JPS56114950A - Method for correcting mask pattern defect - Google Patents

Method for correcting mask pattern defect

Info

Publication number
JPS56114950A
JPS56114950A JP1885780A JP1885780A JPS56114950A JP S56114950 A JPS56114950 A JP S56114950A JP 1885780 A JP1885780 A JP 1885780A JP 1885780 A JP1885780 A JP 1885780A JP S56114950 A JPS56114950 A JP S56114950A
Authority
JP
Japan
Prior art keywords
layer
pattern
mask
defect
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1885780A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6142261B2 (enrdf_load_stackoverflow
Inventor
Yoji Masuko
Nobufumi Komori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP1885780A priority Critical patent/JPS56114950A/ja
Publication of JPS56114950A publication Critical patent/JPS56114950A/ja
Publication of JPS6142261B2 publication Critical patent/JPS6142261B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G03F1/74—Repair or correction of mask defects by charged particle beam [CPB], e.g. focused ion beam

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP1885780A 1980-02-18 1980-02-18 Method for correcting mask pattern defect Granted JPS56114950A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1885780A JPS56114950A (en) 1980-02-18 1980-02-18 Method for correcting mask pattern defect

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1885780A JPS56114950A (en) 1980-02-18 1980-02-18 Method for correcting mask pattern defect

Publications (2)

Publication Number Publication Date
JPS56114950A true JPS56114950A (en) 1981-09-09
JPS6142261B2 JPS6142261B2 (enrdf_load_stackoverflow) 1986-09-19

Family

ID=11983203

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1885780A Granted JPS56114950A (en) 1980-02-18 1980-02-18 Method for correcting mask pattern defect

Country Status (1)

Country Link
JP (1) JPS56114950A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2547111A1 (fr) * 1983-05-31 1984-12-07 American Telephone & Telegraph Procede de correction de masques lithographiques
US4950498A (en) * 1986-02-24 1990-08-21 Seiko Instruments Inc. Process for repairing pattern film

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2547111A1 (fr) * 1983-05-31 1984-12-07 American Telephone & Telegraph Procede de correction de masques lithographiques
US4950498A (en) * 1986-02-24 1990-08-21 Seiko Instruments Inc. Process for repairing pattern film

Also Published As

Publication number Publication date
JPS6142261B2 (enrdf_load_stackoverflow) 1986-09-19

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