JPS5574158A - Preparing semiconductor device - Google Patents

Preparing semiconductor device

Info

Publication number
JPS5574158A
JPS5574158A JP14838678A JP14838678A JPS5574158A JP S5574158 A JPS5574158 A JP S5574158A JP 14838678 A JP14838678 A JP 14838678A JP 14838678 A JP14838678 A JP 14838678A JP S5574158 A JPS5574158 A JP S5574158A
Authority
JP
Japan
Prior art keywords
substrate
glass
bonded
resin film
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14838678A
Other languages
Japanese (ja)
Inventor
Ideo Maeyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP14838678A priority Critical patent/JPS5574158A/en
Publication of JPS5574158A publication Critical patent/JPS5574158A/en
Pending legal-status Critical Current

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Abstract

PURPOSE: To effectively produce a high-quality semiconductor device by using laser to scribe the surface of a semiconductor substrate whose back face is bonded to a substrate.
CONSTITUTION: An Si substrate 1 is coated with a transparent adhesive resin film 7. A transparent glass substrate 11 is bonded to the back surface of the Si substrate 1 while pressing the sybstrate 1 a little to correct its bending. Using the glass 11 as a support, the Si substrate 1 undergoes vaccum deposition to form diode elements 6. Laser beam is irradiated on the boundary between the diodes 6 to form V grooves 8. The resin film 7 is dissolved by organic solvent to remove the glass substrate 11. Then, common methods are used for precessing. Even if laser irradiation shifts slightly to approach the glass protection layers 4 and pn-junction 1J, this construction allows produced heat to be dissipated through the glass 11. This prevents defect in reverse direction property. Such defect is also prevented by the glass 11 holding the substrate 1 in shape during scribe operation.
COPYRIGHT: (C)1980,JPO&Japio
JP14838678A 1978-11-29 1978-11-29 Preparing semiconductor device Pending JPS5574158A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14838678A JPS5574158A (en) 1978-11-29 1978-11-29 Preparing semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14838678A JPS5574158A (en) 1978-11-29 1978-11-29 Preparing semiconductor device

Publications (1)

Publication Number Publication Date
JPS5574158A true JPS5574158A (en) 1980-06-04

Family

ID=15451599

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14838678A Pending JPS5574158A (en) 1978-11-29 1978-11-29 Preparing semiconductor device

Country Status (1)

Country Link
JP (1) JPS5574158A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005122223A1 (en) * 2004-06-11 2005-12-22 Showa Denko K.K. Production method of compound semiconductor device wafer
JP2015198142A (en) * 2014-03-31 2015-11-09 株式会社カネカ Crystal silicon solar battery, manufacturing method for the same and solar battery module

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005122223A1 (en) * 2004-06-11 2005-12-22 Showa Denko K.K. Production method of compound semiconductor device wafer
JP2015198142A (en) * 2014-03-31 2015-11-09 株式会社カネカ Crystal silicon solar battery, manufacturing method for the same and solar battery module

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