JPS56138924A - Method of exposure and detection for electron beam - Google Patents
Method of exposure and detection for electron beamInfo
- Publication number
- JPS56138924A JPS56138924A JP4177280A JP4177280A JPS56138924A JP S56138924 A JPS56138924 A JP S56138924A JP 4177280 A JP4177280 A JP 4177280A JP 4177280 A JP4177280 A JP 4177280A JP S56138924 A JPS56138924 A JP S56138924A
- Authority
- JP
- Japan
- Prior art keywords
- blanking
- electron beam
- output
- aperture
- compared
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4177280A JPS56138924A (en) | 1980-03-31 | 1980-03-31 | Method of exposure and detection for electron beam |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4177280A JPS56138924A (en) | 1980-03-31 | 1980-03-31 | Method of exposure and detection for electron beam |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56138924A true JPS56138924A (en) | 1981-10-29 |
Family
ID=12617669
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4177280A Pending JPS56138924A (en) | 1980-03-31 | 1980-03-31 | Method of exposure and detection for electron beam |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56138924A (ja) |
-
1980
- 1980-03-31 JP JP4177280A patent/JPS56138924A/ja active Pending
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