METHOD. |
| DE19803029274 DE3029274A1 (en) | 1979-08-02 | 1980-08-01 | METHOD FOR TESTING A BASE LAYER ON A PRINTING PLATE AND DEVICE FOR IMPLEMENTING THE METHOD |
| US06/372,572 US4539839A (en) | 1979-02-08 | 1982-04-28 | Device for testing a resist layer on a gravure printing plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9884579A JPS5624351A (en) | 1979-08-02 | 1979-08-02 | Gravure resist inspecting method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5624351A JPS5624351A (en) | 1981-03-07 |
| JPS6161379B2 true JPS6161379B2 (en) | 1986-12-25 |
Family
ID=14230578
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9884579A Granted JPS5624351A (en) | 1979-02-08 | 1979-08-02 | Gravure resist inspecting method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5624351A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58214158A (en) * | 1982-02-12 | 1983-12-13 | Dainippon Printing Co Ltd | Device for calculating etching condition in gravure plate making |
| JPS58132748A (en) * | 1982-02-03 | 1983-08-08 | Dainippon Printing Co Ltd | Inspecting liquid of resist for gravure printing |
| JPS58139142A (en) * | 1982-02-12 | 1983-08-18 | Dainippon Printing Co Ltd | One liquid type etching device for gravure plate making |
| JPS59158081A (en) * | 1983-02-28 | 1984-09-07 | 東芝コンポ−ネンツ株式会社 | Method of producing airtight terminal |
-
1979
- 1979-08-02 JP JP9884579A patent/JPS5624351A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5624351A (en) | 1981-03-07 |
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