JPS5583807A - Mask inspection unit using electron beam - Google Patents

Mask inspection unit using electron beam

Info

Publication number
JPS5583807A
JPS5583807A JP15643078A JP15643078A JPS5583807A JP S5583807 A JPS5583807 A JP S5583807A JP 15643078 A JP15643078 A JP 15643078A JP 15643078 A JP15643078 A JP 15643078A JP S5583807 A JPS5583807 A JP S5583807A
Authority
JP
Japan
Prior art keywords
average value
parts
processing circuit
operation processing
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15643078A
Other languages
Japanese (ja)
Inventor
Hisamasa Tsuyuki
Yukichi Ueno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP15643078A priority Critical patent/JPS5583807A/en
Publication of JPS5583807A publication Critical patent/JPS5583807A/en
Pending legal-status Critical Current

Links

Landscapes

  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE: To make mask pattern boundary detection rapid and accurate by operating an all average value of signal waves obtained from a secondary electron detector, an average value in parts having a level higher than the all average value, and an average value in parts having a level lower than the all average value.
CONSTITUTION: Secondary electrons generated from the surface of mask 7 are detected by secondary electron detector 8 and are amplified by signal amplifier 9 and are inputted to operation processing circuit 11 through A/D converter. Since noise is included in the output of amplifier 9 as shown in signal waveform vx, all average value vav is operated and stored by operation processing circuit 11, and next, upper average value vm1 in parts having a level higher than the all average value and lower average value vm2 in parts having a level lower than the all average value in signal waveform vx are operated and stored by operation processing circuit 11. Next, the position of pattern boundaries of mask 7 is obtained from these numeric values according to a prescribed method. Consequently, pattern boundaries can be detected accurately and rapidly even if noise is included in output signals of signal amplifier 9.
COPYRIGHT: (C)1980,JPO&Japio
JP15643078A 1978-12-20 1978-12-20 Mask inspection unit using electron beam Pending JPS5583807A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15643078A JPS5583807A (en) 1978-12-20 1978-12-20 Mask inspection unit using electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15643078A JPS5583807A (en) 1978-12-20 1978-12-20 Mask inspection unit using electron beam

Publications (1)

Publication Number Publication Date
JPS5583807A true JPS5583807A (en) 1980-06-24

Family

ID=15627566

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15643078A Pending JPS5583807A (en) 1978-12-20 1978-12-20 Mask inspection unit using electron beam

Country Status (1)

Country Link
JP (1) JPS5583807A (en)

Similar Documents

Publication Publication Date Title
JPS54143670A (en) Distance measuring system
JPS57138208A (en) Power detecting circuit and gain control circuit using it
JPS5571024A (en) Mark sensing method
JPS5583807A (en) Mask inspection unit using electron beam
JPS5780649A (en) Electron ray energy analyzer
JPS56150303A (en) Surface form measuring device using scan-type electronic microscope
JPS5513874A (en) Measuring method for distribution of electron beam current density
JPS5459169A (en) Size measuring apparatus
JPS5637501A (en) Micropattern measuring method by electron beam
JPS5495067A (en) Mill coating detection method
JPS57164605A (en) Amplifier
JPS5266380A (en) Inspection of patterns
JPS567429A (en) Patterning device
JPS5541668A (en) Detecting method of character position
JPS56153732A (en) Method for exposure of electronic beam
JPS5672317A (en) Detector for knocking oscillation
JPS5365668A (en) Electron beam exposure device
JPS558657A (en) Signal delay circuit
JPS5618424A (en) Apparatus for electron beam lithography
JPS53135667A (en) Position detecting method of emitter
JPS5759108A (en) Mark position detecting method for electron beam exposure
JPS5569076A (en) Measurement system for charge beam shape
JPS53124023A (en) Noise deletion circuit
JPS53130927A (en) Noise rejecting circuit
JPS52117546A (en) Position matching method of emitter