JPS56125871A - Transistor - Google Patents

Transistor

Info

Publication number
JPS56125871A
JPS56125871A JP3009680A JP3009680A JPS56125871A JP S56125871 A JPS56125871 A JP S56125871A JP 3009680 A JP3009680 A JP 3009680A JP 3009680 A JP3009680 A JP 3009680A JP S56125871 A JPS56125871 A JP S56125871A
Authority
JP
Japan
Prior art keywords
type
region layer
band width
forbidden band
base region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3009680A
Other languages
English (en)
Other versions
JPS5946103B2 (ja
Inventor
Yoshihito Amamiya
Tsuneo Urisu
Yoshihiko Mizushima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP55030096A priority Critical patent/JPS5946103B2/ja
Priority to GB8106548A priority patent/GB2073486B/en
Priority to US06/240,148 priority patent/US4414557A/en
Priority to FR8104268A priority patent/FR2477777B1/fr
Priority to CA000372289A priority patent/CA1157573A/en
Priority to DE3108491A priority patent/DE3108491A1/de
Priority to NLAANVRAGE8101107,A priority patent/NL189272C/xx
Publication of JPS56125871A publication Critical patent/JPS56125871A/ja
Publication of JPS5946103B2 publication Critical patent/JPS5946103B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/0821—Collector regions of bipolar transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/04—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70—Bipolar devices
    • H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73—Bipolar junction transistors
    • H01L29/737—Hetero-junction transistors
    • H01L29/7371—Vertical transistors
    • H01L29/7375—Vertical transistors having an emitter comprising one or more non-monocrystalline elements of group IV, e.g. amorphous silicon, alloys comprising group IV elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70—Bipolar devices
    • H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Bipolar Transistors (AREA)
  • Junction Field-Effect Transistors (AREA)
JP55030096A 1980-03-10 1980-03-10 トランジスタ Expired JPS5946103B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP55030096A JPS5946103B2 (ja) 1980-03-10 1980-03-10 トランジスタ
GB8106548A GB2073486B (en) 1980-03-10 1981-03-02 Bipolar transistors
US06/240,148 US4414557A (en) 1980-03-10 1981-03-03 Bipolar transistors
FR8104268A FR2477777B1 (fr) 1980-03-10 1981-03-04 Transistor bipolaire de puissance
CA000372289A CA1157573A (en) 1980-03-10 1981-03-04 Bipolar transistors
DE3108491A DE3108491A1 (de) 1980-03-10 1981-03-06 Bipolarer transistor
NLAANVRAGE8101107,A NL189272C (nl) 1980-03-10 1981-03-07 Bipolaire transistor.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55030096A JPS5946103B2 (ja) 1980-03-10 1980-03-10 トランジスタ

Publications (2)

Publication Number Publication Date
JPS56125871A true JPS56125871A (en) 1981-10-02
JPS5946103B2 JPS5946103B2 (ja) 1984-11-10

Family

ID=12294243

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55030096A Expired JPS5946103B2 (ja) 1980-03-10 1980-03-10 トランジスタ

Country Status (7)

Country Link
US (1) US4414557A (ja)
JP (1) JPS5946103B2 (ja)
CA (1) CA1157573A (ja)
DE (1) DE3108491A1 (ja)
FR (1) FR2477777B1 (ja)
GB (1) GB2073486B (ja)
NL (1) NL189272C (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59227161A (ja) * 1983-05-25 1984-12-20 アメリカン・テレフォン・アンド・テレグラフ・カムパニー バイポ−ラトランジスタ
JPS60110159A (ja) * 1983-11-21 1985-06-15 Toshiba Corp ヘテロ接合バイポ−ラトランジスタ
JPS60160166A (ja) * 1984-01-30 1985-08-21 Nec Corp ヘテロ接合コレクタを有するバイポ−ラトランジスタ
US4985742A (en) * 1989-07-07 1991-01-15 University Of Colorado Foundation, Inc. High temperature semiconductor devices having at least one gallium nitride layer

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2520157B1 (fr) * 1982-01-18 1985-09-13 Labo Electronique Physique Dispositif semi-conducteur du genre transistor a heterojonction(s)
US4910562A (en) * 1982-04-26 1990-03-20 International Business Machines Corporation Field induced base transistor
JPS5941877A (ja) * 1982-08-31 1984-03-08 Junichi Nishizawa フオトトランジスタ
US4794440A (en) * 1983-05-25 1988-12-27 American Telephone And Telegraph Company, At&T Bell Laboratories Heterojunction bipolar transistor
US4691215A (en) * 1985-01-09 1987-09-01 American Telephone And Telegraph Company Hot electron unipolar transistor with two-dimensional degenerate electron gas base with continuously graded composition compound emitter
GB2191036A (en) * 1986-05-23 1987-12-02 Philips Electronic Associated Hot charge-carrier transistors
SE8704121D0 (sv) * 1987-10-23 1987-10-23 Linkopings Silicon Constructio Transistor
JP3150376B2 (ja) * 1991-09-30 2001-03-26 ローム株式会社 ヘテロ接合バイポーラトランジスタの製法
US5285083A (en) * 1992-04-27 1994-02-08 The University Of British Columbia Inverted heterojunction bipolar device having undoped amorphous silicon layer
US5700701A (en) * 1992-10-30 1997-12-23 Texas Instruments Incorporated Method for reducing junction capacitance and increasing current gain in collector-up bipolar transistors
US5766262A (en) * 1996-03-29 1998-06-16 Mikhail; W. E. Michael Femoral prosthesis with spacer
US6228092B1 (en) 1999-07-29 2001-05-08 W. E. Michael Mikhail System for performing hip prosthesis surgery
US6407617B1 (en) * 1999-11-19 2002-06-18 Matsushita Electric Industrial Co., Ltd. Bias circuit and method of fabricating semiconductor device
US7005702B1 (en) * 2000-05-05 2006-02-28 International Rectifier Corporation IGBT with amorphous silicon transparent collector
CN107516670B (zh) * 2017-08-17 2019-12-10 电子科技大学 一种具有高电流上升率的栅控晶闸管

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2569347A (en) * 1948-06-26 1951-09-25 Bell Telephone Labor Inc Circuit element utilizing semiconductive material
US3780359A (en) * 1971-12-20 1973-12-18 Ibm Bipolar transistor with a heterojunction emitter and a method fabricating the same
JPS5147583B2 (ja) * 1972-12-29 1976-12-15
JPS50128697A (ja) * 1974-03-30 1975-10-09
JPS51128268A (en) * 1975-04-30 1976-11-09 Sony Corp Semiconductor unit
FR2352404A1 (fr) * 1976-05-20 1977-12-16 Comp Generale Electricite Transistor a heterojonction
JPS5368985A (en) * 1976-12-02 1978-06-19 Toshiba Corp Junction type field effect transistor
US4173763A (en) * 1977-06-09 1979-11-06 International Business Machines Corporation Heterojunction tunneling base transistor
US4160258A (en) * 1977-11-18 1979-07-03 Bell Telephone Laboratories, Incorporated Optically coupled linear bilateral transistor
US4254429A (en) * 1978-07-08 1981-03-03 Shunpei Yamazaki Hetero junction semiconductor device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59227161A (ja) * 1983-05-25 1984-12-20 アメリカン・テレフォン・アンド・テレグラフ・カムパニー バイポ−ラトランジスタ
JPS60110159A (ja) * 1983-11-21 1985-06-15 Toshiba Corp ヘテロ接合バイポ−ラトランジスタ
JPH0519809B2 (ja) * 1983-11-21 1993-03-17 Tokyo Shibaura Electric Co
JPS60160166A (ja) * 1984-01-30 1985-08-21 Nec Corp ヘテロ接合コレクタを有するバイポ−ラトランジスタ
US4985742A (en) * 1989-07-07 1991-01-15 University Of Colorado Foundation, Inc. High temperature semiconductor devices having at least one gallium nitride layer

Also Published As

Publication number Publication date
NL189272C (nl) 1993-02-16
GB2073486B (en) 1984-12-19
DE3108491A1 (de) 1982-04-01
NL189272B (nl) 1992-09-16
DE3108491C2 (ja) 1990-03-22
GB2073486A (en) 1981-10-14
FR2477777A1 (fr) 1981-09-11
FR2477777B1 (fr) 1985-09-20
JPS5946103B2 (ja) 1984-11-10
US4414557A (en) 1983-11-08
CA1157573A (en) 1983-11-22
NL8101107A (nl) 1981-10-01

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