JPS5730380A - Optical semiconductor device - Google Patents
Optical semiconductor deviceInfo
- Publication number
- JPS5730380A JPS5730380A JP10415180A JP10415180A JPS5730380A JP S5730380 A JPS5730380 A JP S5730380A JP 10415180 A JP10415180 A JP 10415180A JP 10415180 A JP10415180 A JP 10415180A JP S5730380 A JPS5730380 A JP S5730380A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- semiconductor device
- ainp
- optical semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title abstract 3
- 239000004065 semiconductor Substances 0.000 title abstract 3
- 150000001875 compounds Chemical class 0.000 abstract 4
- 239000000758 substrate Substances 0.000 abstract 3
- 239000012535 impurity Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
- H01L31/103—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier being of the PN homojunction type
- H01L31/1035—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier being of the PN homojunction type the devices comprising active layers formed only by AIIIBV compounds
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Light Receiving Elements (AREA)
Abstract
PURPOSE:To increase the width of a depletion layer of an optical semiconductor device and to improve the photodetecting efficiency of the device by forming a P<+> type layer on an N<-> type In1-xGaxAs1-yPy 4 elements compound layer of low impurity layer having no miss-fitting dislocation. CONSTITUTION:In an optical semiconductor device, In1-xGaxAs1-yPy 4 elements compound layer 2 is laminated directly in contact with an InP substrate of an InP epitaxial layer 1, and a P<+> type layer 3, guard ring 4, P type side a electrode 5 and N type side electrode 6 are then formed. The 4 elements compound layer 2 has 0.1-0.3% of miss-fitting amount (a4element-aInP).100/aInP, where the lattice constant of the four elements compounds at ambient temperature in a perpendicular direction to the surface of the substrate is represented by a4element and the lattice constant of the InP at ambient temperature in the perpendicular direction to the surface of the substrate is represented by aInP. The layer 2 is formed in a thickess larger than 5mum.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10415180A JPS5730380A (en) | 1980-07-29 | 1980-07-29 | Optical semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10415180A JPS5730380A (en) | 1980-07-29 | 1980-07-29 | Optical semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5730380A true JPS5730380A (en) | 1982-02-18 |
JPS6259472B2 JPS6259472B2 (en) | 1987-12-11 |
Family
ID=14373064
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10415180A Granted JPS5730380A (en) | 1980-07-29 | 1980-07-29 | Optical semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5730380A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61172381A (en) * | 1984-12-22 | 1986-08-04 | Fujitsu Ltd | Inp group compound semiconductor device |
-
1980
- 1980-07-29 JP JP10415180A patent/JPS5730380A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61172381A (en) * | 1984-12-22 | 1986-08-04 | Fujitsu Ltd | Inp group compound semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPS6259472B2 (en) | 1987-12-11 |
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