JPS56150880A - Gallium nitride light emitting element chip and manufacture thereof - Google Patents
Gallium nitride light emitting element chip and manufacture thereofInfo
- Publication number
- JPS56150880A JPS56150880A JP5451880A JP5451880A JPS56150880A JP S56150880 A JPS56150880 A JP S56150880A JP 5451880 A JP5451880 A JP 5451880A JP 5451880 A JP5451880 A JP 5451880A JP S56150880 A JPS56150880 A JP S56150880A
- Authority
- JP
- Japan
- Prior art keywords
- type
- grown
- crystal
- light emitting
- emitting element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/8215—Bodies characterised by crystalline imperfections, e.g. dislocations; characterised by the distribution of dopants, e.g. delta-doping
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/013—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
- H10H20/0133—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials
- H10H20/01335—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials the light-emitting regions comprising nitride materials
Landscapes
- Led Devices (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5451880A JPS56150880A (en) | 1980-04-23 | 1980-04-23 | Gallium nitride light emitting element chip and manufacture thereof |
US06/199,097 US4396929A (en) | 1979-10-19 | 1980-10-20 | Gallium nitride light-emitting element and method of manufacturing the same |
US06/480,794 US4476620A (en) | 1979-10-19 | 1983-03-31 | Method of making a gallium nitride light-emitting diode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5451880A JPS56150880A (en) | 1980-04-23 | 1980-04-23 | Gallium nitride light emitting element chip and manufacture thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56150880A true JPS56150880A (en) | 1981-11-21 |
JPS6138875B2 JPS6138875B2 (enrdf_load_stackoverflow) | 1986-09-01 |
Family
ID=12972862
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5451880A Granted JPS56150880A (en) | 1979-10-19 | 1980-04-23 | Gallium nitride light emitting element chip and manufacture thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56150880A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5218216A (en) * | 1987-01-31 | 1993-06-08 | Toyoda Gosei Co., Ltd. | Gallium nitride group semiconductor and light emitting diode comprising it and the process of producing the same |
JP2011171639A (ja) * | 2010-02-22 | 2011-09-01 | Sanken Electric Co Ltd | 半導体装置、半導体ウェハ、半導体装置の製造方法及び半導体ウェハの製造方法 |
JP2015503215A (ja) * | 2011-10-26 | 2015-01-29 | アンヴィル セミコンダクターズ リミテッド | 炭化ケイ素エピタキシャル成長法 |
-
1980
- 1980-04-23 JP JP5451880A patent/JPS56150880A/ja active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5218216A (en) * | 1987-01-31 | 1993-06-08 | Toyoda Gosei Co., Ltd. | Gallium nitride group semiconductor and light emitting diode comprising it and the process of producing the same |
JP2011171639A (ja) * | 2010-02-22 | 2011-09-01 | Sanken Electric Co Ltd | 半導体装置、半導体ウェハ、半導体装置の製造方法及び半導体ウェハの製造方法 |
JP2015503215A (ja) * | 2011-10-26 | 2015-01-29 | アンヴィル セミコンダクターズ リミテッド | 炭化ケイ素エピタキシャル成長法 |
US9520285B2 (en) | 2011-10-26 | 2016-12-13 | Anvil Semiconductors Limited | Silicon carbide epitaxy |
Also Published As
Publication number | Publication date |
---|---|
JPS6138875B2 (enrdf_load_stackoverflow) | 1986-09-01 |
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