JPS5574538A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
JPS5574538A
JPS5574538A JP14787278A JP14787278A JPS5574538A JP S5574538 A JPS5574538 A JP S5574538A JP 14787278 A JP14787278 A JP 14787278A JP 14787278 A JP14787278 A JP 14787278A JP S5574538 A JPS5574538 A JP S5574538A
Authority
JP
Japan
Prior art keywords
white light
light illumination
cyclized
under white
darkroom
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14787278A
Other languages
English (en)
Other versions
JPS6214821B2 (ja
Inventor
Takao Iwayagi
Takahiro Kobashi
Saburo Nonogaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP14787278A priority Critical patent/JPS5574538A/ja
Priority to DE2948324A priority patent/DE2948324C2/de
Publication of JPS5574538A publication Critical patent/JPS5574538A/ja
Priority to US06/484,847 priority patent/US4469778A/en
Publication of JPS6214821B2 publication Critical patent/JPS6214821B2/ja
Granted legal-status Critical Current

Links

JP14787278A 1978-12-01 1978-12-01 Photosensitive composition Granted JPS5574538A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP14787278A JPS5574538A (en) 1978-12-01 1978-12-01 Photosensitive composition
DE2948324A DE2948324C2 (de) 1978-12-01 1979-11-30 Lichtempfindliches Gemisch, enthaltend eine Bisazidverbindung, und Verfahren zur Bildung von Mustern
US06/484,847 US4469778A (en) 1978-12-01 1983-04-14 Pattern formation method utilizing deep UV radiation and bisazide composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14787278A JPS5574538A (en) 1978-12-01 1978-12-01 Photosensitive composition

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP26105985A Division JPS61210064A (ja) 1985-11-22 1985-11-22 ビスアジド化合物

Publications (2)

Publication Number Publication Date
JPS5574538A true JPS5574538A (en) 1980-06-05
JPS6214821B2 JPS6214821B2 (ja) 1987-04-03

Family

ID=15440135

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14787278A Granted JPS5574538A (en) 1978-12-01 1978-12-01 Photosensitive composition

Country Status (1)

Country Link
JP (1) JPS5574538A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5744143A (en) * 1980-08-29 1982-03-12 Tokyo Ohka Kogyo Co Ltd Composition and method for forming micropattern
JPS5940641A (ja) * 1982-08-31 1984-03-06 Toshiba Corp 高解像度用ネガ型フオトレジスト組成物

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102319349B1 (ko) 2020-01-09 2021-10-28 엘지전자 주식회사 모터 조립체 및 이를 포함하는 왕복동식 압축기

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5040010A (ja) * 1973-07-12 1975-04-12
JPS5337763A (en) * 1976-09-20 1978-04-07 Asahi Dow Ltd Injection molding machine

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5040010A (ja) * 1973-07-12 1975-04-12
JPS5337763A (en) * 1976-09-20 1978-04-07 Asahi Dow Ltd Injection molding machine

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5744143A (en) * 1980-08-29 1982-03-12 Tokyo Ohka Kogyo Co Ltd Composition and method for forming micropattern
JPS6341047B2 (ja) * 1980-08-29 1988-08-15 Tokyo Oka Kogyo Kk
JPS5940641A (ja) * 1982-08-31 1984-03-06 Toshiba Corp 高解像度用ネガ型フオトレジスト組成物
JPH0544663B2 (ja) * 1982-08-31 1993-07-07 Toshiba Kk

Also Published As

Publication number Publication date
JPS6214821B2 (ja) 1987-04-03

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