JPS56108257A - Semiconductor integrated circuit device - Google Patents
Semiconductor integrated circuit deviceInfo
- Publication number
- JPS56108257A JPS56108257A JP993080A JP993080A JPS56108257A JP S56108257 A JPS56108257 A JP S56108257A JP 993080 A JP993080 A JP 993080A JP 993080 A JP993080 A JP 993080A JP S56108257 A JPS56108257 A JP S56108257A
- Authority
- JP
- Japan
- Prior art keywords
- region
- type
- substrate
- regions
- channel mos
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
- H10D84/85—Complementary IGFETs, e.g. CMOS
- H10D84/854—Complementary IGFETs, e.g. CMOS comprising arrangements for preventing bipolar actions between the different IGFET regions, e.g. arrangements for latchup prevention
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP993080A JPS56108257A (en) | 1980-02-01 | 1980-02-01 | Semiconductor integrated circuit device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP993080A JPS56108257A (en) | 1980-02-01 | 1980-02-01 | Semiconductor integrated circuit device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56108257A true JPS56108257A (en) | 1981-08-27 |
| JPS6255308B2 JPS6255308B2 (enrdf_load_stackoverflow) | 1987-11-19 |
Family
ID=11733775
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP993080A Granted JPS56108257A (en) | 1980-02-01 | 1980-02-01 | Semiconductor integrated circuit device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56108257A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5852869A (ja) * | 1981-09-24 | 1983-03-29 | Nec Corp | 半導体装置 |
| JPS61500818A (ja) * | 1983-12-21 | 1986-04-24 | ハ−トマン,セドリツク | ランプと該ランプを支持する支持装置 |
-
1980
- 1980-02-01 JP JP993080A patent/JPS56108257A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5852869A (ja) * | 1981-09-24 | 1983-03-29 | Nec Corp | 半導体装置 |
| JPS61500818A (ja) * | 1983-12-21 | 1986-04-24 | ハ−トマン,セドリツク | ランプと該ランプを支持する支持装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6255308B2 (enrdf_load_stackoverflow) | 1987-11-19 |
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