JPS56122031A - Positive type photosensitive resin composition - Google Patents

Positive type photosensitive resin composition

Info

Publication number
JPS56122031A
JPS56122031A JP2562980A JP2562980A JPS56122031A JP S56122031 A JPS56122031 A JP S56122031A JP 2562980 A JP2562980 A JP 2562980A JP 2562980 A JP2562980 A JP 2562980A JP S56122031 A JPS56122031 A JP S56122031A
Authority
JP
Japan
Prior art keywords
resin composition
photosensitive resin
compound
unsatd
positive type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2562980A
Other languages
English (en)
Other versions
JPH0145053B2 (ja
Inventor
Yukihiro Hosaka
Yoichi Kamoshita
Yoshiyuki Harita
Toko Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP2562980A priority Critical patent/JPS56122031A/ja
Priority to DE3107526A priority patent/DE3107526C2/de
Priority to IT47903/81A priority patent/IT1170762B/it
Priority to NL8100969A priority patent/NL8100969A/nl
Priority to FR8104081A priority patent/FR2477294A1/fr
Priority to GB8106471A priority patent/GB2073756B/en
Priority to US06/239,339 priority patent/US4384037A/en
Publication of JPS56122031A publication Critical patent/JPS56122031A/ja
Publication of JPH0145053B2 publication Critical patent/JPH0145053B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/22—Compounds containing nitrogen bound to another nitrogen atom
    • C08K5/27—Compounds containing a nitrogen atom bound to two other nitrogen atoms, e.g. diazoamino-compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/22—Compounds containing nitrogen bound to another nitrogen atom
    • C08K5/27—Compounds containing a nitrogen atom bound to two other nitrogen atoms, e.g. diazoamino-compounds
    • C08K5/28—Azides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/315—Compounds containing carbon-to-nitrogen triple bonds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/108—Polyolefin or halogen containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2562980A 1980-03-01 1980-03-01 Positive type photosensitive resin composition Granted JPS56122031A (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2562980A JPS56122031A (en) 1980-03-01 1980-03-01 Positive type photosensitive resin composition
DE3107526A DE3107526C2 (de) 1980-03-01 1981-02-27 Lichtempfindliche Gemische für Positivresists
IT47903/81A IT1170762B (it) 1980-03-01 1981-02-27 Composizione di resina fotosensibile di tipo positivo
NL8100969A NL8100969A (nl) 1980-03-01 1981-02-27 Lichtgevoelig harspreparaat van het positieve type.
FR8104081A FR2477294A1 (fr) 1980-03-01 1981-03-02 Composition de resine photosensible du type positif
GB8106471A GB2073756B (en) 1980-03-01 1981-03-02 Positive type photosensitive resin composition
US06/239,339 US4384037A (en) 1980-03-01 1981-03-02 Positive type photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2562980A JPS56122031A (en) 1980-03-01 1980-03-01 Positive type photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS56122031A true JPS56122031A (en) 1981-09-25
JPH0145053B2 JPH0145053B2 (ja) 1989-10-02

Family

ID=12171151

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2562980A Granted JPS56122031A (en) 1980-03-01 1980-03-01 Positive type photosensitive resin composition

Country Status (7)

Country Link
US (1) US4384037A (ja)
JP (1) JPS56122031A (ja)
DE (1) DE3107526C2 (ja)
FR (1) FR2477294A1 (ja)
GB (1) GB2073756B (ja)
IT (1) IT1170762B (ja)
NL (1) NL8100969A (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57120931A (en) * 1981-01-20 1982-07-28 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
JPS57151939A (en) * 1981-03-16 1982-09-20 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
US7670745B2 (en) 2006-11-02 2010-03-02 Chisso Corporation Alkali soluble polymer and positive working photosensitive resin composition using the same
US8298743B2 (en) 2009-04-16 2012-10-30 Fujifilm Corporation Positive-type photosensitive composition, transparent conductive film, display element and integrated solar battery
US8507171B2 (en) 2009-07-13 2013-08-13 Jnc Corporation Positive photosensitive composition
US8513350B2 (en) 2007-02-28 2013-08-20 Jnc Corporation Positive type photosensitive resin composition

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3305923C2 (de) * 1983-02-21 1986-10-30 Siemens AG, 1000 Berlin und 8000 München Verfahren zum Vorbacken von mit Positiv-Fotolack auf der Basis von Naphtoquinondiazid und Phenolformaldehydharz beschichteten Substraten
US4606999A (en) * 1983-12-21 1986-08-19 Thiokol Corporation Development of positive photoresists using cyclic quaternary ammonium hydroxides
US4556629A (en) * 1983-12-21 1985-12-03 Morton Thiokol, Inc. Developer composition for positive photoresists using solution with cyclic quaternary ammonium hydroxides
JPS61206293A (ja) * 1985-03-08 1986-09-12 日本ペイント株式会社 回路板の製造方法
DE3528929A1 (de) * 1985-08-13 1987-02-26 Hoechst Ag Strahlungsempfindliches gemisch, dieses enthaltendes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefbildern
EP0662636A3 (en) * 1986-10-23 1995-11-22 Ciba Geigy Ag Imaging processes.
JP2593305B2 (ja) * 1987-02-02 1997-03-26 日本ペイント株式会社 ポジ型感光性樹脂組成物
DE3722923A1 (de) * 1987-07-10 1989-01-19 Siemens Ag Photoresistfolie als kleber fuer die verbindung von zwei flachen teilen
US5212043A (en) * 1988-02-17 1993-05-18 Tosho Corporation Photoresist composition comprising a non-aromatic resin having no aromatic structures derived from units of an aliphatic cyclic hydrocarbon and units of maleic anhydride and/or maleimide and a photosensitive agent
JP2538081B2 (ja) * 1988-11-28 1996-09-25 松下電子工業株式会社 現像液及びパタ―ン形成方法
DE58908699D1 (de) * 1989-03-20 1995-01-12 Siemens Ag Verfahren zum Erzeugen einer Photoresiststruktur.
DE58908411D1 (de) * 1989-03-20 1994-10-27 Siemens Ag Hochauflösender Photoresist.
JPH0389353A (ja) * 1989-09-01 1991-04-15 Nippon Paint Co Ltd ポジ型感光性樹脂組成物
JP2712700B2 (ja) * 1990-01-30 1998-02-16 松下電器産業株式会社 パターン形成方法
US5362597A (en) * 1991-05-30 1994-11-08 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive resin composition comprising an epoxy-containing alkali-soluble resin and a naphthoquinone diazide sulfonic acid ester
US5624781A (en) * 1993-05-28 1997-04-29 Kansai Paint Co., Ltd. Positive type anionic electrodeposition photo-resist composition and process for pattern formation using said composition
US5876899A (en) * 1996-09-18 1999-03-02 Shipley Company, L.L.C. Photoresist compositions
JP2000347397A (ja) 1999-06-04 2000-12-15 Jsr Corp 感放射線性樹脂組成物およびその層間絶縁膜への使用
WO2002069040A1 (en) * 2001-02-27 2002-09-06 Shipley Company, Llc Novel polymers, processes for polymer synthesis and photoresist compositions
JP4315013B2 (ja) 2003-08-01 2009-08-19 Ｊｓｒ株式会社 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法
JP5115205B2 (ja) * 2008-01-15 2013-01-09 Ｊｎｃ株式会社 ポジ型感光性重合体組成物
US20110230670A1 (en) * 2008-07-31 2011-09-22 3M Innovation Properties Company Azide compositions and methods of making and using thereof
EP2324076B1 (en) * 2008-07-31 2017-11-01 3M Innovative Properties Company Fluoropolymer compositions and method of making and using thereof

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5474432A (en) * 1977-10-25 1979-06-14 Eastman Kodak Co Method of developing photosensitive quinone diazide composition

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1547437A (fr) * 1966-06-09 1968-11-29 Eastman Kodak Co Produits photogaraphiques pour préparer des images métalliques gravées
US3551154A (en) * 1966-12-28 1970-12-29 Ferrania Spa Light sensitive article comprising a quinone diazide and polymeric binder
US3637384A (en) * 1969-02-17 1972-01-25 Gaf Corp Positive-working diazo-oxide terpolymer photoresists
JPS5114042B2 (ja) * 1972-06-12 1976-05-06
US3900325A (en) * 1972-06-12 1975-08-19 Shipley Co Light sensitive quinone diazide composition with n-3-oxohydrocarbon substituted acrylamide
JPS5024641B2 (ja) * 1972-10-17 1975-08-18
US4164421A (en) * 1972-12-09 1979-08-14 Fuji Photo Film Co., Ltd. Photocurable composition containing an o-quinonodiazide for printing plate
DE2720228B2 (de) * 1976-05-06 1979-10-18 Japan Synthetic Rubber Co., Ltd., Tokio Photopolymerisierbares Gemisch und seine Verwendung
US4102686A (en) * 1977-02-25 1978-07-25 Polychrome Corporation Lithographic photosensitive compositions comprising acrylonitrile-butadiene-styrene terpolymer and novolak resin
US4177074A (en) * 1978-01-25 1979-12-04 E. I. Du Pont De Nemours And Company Butadiene/acrylonitrile photosensitive, elastomeric polymer compositions for flexographic printing plates
JPS55527A (en) * 1978-06-16 1980-01-05 Fuji Photo Film Co Ltd Photosensitive planographic plate

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5474432A (en) * 1977-10-25 1979-06-14 Eastman Kodak Co Method of developing photosensitive quinone diazide composition

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57120931A (en) * 1981-01-20 1982-07-28 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
JPH0145613B2 (ja) * 1981-01-20 1989-10-04 Japan Synthetic Rubber Co Ltd
JPS57151939A (en) * 1981-03-16 1982-09-20 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
JPH0145614B2 (ja) * 1981-03-16 1989-10-04 Japan Synthetic Rubber Co Ltd
US7670745B2 (en) 2006-11-02 2010-03-02 Chisso Corporation Alkali soluble polymer and positive working photosensitive resin composition using the same
US8513350B2 (en) 2007-02-28 2013-08-20 Jnc Corporation Positive type photosensitive resin composition
US8298743B2 (en) 2009-04-16 2012-10-30 Fujifilm Corporation Positive-type photosensitive composition, transparent conductive film, display element and integrated solar battery
US8507171B2 (en) 2009-07-13 2013-08-13 Jnc Corporation Positive photosensitive composition

Also Published As

Publication number Publication date
NL8100969A (nl) 1981-10-01
GB2073756A (en) 1981-10-21
US4384037A (en) 1983-05-17
JPH0145053B2 (ja) 1989-10-02
IT1170762B (it) 1987-06-03
IT8147903A0 (it) 1981-02-27
DE3107526C2 (de) 1985-07-11
GB2073756B (en) 1984-06-27
FR2477294A1 (fr) 1981-09-04
DE3107526A1 (de) 1981-12-24
FR2477294B1 (ja) 1983-03-11

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