JPS56101786A - Light emitting semiconductor device and manufacture thereof - Google Patents

Light emitting semiconductor device and manufacture thereof

Info

Publication number
JPS56101786A
JPS56101786A JP487480A JP487480A JPS56101786A JP S56101786 A JPS56101786 A JP S56101786A JP 487480 A JP487480 A JP 487480A JP 487480 A JP487480 A JP 487480A JP S56101786 A JPS56101786 A JP S56101786A
Authority
JP
Japan
Prior art keywords
epitaxial layer
type epitaxial
light emitting
elements
band
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP487480A
Other languages
Japanese (ja)
Other versions
JPS6244716B2 (en
Inventor
Susumu Furuike
Toshio Matsuda
Hitoo Iwasa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP487480A priority Critical patent/JPS56101786A/en
Publication of JPS56101786A publication Critical patent/JPS56101786A/en
Publication of JPS6244716B2 publication Critical patent/JPS6244716B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/0004Devices characterised by their operation
    • H01L33/002Devices characterised by their operation having heterojunctions or graded gap

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Led Devices (AREA)

Abstract

PURPOSE:To obtain a light emitting semiconductor device with very high light emitting efficiency by reducing absorbing effect in the crystals in a silicon-doped GaAs LED. CONSTITUTION:On a group III-V compound semiconductor substrate, a P type epitaxial layer including group IV elements such as Si, Ge, Sn, etc., and an N type epitaxial layer including group VI elements such as Te, Se, S, etc., are laminated. A P-N junction is formed between the two epitaxial layers, and near the P-N junction in the P type epitaxial layer, group IV elements are doped to a high concentration and band tailing is increased than in other parts. When a silicon-doped GaAs LED is constructed in such a way, band tailing in a P type epitaxial layer 5 except the part 7 of a P type GaAs epitaxial layer becomes small and the energy EP between the conduction band and the filled band becomes larger than EO. In the N type epitaxial layer on the other hand, an impurity level formed by, for example, To becomes shallow and the energy EN between the bands becomes larger than EO, and absorbing effect is reduced.
JP487480A 1980-01-18 1980-01-18 Light emitting semiconductor device and manufacture thereof Granted JPS56101786A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP487480A JPS56101786A (en) 1980-01-18 1980-01-18 Light emitting semiconductor device and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP487480A JPS56101786A (en) 1980-01-18 1980-01-18 Light emitting semiconductor device and manufacture thereof

Publications (2)

Publication Number Publication Date
JPS56101786A true JPS56101786A (en) 1981-08-14
JPS6244716B2 JPS6244716B2 (en) 1987-09-22

Family

ID=11595809

Family Applications (1)

Application Number Title Priority Date Filing Date
JP487480A Granted JPS56101786A (en) 1980-01-18 1980-01-18 Light emitting semiconductor device and manufacture thereof

Country Status (1)

Country Link
JP (1) JPS56101786A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001244501A (en) * 2000-02-28 2001-09-07 Showa Denko Kk Epitaxial wafer for infrared-emitting diode and light emitting diode formed thereof

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5185388A (en) * 1975-01-24 1976-07-26 Hitachi Ltd gaas sekigaihatsukodaioodo

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5185388A (en) * 1975-01-24 1976-07-26 Hitachi Ltd gaas sekigaihatsukodaioodo

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001244501A (en) * 2000-02-28 2001-09-07 Showa Denko Kk Epitaxial wafer for infrared-emitting diode and light emitting diode formed thereof

Also Published As

Publication number Publication date
JPS6244716B2 (en) 1987-09-22

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