JPS5589738A - Auger electron photometry unit - Google Patents

Auger electron photometry unit

Info

Publication number
JPS5589738A
JPS5589738A JP16175978A JP16175978A JPS5589738A JP S5589738 A JPS5589738 A JP S5589738A JP 16175978 A JP16175978 A JP 16175978A JP 16175978 A JP16175978 A JP 16175978A JP S5589738 A JPS5589738 A JP S5589738A
Authority
JP
Japan
Prior art keywords
location
fed
electrons
signal
analyzed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16175978A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6233546B2 (enrdf_load_stackoverflow
Inventor
Yuji Sakai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP16175978A priority Critical patent/JPS5589738A/ja
Publication of JPS5589738A publication Critical patent/JPS5589738A/ja
Publication of JPS6233546B2 publication Critical patent/JPS6233546B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/227Measuring photoelectric effect, e.g. photoelectron emission microscopy [PEEM]

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP16175978A 1978-12-28 1978-12-28 Auger electron photometry unit Granted JPS5589738A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16175978A JPS5589738A (en) 1978-12-28 1978-12-28 Auger electron photometry unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16175978A JPS5589738A (en) 1978-12-28 1978-12-28 Auger electron photometry unit

Publications (2)

Publication Number Publication Date
JPS5589738A true JPS5589738A (en) 1980-07-07
JPS6233546B2 JPS6233546B2 (enrdf_load_stackoverflow) 1987-07-21

Family

ID=15741345

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16175978A Granted JPS5589738A (en) 1978-12-28 1978-12-28 Auger electron photometry unit

Country Status (1)

Country Link
JP (1) JPS5589738A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02262040A (ja) * 1989-03-31 1990-10-24 Jeol Ltd スペクトル情報に基づく自動定性分析方法
JPH07183343A (ja) * 1993-12-24 1995-07-21 Nec Corp X線光電子分光分析装置
JP2011520126A (ja) * 2008-05-08 2011-07-14 ケーエルエー−テンカー・コーポレーション その場差分光法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02262040A (ja) * 1989-03-31 1990-10-24 Jeol Ltd スペクトル情報に基づく自動定性分析方法
JPH07183343A (ja) * 1993-12-24 1995-07-21 Nec Corp X線光電子分光分析装置
JP2011520126A (ja) * 2008-05-08 2011-07-14 ケーエルエー−テンカー・コーポレーション その場差分光法

Also Published As

Publication number Publication date
JPS6233546B2 (enrdf_load_stackoverflow) 1987-07-21

Similar Documents

Publication Publication Date Title
GB2021789A (en) Monitoring voltage using an electron beam probe
JPS5589738A (en) Auger electron photometry unit
JPS556829A (en) Electron beam exposure method
JPS5260686A (en) X-ray photoelectronic analysis
JPS556737A (en) Scan electron microscope
GB2014304A (en) Avoiding Drift in Flame Photometers
JPS5438787A (en) X-ray source apparatus
JPS5618424A (en) Apparatus for electron beam lithography
JPS5412256A (en) Detector for electron beam
JPS5563822A (en) Electron beam device
JPS5483878A (en) Smoke sensor
JPS54145592A (en) X-ray analyzer
JPS5546421A (en) Mass spectrometer
JPS53120277A (en) Electron beam exposure device
JPS566363A (en) Regulation of electron gun
JPS53113480A (en) Reflecting electron beam detector
JPS6417366A (en) Electron beam and x-ray detector
JPS55117949A (en) Auger electron spectroscopic analysis method
JPS52127390A (en) Energy analyzer for secondary electron
JPS5397895A (en) X-ray analyzer
JPS56133829A (en) Control for beam width
JPS5676154A (en) Automatic sensitivity controller for mass spectrometer
JPS57143253A (en) Analytical electron microscope
JPS5390766A (en) Exposure method
JPS5794637A (en) Electronic spectroscope