JPS56114323A - Method for electron beam lighography - Google Patents

Method for electron beam lighography

Info

Publication number
JPS56114323A
JPS56114323A JP1725480A JP1725480A JPS56114323A JP S56114323 A JPS56114323 A JP S56114323A JP 1725480 A JP1725480 A JP 1725480A JP 1725480 A JP1725480 A JP 1725480A JP S56114323 A JPS56114323 A JP S56114323A
Authority
JP
Japan
Prior art keywords
substrate
electron beam
highly accurate
chloride
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1725480A
Other languages
Japanese (ja)
Inventor
Akizo Hideyama
Akira Miura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP1725480A priority Critical patent/JPS56114323A/en
Publication of JPS56114323A publication Critical patent/JPS56114323A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/093—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antistatic means, e.g. for charge depletion

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To prevent electric charging and to perform highly accurate describing by immersing the substrate, on which an electron beam resist film is deposited, into the solution of metal chloride or complex salt, and imparting the conductivity on the surface. CONSTITUTION:A PMMA resin film is applied on the mask which is formed by evaporating Cr on the glass substrate as the electron beam resist film by rotating the substrate. The substrate is immersed in a solution of 0.2-20% concentration which is prepared by resolving palladium chloride, tin chloride, and the like in hydrochloric acid, or by resolving copper chloride in ethyl alcohol for about 5- 10min and is washed with water for about 5min. Since the conductivity is imparted to all the surface of the substrate, the highly accurate pattern can be described by the electron beam. After the description, the unnecessary metal compound is removed by the solution of said metal compound, and the substrate is washed with water. Cr is etched by said resistmask. In this constitution, the highly accurate description becomes possible by the very simple method, a many number of substrate can be uniformly treated, and the mass production of LSIs having fine patterns can be accomplished advantageously.
JP1725480A 1980-02-15 1980-02-15 Method for electron beam lighography Pending JPS56114323A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1725480A JPS56114323A (en) 1980-02-15 1980-02-15 Method for electron beam lighography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1725480A JPS56114323A (en) 1980-02-15 1980-02-15 Method for electron beam lighography

Publications (1)

Publication Number Publication Date
JPS56114323A true JPS56114323A (en) 1981-09-08

Family

ID=11938817

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1725480A Pending JPS56114323A (en) 1980-02-15 1980-02-15 Method for electron beam lighography

Country Status (1)

Country Link
JP (1) JPS56114323A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6074521A (en) * 1983-09-30 1985-04-26 Toshiba Corp Pattern forming process
JPS6399525A (en) * 1986-10-16 1988-04-30 Matsushita Electric Ind Co Ltd Pattern forming method
US5019485A (en) * 1988-10-13 1991-05-28 Fujitsu Limited Process of using an electrically conductive layer-providing composition for formation of resist patterns

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6074521A (en) * 1983-09-30 1985-04-26 Toshiba Corp Pattern forming process
JPS6399525A (en) * 1986-10-16 1988-04-30 Matsushita Electric Ind Co Ltd Pattern forming method
JPH06105677B2 (en) * 1986-10-16 1994-12-21 松下電器産業株式会社 Pattern formation method
US5019485A (en) * 1988-10-13 1991-05-28 Fujitsu Limited Process of using an electrically conductive layer-providing composition for formation of resist patterns

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