JPS5583807A - Mask inspection unit using electron beam - Google Patents
Mask inspection unit using electron beamInfo
- Publication number
- JPS5583807A JPS5583807A JP15643078A JP15643078A JPS5583807A JP S5583807 A JPS5583807 A JP S5583807A JP 15643078 A JP15643078 A JP 15643078A JP 15643078 A JP15643078 A JP 15643078A JP S5583807 A JPS5583807 A JP S5583807A
- Authority
- JP
- Japan
- Prior art keywords
- average value
- parts
- processing circuit
- operation processing
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
PURPOSE: To make mask pattern boundary detection rapid and accurate by operating an all average value of signal waves obtained from a secondary electron detector, an average value in parts having a level higher than the all average value, and an average value in parts having a level lower than the all average value.
CONSTITUTION: Secondary electrons generated from the surface of mask 7 are detected by secondary electron detector 8 and are amplified by signal amplifier 9 and are inputted to operation processing circuit 11 through A/D converter. Since noise is included in the output of amplifier 9 as shown in signal waveform vx, all average value vav is operated and stored by operation processing circuit 11, and next, upper average value vm1 in parts having a level higher than the all average value and lower average value vm2 in parts having a level lower than the all average value in signal waveform vx are operated and stored by operation processing circuit 11. Next, the position of pattern boundaries of mask 7 is obtained from these numeric values according to a prescribed method. Consequently, pattern boundaries can be detected accurately and rapidly even if noise is included in output signals of signal amplifier 9.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15643078A JPS5583807A (en) | 1978-12-20 | 1978-12-20 | Mask inspection unit using electron beam |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15643078A JPS5583807A (en) | 1978-12-20 | 1978-12-20 | Mask inspection unit using electron beam |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5583807A true JPS5583807A (en) | 1980-06-24 |
Family
ID=15627566
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15643078A Pending JPS5583807A (en) | 1978-12-20 | 1978-12-20 | Mask inspection unit using electron beam |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5583807A (en) |
-
1978
- 1978-12-20 JP JP15643078A patent/JPS5583807A/en active Pending
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