JPS56131962A - Semiconductor device for microwave oscillation - Google Patents

Semiconductor device for microwave oscillation

Info

Publication number
JPS56131962A
JPS56131962A JP3546080A JP3546080A JPS56131962A JP S56131962 A JPS56131962 A JP S56131962A JP 3546080 A JP3546080 A JP 3546080A JP 3546080 A JP3546080 A JP 3546080A JP S56131962 A JPS56131962 A JP S56131962A
Authority
JP
Japan
Prior art keywords
gate electrode
electrode
fet
constitution
capacity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3546080A
Other languages
Japanese (ja)
Inventor
Yoichiro Takayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP3546080A priority Critical patent/JPS56131962A/en
Publication of JPS56131962A publication Critical patent/JPS56131962A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/80Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier
    • H01L29/812Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier with a Schottky gate

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Junction Field-Effect Transistors (AREA)

Abstract

PURPOSE:To integrate the capacity of positive feedback circuit for oscillation with FET in order to miniaturize the device, by covering the gate electrode with insulating film, and overlapping the drain electrode with the intermediary of insulating film. CONSTITUTION:An FET is formed in the manner that; an n type active layer 2 is overlapped on a semi-insulating GaAs substrate 1, CrPt is coated on an Al SchotKy Barrier type gate electrode 3 and AuGe/Ni film 4 for ohmic connection, while providing Au plated drain electrode 6 and source electrode 7. The exposed surface parts of the gate electrode 3 and the active layer 2 are covered by SiO2 8 and the drain electrode 6 is overlapped on the gate electrode 3 with the intermediary of the film 8. In this constitution, the capacity which combines gate and drain in microwave frequency region electrically and enable positive feedback can be obtained, and source electrode 7 is used for grounding. On gate electrode a direct bias pad 9 is provided. In this constitution, the capacity can be united with FET without increasing chip space and also can be miniaturized extremely.
JP3546080A 1980-03-19 1980-03-19 Semiconductor device for microwave oscillation Pending JPS56131962A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3546080A JPS56131962A (en) 1980-03-19 1980-03-19 Semiconductor device for microwave oscillation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3546080A JPS56131962A (en) 1980-03-19 1980-03-19 Semiconductor device for microwave oscillation

Publications (1)

Publication Number Publication Date
JPS56131962A true JPS56131962A (en) 1981-10-15

Family

ID=12442391

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3546080A Pending JPS56131962A (en) 1980-03-19 1980-03-19 Semiconductor device for microwave oscillation

Country Status (1)

Country Link
JP (1) JPS56131962A (en)

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