JPS56158143A - Reduced pressure type vapor phase growing device - Google Patents
Reduced pressure type vapor phase growing deviceInfo
- Publication number
- JPS56158143A JPS56158143A JP6428780A JP6428780A JPS56158143A JP S56158143 A JPS56158143 A JP S56158143A JP 6428780 A JP6428780 A JP 6428780A JP 6428780 A JP6428780 A JP 6428780A JP S56158143 A JPS56158143 A JP S56158143A
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- gas
- tube
- reduced pressure
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6428780A JPS56158143A (en) | 1980-05-12 | 1980-05-12 | Reduced pressure type vapor phase growing device |
DE19813118848 DE3118848C2 (de) | 1980-05-12 | 1981-05-12 | Niederdruck-Beschichtungsvorrichtung |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6428780A JPS56158143A (en) | 1980-05-12 | 1980-05-12 | Reduced pressure type vapor phase growing device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56158143A true JPS56158143A (en) | 1981-12-05 |
JPS6128371B2 JPS6128371B2 (enrdf_load_stackoverflow) | 1986-06-30 |
Family
ID=13253861
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6428780A Granted JPS56158143A (en) | 1980-05-12 | 1980-05-12 | Reduced pressure type vapor phase growing device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56158143A (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6061722U (ja) * | 1983-09-30 | 1985-04-30 | 株式会社島津製作所 | 成膜装置 |
JPS60192327A (ja) * | 1984-03-14 | 1985-09-30 | Toshiba Corp | 半導体製造装置の洗浄方法 |
JPS6114726A (ja) * | 1984-06-29 | 1986-01-22 | Fujitsu Ltd | 半導体基板の処理方法 |
JPS6281032A (ja) * | 1985-10-03 | 1987-04-14 | Matsushita Electric Ind Co Ltd | 半導体装置の製造方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5216482A (en) * | 1975-07-30 | 1977-02-07 | Toshiba Corp | Surface treatment apparatus using activated gas |
-
1980
- 1980-05-12 JP JP6428780A patent/JPS56158143A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5216482A (en) * | 1975-07-30 | 1977-02-07 | Toshiba Corp | Surface treatment apparatus using activated gas |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6061722U (ja) * | 1983-09-30 | 1985-04-30 | 株式会社島津製作所 | 成膜装置 |
JPS60192327A (ja) * | 1984-03-14 | 1985-09-30 | Toshiba Corp | 半導体製造装置の洗浄方法 |
JPS6114726A (ja) * | 1984-06-29 | 1986-01-22 | Fujitsu Ltd | 半導体基板の処理方法 |
JPS6281032A (ja) * | 1985-10-03 | 1987-04-14 | Matsushita Electric Ind Co Ltd | 半導体装置の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6128371B2 (enrdf_load_stackoverflow) | 1986-06-30 |
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