JPS5617021A - Surface treatment of substrate - Google Patents
Surface treatment of substrateInfo
- Publication number
- JPS5617021A JPS5617021A JP9226679A JP9226679A JPS5617021A JP S5617021 A JPS5617021 A JP S5617021A JP 9226679 A JP9226679 A JP 9226679A JP 9226679 A JP9226679 A JP 9226679A JP S5617021 A JPS5617021 A JP S5617021A
- Authority
- JP
- Japan
- Prior art keywords
- substrates
- plate
- solution
- substrate
- bubbles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10P52/00—
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9226679A JPS5617021A (en) | 1979-07-20 | 1979-07-20 | Surface treatment of substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9226679A JPS5617021A (en) | 1979-07-20 | 1979-07-20 | Surface treatment of substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5617021A true JPS5617021A (en) | 1981-02-18 |
| JPS6325498B2 JPS6325498B2 (OSRAM) | 1988-05-25 |
Family
ID=14049587
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9226679A Granted JPS5617021A (en) | 1979-07-20 | 1979-07-20 | Surface treatment of substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5617021A (OSRAM) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58123730A (ja) * | 1982-01-18 | 1983-07-23 | Toshiba Corp | 半導体ウエハ−エツチング装置 |
| JPS6386525A (ja) * | 1986-09-30 | 1988-04-16 | Kyushu Denshi Kinzoku Kk | 半導体シリコンウエ−ハのエツチング装置 |
| JPH0160532U (OSRAM) * | 1987-10-13 | 1989-04-17 | ||
| JP2009522771A (ja) * | 2005-12-30 | 2009-06-11 | ラム リサーチ コーポレーション | 基板から汚染を除去するための方法および装置 |
| CN103377878A (zh) * | 2012-04-18 | 2013-10-30 | 三菱电机株式会社 | 凹凸化硅基板的制造方法、处理装置和太阳能电池元件的制造方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5093775A (OSRAM) * | 1973-12-19 | 1975-07-26 | ||
| JPS5110770A (en) * | 1974-07-16 | 1976-01-28 | Matsushita Electric Industrial Co Ltd | Etsuchinguhoho |
| JPS5115977A (en) * | 1974-07-31 | 1976-02-07 | Hitachi Ltd | Banjobutsuno keishaetsuchinguho |
-
1979
- 1979-07-20 JP JP9226679A patent/JPS5617021A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5093775A (OSRAM) * | 1973-12-19 | 1975-07-26 | ||
| JPS5110770A (en) * | 1974-07-16 | 1976-01-28 | Matsushita Electric Industrial Co Ltd | Etsuchinguhoho |
| JPS5115977A (en) * | 1974-07-31 | 1976-02-07 | Hitachi Ltd | Banjobutsuno keishaetsuchinguho |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58123730A (ja) * | 1982-01-18 | 1983-07-23 | Toshiba Corp | 半導体ウエハ−エツチング装置 |
| JPS6386525A (ja) * | 1986-09-30 | 1988-04-16 | Kyushu Denshi Kinzoku Kk | 半導体シリコンウエ−ハのエツチング装置 |
| JPH0160532U (OSRAM) * | 1987-10-13 | 1989-04-17 | ||
| JP2009522771A (ja) * | 2005-12-30 | 2009-06-11 | ラム リサーチ コーポレーション | 基板から汚染を除去するための方法および装置 |
| CN103377878A (zh) * | 2012-04-18 | 2013-10-30 | 三菱电机株式会社 | 凹凸化硅基板的制造方法、处理装置和太阳能电池元件的制造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6325498B2 (OSRAM) | 1988-05-25 |
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