JPS56162830A - Impurity depositing and diffusing device - Google Patents

Impurity depositing and diffusing device

Info

Publication number
JPS56162830A
JPS56162830A JP5094581A JP5094581A JPS56162830A JP S56162830 A JPS56162830 A JP S56162830A JP 5094581 A JP5094581 A JP 5094581A JP 5094581 A JP5094581 A JP 5094581A JP S56162830 A JPS56162830 A JP S56162830A
Authority
JP
Japan
Prior art keywords
impurity
reaction tube
vacuum
diffusing device
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5094581A
Other languages
Japanese (ja)
Inventor
Hideaki Matsubara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP5094581A priority Critical patent/JPS56162830A/en
Publication of JPS56162830A publication Critical patent/JPS56162830A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation

Landscapes

  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)

Abstract

PURPOSE:To uniformalize the dispersed impurity gas and to improve the yield of an impurity depositing and diffusing device by providing means for evacuating the reaction tube of the device in vacuum and a pressure control valve between the means and a reaction tube. CONSTITUTION:A pressure control valve 4 is provided between a reaction tube 2 having a gas supplying hole 3 and a vacuum evacuating system 5 (8 represents a vacuum system and 7 represents a cold trap) to control the interior of the reaction tube constantly under stabilized reduced pressure state. Since the impurity gas is thus uniformalized, uniform impurity deposited layer (or impurity diffused layer) can be formed with good workability.
JP5094581A 1981-04-03 1981-04-03 Impurity depositing and diffusing device Pending JPS56162830A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5094581A JPS56162830A (en) 1981-04-03 1981-04-03 Impurity depositing and diffusing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5094581A JPS56162830A (en) 1981-04-03 1981-04-03 Impurity depositing and diffusing device

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP15956879A Division JPS5681927A (en) 1979-12-07 1979-12-07 Manufacture of semiconductor device

Publications (1)

Publication Number Publication Date
JPS56162830A true JPS56162830A (en) 1981-12-15

Family

ID=12872953

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5094581A Pending JPS56162830A (en) 1981-04-03 1981-04-03 Impurity depositing and diffusing device

Country Status (1)

Country Link
JP (1) JPS56162830A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6351626A (en) * 1986-08-20 1988-03-04 Nec Corp Semiconductor manufacturing device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6351626A (en) * 1986-08-20 1988-03-04 Nec Corp Semiconductor manufacturing device

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