JPS5618424A - Apparatus for electron beam lithography - Google Patents
Apparatus for electron beam lithographyInfo
- Publication number
- JPS5618424A JPS5618424A JP9343579A JP9343579A JPS5618424A JP S5618424 A JPS5618424 A JP S5618424A JP 9343579 A JP9343579 A JP 9343579A JP 9343579 A JP9343579 A JP 9343579A JP S5618424 A JPS5618424 A JP S5618424A
- Authority
- JP
- Japan
- Prior art keywords
- electron
- deflecting
- circuit
- signal
- level
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To repeat the exposing operation until the normal exposure is attained by detecting the irradiation of an electron beam on an exposed specimen, comparing the variation of the detected signals and the variation of the beam blanking signal, and judging the abnormal state. CONSTITUTION:The signal from a CPU 1 is converted into deflecting analog signals 11 by a deflecting circuit 5. When the deflecting analog signals 11 reach a specified analog level, a degital control circuit 2 grings a beam blanking signal 8 to a beam- on level, thereby the electron beam is irradiated to a specimen 18 to be exposed. The electrons reflected by the exposed specimen 18 is trapped by an electron- beam detector 20, the signal level is judged by an electron-beam detecting and processing circuit 6, and the output is supplied to an error recognizing circuit 3. The beam blanking signal 8 is also supplied to the error recognizing circuit 3. Until the normal electron-beam irradiation is recognized, the deflecting positions remain unchanged, and the exposing operation is repeated.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9343579A JPS5618424A (en) | 1979-07-23 | 1979-07-23 | Apparatus for electron beam lithography |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9343579A JPS5618424A (en) | 1979-07-23 | 1979-07-23 | Apparatus for electron beam lithography |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5618424A true JPS5618424A (en) | 1981-02-21 |
Family
ID=14082224
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9343579A Pending JPS5618424A (en) | 1979-07-23 | 1979-07-23 | Apparatus for electron beam lithography |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5618424A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4841242A (en) * | 1987-04-10 | 1989-06-20 | Siemens Aktiengesellschaft | Method for testing conductor networks |
JP2013182944A (en) * | 2012-02-29 | 2013-09-12 | Canon Inc | Drawing device and article manufacturing method |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52138872A (en) * | 1975-12-27 | 1977-11-19 | Fujitsu Ltd | Exposure times counting apparatus of electron beam exposure device |
-
1979
- 1979-07-23 JP JP9343579A patent/JPS5618424A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52138872A (en) * | 1975-12-27 | 1977-11-19 | Fujitsu Ltd | Exposure times counting apparatus of electron beam exposure device |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4841242A (en) * | 1987-04-10 | 1989-06-20 | Siemens Aktiengesellschaft | Method for testing conductor networks |
JP2013182944A (en) * | 2012-02-29 | 2013-09-12 | Canon Inc | Drawing device and article manufacturing method |
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