JPS5618424A - Apparatus for electron beam lithography - Google Patents

Apparatus for electron beam lithography

Info

Publication number
JPS5618424A
JPS5618424A JP9343579A JP9343579A JPS5618424A JP S5618424 A JPS5618424 A JP S5618424A JP 9343579 A JP9343579 A JP 9343579A JP 9343579 A JP9343579 A JP 9343579A JP S5618424 A JPS5618424 A JP S5618424A
Authority
JP
Japan
Prior art keywords
electron
deflecting
circuit
signal
level
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9343579A
Other languages
Japanese (ja)
Inventor
Akinori Shibayama
Shigeru Moriya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP9343579A priority Critical patent/JPS5618424A/en
Publication of JPS5618424A publication Critical patent/JPS5618424A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To repeat the exposing operation until the normal exposure is attained by detecting the irradiation of an electron beam on an exposed specimen, comparing the variation of the detected signals and the variation of the beam blanking signal, and judging the abnormal state. CONSTITUTION:The signal from a CPU 1 is converted into deflecting analog signals 11 by a deflecting circuit 5. When the deflecting analog signals 11 reach a specified analog level, a degital control circuit 2 grings a beam blanking signal 8 to a beam- on level, thereby the electron beam is irradiated to a specimen 18 to be exposed. The electrons reflected by the exposed specimen 18 is trapped by an electron- beam detector 20, the signal level is judged by an electron-beam detecting and processing circuit 6, and the output is supplied to an error recognizing circuit 3. The beam blanking signal 8 is also supplied to the error recognizing circuit 3. Until the normal electron-beam irradiation is recognized, the deflecting positions remain unchanged, and the exposing operation is repeated.
JP9343579A 1979-07-23 1979-07-23 Apparatus for electron beam lithography Pending JPS5618424A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9343579A JPS5618424A (en) 1979-07-23 1979-07-23 Apparatus for electron beam lithography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9343579A JPS5618424A (en) 1979-07-23 1979-07-23 Apparatus for electron beam lithography

Publications (1)

Publication Number Publication Date
JPS5618424A true JPS5618424A (en) 1981-02-21

Family

ID=14082224

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9343579A Pending JPS5618424A (en) 1979-07-23 1979-07-23 Apparatus for electron beam lithography

Country Status (1)

Country Link
JP (1) JPS5618424A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4841242A (en) * 1987-04-10 1989-06-20 Siemens Aktiengesellschaft Method for testing conductor networks
JP2013182944A (en) * 2012-02-29 2013-09-12 Canon Inc Drawing device and article manufacturing method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52138872A (en) * 1975-12-27 1977-11-19 Fujitsu Ltd Exposure times counting apparatus of electron beam exposure device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52138872A (en) * 1975-12-27 1977-11-19 Fujitsu Ltd Exposure times counting apparatus of electron beam exposure device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4841242A (en) * 1987-04-10 1989-06-20 Siemens Aktiengesellschaft Method for testing conductor networks
JP2013182944A (en) * 2012-02-29 2013-09-12 Canon Inc Drawing device and article manufacturing method

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