JPS56126460A - Nozzle plate for liquid injection - Google Patents
Nozzle plate for liquid injectionInfo
- Publication number
- JPS56126460A JPS56126460A JP3027080A JP3027080A JPS56126460A JP S56126460 A JPS56126460 A JP S56126460A JP 3027080 A JP3027080 A JP 3027080A JP 3027080 A JP3027080 A JP 3027080A JP S56126460 A JPS56126460 A JP S56126460A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- etched
- etching
- hole
- nozzle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 title abstract 2
- 238000002347 injection Methods 0.000 title 1
- 239000007924 injection Substances 0.000 title 1
- 238000005530 etching Methods 0.000 abstract 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 239000013078 crystal Substances 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/162—Manufacturing of the nozzle plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- ing And Chemical Polishing (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Nozzles (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3027080A JPS56126460A (en) | 1980-03-12 | 1980-03-12 | Nozzle plate for liquid injection |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3027080A JPS56126460A (en) | 1980-03-12 | 1980-03-12 | Nozzle plate for liquid injection |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56126460A true JPS56126460A (en) | 1981-10-03 |
JPH0364310B2 JPH0364310B2 (enrdf_load_stackoverflow) | 1991-10-04 |
Family
ID=12299002
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3027080A Granted JPS56126460A (en) | 1980-03-12 | 1980-03-12 | Nozzle plate for liquid injection |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56126460A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6183463U (enrdf_load_stackoverflow) * | 1984-11-06 | 1986-06-02 | ||
WO1997034769A1 (fr) * | 1996-03-18 | 1997-09-25 | Seiko Epson Corporation | Tete a jet d'encre et son procede de fabrication |
CN107244145A (zh) * | 2017-06-08 | 2017-10-13 | 翁焕榕 | 喷墨打印头及其喷嘴板、喷墨打印机 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5549275A (en) * | 1978-10-06 | 1980-04-09 | Fuji Xerox Co Ltd | Multi-nozzle orifice plate |
-
1980
- 1980-03-12 JP JP3027080A patent/JPS56126460A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5549275A (en) * | 1978-10-06 | 1980-04-09 | Fuji Xerox Co Ltd | Multi-nozzle orifice plate |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6183463U (enrdf_load_stackoverflow) * | 1984-11-06 | 1986-06-02 | ||
WO1997034769A1 (fr) * | 1996-03-18 | 1997-09-25 | Seiko Epson Corporation | Tete a jet d'encre et son procede de fabrication |
CN107244145A (zh) * | 2017-06-08 | 2017-10-13 | 翁焕榕 | 喷墨打印头及其喷嘴板、喷墨打印机 |
Also Published As
Publication number | Publication date |
---|---|
JPH0364310B2 (enrdf_load_stackoverflow) | 1991-10-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5690525A (en) | Manufacture of semiconductor device | |
JPS5620165A (en) | Formation of pattern | |
JPS56126460A (en) | Nozzle plate for liquid injection | |
JPS57130431A (en) | Manufacture of semiconductor device | |
JPS57202735A (en) | Manufacture of integrated circuit device | |
JPS5595339A (en) | Preparation of semiconductor device | |
JPS5243370A (en) | Method of forming depression in semiconductor substrate | |
JPS57202535A (en) | Formation of negative resist pattern | |
JPS56130252A (en) | Nozzle plate for liquid injection | |
JPS5478980A (en) | Anisotropic etching method | |
JPS5572038A (en) | Preparing semiconductor device | |
JPS5461876A (en) | Etching method of insulation film of semiconductor device | |
JPS57155381A (en) | Wet etching method | |
JPS5635774A (en) | Dry etching method | |
JPS56156792A (en) | Thickly plating method | |
JPS56103444A (en) | Production of element isolation structure for semiconductor device | |
JPS55128830A (en) | Method of working photoresist film | |
JPS5550642A (en) | Preparation of semiconductor device | |
JPS57131371A (en) | Dry etching method | |
JPS57100734A (en) | Etching method for semiconductor substrate | |
JPS56150829A (en) | Manufacture of aperture iris | |
JPS57101668A (en) | Etching method | |
JPS5598828A (en) | Removing method of thin organic film | |
JPS5789477A (en) | Dry etching method | |
JPS5376397A (en) | Photo mask for manufacturing magnetic bubble element |