JPS5617058A - Semiconductor integrated circuit - Google Patents
Semiconductor integrated circuitInfo
- Publication number
- JPS5617058A JPS5617058A JP9256079A JP9256079A JPS5617058A JP S5617058 A JPS5617058 A JP S5617058A JP 9256079 A JP9256079 A JP 9256079A JP 9256079 A JP9256079 A JP 9256079A JP S5617058 A JPS5617058 A JP S5617058A
- Authority
- JP
- Japan
- Prior art keywords
- circuit
- type
- layer
- diffused
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0214—Particular design considerations for integrated circuits for internal polarisation, e.g. I2L
- H01L27/0229—Particular design considerations for integrated circuits for internal polarisation, e.g. I2L of bipolar structures
- H01L27/0233—Integrated injection logic structures [I2L]
- H01L27/0244—I2L structures integrated in combination with analog structures
Abstract
PURPOSE:To reduce the leakage current of I<2>L circuit by forming the impurity density of the injector and the base of the I<2>L circuit when coexisting the I<2>L circuit and the bipolar transistor in the same semiconductor substrate. CONSTITUTION:Two N<+>-type buried layers 4 are diffused in a P-type Si substrate 1, an N-type layer 2 is epitaxially grown on the entire surface including the layer 4, an intruded P<+>-type region 3 is diffused in the substrate 1 to obtain the layer 2 isolated into island state including the layer 4, one is used as the I<2>L gate circuit IT and the other is used as an ordinary linear type longitudinal bipolar transistor circuit LT. Thereafter, a P-type injector region 11 and a base region 12 are diffused in the circuit IT. At that time the impurity density of the regions is selected lower than the density of the P-type base region 13 of the circuit LT formed later. In this manner, even if the diffusing depth is reduced, the leakage current of the I<2>L circuit is reduced. Thereafter, the other regions 14, 15, 15' are formed in these circuits.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9256079A JPS5617058A (en) | 1979-07-23 | 1979-07-23 | Semiconductor integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9256079A JPS5617058A (en) | 1979-07-23 | 1979-07-23 | Semiconductor integrated circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5617058A true JPS5617058A (en) | 1981-02-18 |
Family
ID=14057800
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9256079A Pending JPS5617058A (en) | 1979-07-23 | 1979-07-23 | Semiconductor integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5617058A (en) |
-
1979
- 1979-07-23 JP JP9256079A patent/JPS5617058A/en active Pending
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