JPS56144553A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS56144553A JPS56144553A JP4682080A JP4682080A JPS56144553A JP S56144553 A JPS56144553 A JP S56144553A JP 4682080 A JP4682080 A JP 4682080A JP 4682080 A JP4682080 A JP 4682080A JP S56144553 A JPS56144553 A JP S56144553A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- insulating film
- film
- wiring
- insulating films
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- 238000000034 method Methods 0.000 abstract 3
- 238000001312 dry etching Methods 0.000 abstract 2
- 238000005530 etching Methods 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 239000004020 conductor Substances 0.000 abstract 1
- 230000010354 integration Effects 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 238000005546 reactive sputtering Methods 0.000 abstract 1
- 230000001105 regulatory effect Effects 0.000 abstract 1
Landscapes
- Drying Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Semiconductor Memories (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4682080A JPS56144553A (en) | 1980-04-11 | 1980-04-11 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4682080A JPS56144553A (en) | 1980-04-11 | 1980-04-11 | Manufacture of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56144553A true JPS56144553A (en) | 1981-11-10 |
JPH0338732B2 JPH0338732B2 (enrdf_load_stackoverflow) | 1991-06-11 |
Family
ID=12757966
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4682080A Granted JPS56144553A (en) | 1980-04-11 | 1980-04-11 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56144553A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5984442A (ja) * | 1982-11-04 | 1984-05-16 | Nec Corp | 半導体装置の製造方法 |
JPS6020564A (ja) * | 1983-07-13 | 1985-02-01 | Matsushita Electronics Corp | 半導体装置の製造方法 |
JPS6193627A (ja) * | 1984-10-15 | 1986-05-12 | Mitsubishi Electric Corp | パタ−ンの形成方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5444482A (en) * | 1977-09-14 | 1979-04-07 | Matsushita Electric Ind Co Ltd | Mos type semiconductor device and its manufacture |
-
1980
- 1980-04-11 JP JP4682080A patent/JPS56144553A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5444482A (en) * | 1977-09-14 | 1979-04-07 | Matsushita Electric Ind Co Ltd | Mos type semiconductor device and its manufacture |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5984442A (ja) * | 1982-11-04 | 1984-05-16 | Nec Corp | 半導体装置の製造方法 |
JPS6020564A (ja) * | 1983-07-13 | 1985-02-01 | Matsushita Electronics Corp | 半導体装置の製造方法 |
JPS6193627A (ja) * | 1984-10-15 | 1986-05-12 | Mitsubishi Electric Corp | パタ−ンの形成方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0338732B2 (enrdf_load_stackoverflow) | 1991-06-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS55163860A (en) | Manufacture of semiconductor device | |
EP0288052A3 (en) | Semiconductor device comprising a substrate, and production method thereof | |
EP0316612A3 (en) | Method of manufacturing a semiconductor device with a recess filled with wiring material | |
JPS56144553A (en) | Manufacture of semiconductor device | |
JPS5730376A (en) | Manufacture of schottky barrier fet | |
JPS56122143A (en) | Manufacture of semiconductor device | |
JPS5513904A (en) | Semiconductor device and its manufacturing method | |
JPS6430228A (en) | Manufacture of semiconductor device | |
JPS56125856A (en) | Manufacture of semiconductor device | |
JPS57199237A (en) | Manufacture of semiconductor device | |
JPS56130925A (en) | Manufacture of semiconductor device | |
JPS575329A (en) | Manufacture of semiconductor device | |
JPS57201026A (en) | Manufacture of semiconductor device | |
JPS6484735A (en) | Manufacture of semiconductor device | |
JPS572545A (en) | Manufacture of semiconductor device | |
JPS56104450A (en) | Manufacture of semiconductor device | |
JPS5718362A (en) | Semiconductor device and manufacture thereof | |
JPS57184232A (en) | Manufacture of semiconductor device | |
JPS6420623A (en) | Flattening method | |
JPS57208159A (en) | Semiconductor device and manufacture thereof | |
JPS5555546A (en) | Method of wiring semiconductor device | |
JPS57102050A (en) | Manufacture of semiconductor device | |
JPS5721837A (en) | Manufacture of plural layer wiring structure on integrated circuit | |
JPS6450548A (en) | Manufacture of semiconductor device | |
JPS5754346A (ja) | Taketsushoshirikonhaisensonokeiseihoho |