JPS6461918A - Surface treatment equipment - Google Patents
Surface treatment equipmentInfo
- Publication number
- JPS6461918A JPS6461918A JP21780687A JP21780687A JPS6461918A JP S6461918 A JPS6461918 A JP S6461918A JP 21780687 A JP21780687 A JP 21780687A JP 21780687 A JP21780687 A JP 21780687A JP S6461918 A JPS6461918 A JP S6461918A
- Authority
- JP
- Japan
- Prior art keywords
- treated
- substrate
- reaction gas
- reaction
- desorption
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE:To execute anisotropic treatment at speed, which does not depend upon the shape of the surface, by using a treating method through which the supply of a reaction gas to a substrate to be treated and the desorption of a product do not progress simultaneously. CONSTITUTION:A substrate to be treated 7 supported where opposite to a nozzle 4 is supplied with a rection gas 3 carried to the nozzle 4 from a reaction gas vessel 6 as pulses. The substrate to be treated 7 is supplied with the reaction gas 3 changed into pulses, and a surface reaction progresses. Products 8 generated by the reaction are desorbed from the surface during the time when the substrate to be treated 7 is not fed with the reaction gas 3. The desorption of the products 8 is completed, and the substrate to be treated 7 is supplied with the pulses of the succeeding reaction gas 3. Accordingly, the supply of the reaction gas 3, the progress of the surface reaction and the desorption of the products 8 are repeated as non-stationary periodic processes.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21780687A JPS6461918A (en) | 1987-09-02 | 1987-09-02 | Surface treatment equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21780687A JPS6461918A (en) | 1987-09-02 | 1987-09-02 | Surface treatment equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6461918A true JPS6461918A (en) | 1989-03-08 |
Family
ID=16710029
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21780687A Pending JPS6461918A (en) | 1987-09-02 | 1987-09-02 | Surface treatment equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6461918A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0897193A (en) * | 1994-02-15 | 1996-04-12 | At & T Corp | Manufacture of semiconductor element |
JPH11274115A (en) * | 1998-03-18 | 1999-10-08 | Ebara Corp | Gas polishing method and apparatus therefor |
-
1987
- 1987-09-02 JP JP21780687A patent/JPS6461918A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0897193A (en) * | 1994-02-15 | 1996-04-12 | At & T Corp | Manufacture of semiconductor element |
JPH11274115A (en) * | 1998-03-18 | 1999-10-08 | Ebara Corp | Gas polishing method and apparatus therefor |
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