JPS5616669A - Vacuum deposition method - Google Patents

Vacuum deposition method

Info

Publication number
JPS5616669A
JPS5616669A JP9235779A JP9235779A JPS5616669A JP S5616669 A JPS5616669 A JP S5616669A JP 9235779 A JP9235779 A JP 9235779A JP 9235779 A JP9235779 A JP 9235779A JP S5616669 A JPS5616669 A JP S5616669A
Authority
JP
Japan
Prior art keywords
vapor
drum
cooling
gas
deposited
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9235779A
Other languages
English (en)
Inventor
Noboru Ishida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Shindoh Co Ltd
Original Assignee
Mitsubishi Shindoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Shindoh Co Ltd filed Critical Mitsubishi Shindoh Co Ltd
Priority to JP9235779A priority Critical patent/JPS5616669A/ja
Publication of JPS5616669A publication Critical patent/JPS5616669A/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP9235779A 1979-07-20 1979-07-20 Vacuum deposition method Pending JPS5616669A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9235779A JPS5616669A (en) 1979-07-20 1979-07-20 Vacuum deposition method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9235779A JPS5616669A (en) 1979-07-20 1979-07-20 Vacuum deposition method

Publications (1)

Publication Number Publication Date
JPS5616669A true JPS5616669A (en) 1981-02-17

Family

ID=14052141

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9235779A Pending JPS5616669A (en) 1979-07-20 1979-07-20 Vacuum deposition method

Country Status (1)

Country Link
JP (1) JPS5616669A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62142333U (ja) * 1986-02-28 1987-09-08

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62142333U (ja) * 1986-02-28 1987-09-08

Similar Documents

Publication Publication Date Title
KR940011707B1 (ko) 승화성물질 진공증착장치
KR850003480A (ko) 투광성 전도박막 침착장치 및 방법
US3986822A (en) Boron nitride crucible
US4058579A (en) Process for producing an improved boron nitride crucible
JPS5616669A (en) Vacuum deposition method
CA2004234A1 (en) Optical fiber production method
JPS54155983A (en) Vacuum deposition plating method
US4196022A (en) Surface hardening method
JP3837782B2 (ja) 酸化アルミニウム蒸着フィルムの製造方法
JPS6468467A (en) Apparatus for producing thin metallic film
JPS60193112A (ja) 磁気ヘツド
JPS54121726A (en) Diaphragm for speakers
JPS5627136A (en) Manufacture of photorecording thin film
JPS6353262B2 (ja)
JPS52116190A (en) Cryostat
JPS6468468A (en) Apparatus for producing thin metallic film
JPS57171662A (en) Method and device for vacuum deposition
JPS5677377A (en) Vapor deposition method
JPS57152545A (en) Manufacture of magnetic recording medium
JPS5634150A (en) Manufacture of magnetic recording medium
JPS546875A (en) Vacuum deposition method
JPS58100672A (ja) 薄膜形成法及びその装置
JPH01172203A (ja) 炭素膜
JPS57152544A (en) Manufacture of magnetic recording medium
JPS6453331A (en) Magnetic recording medium