JPS5572036A - Preparing semiconductor device - Google Patents
Preparing semiconductor deviceInfo
- Publication number
- JPS5572036A JPS5572036A JP14622178A JP14622178A JPS5572036A JP S5572036 A JPS5572036 A JP S5572036A JP 14622178 A JP14622178 A JP 14622178A JP 14622178 A JP14622178 A JP 14622178A JP S5572036 A JPS5572036 A JP S5572036A
- Authority
- JP
- Japan
- Prior art keywords
- sio
- layer
- electron beam
- film
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To produce a fine pattern without using a resist pattern by employing an electron beam drawing on SiO2 at a specified degree of vacuum and then selectively etching in FH atmosphere at a specified reduced pressure.
CONSTITUTION: Electron beam radiation on SiO2 film under about 10-4W10-6 Toor causes the irradiated area to be covered with formed hydrocarbon compound film layer. Next, treating in HF atmosphere at 5W10 Toor reduced pressure acts to selectively etch away the SiO2 under the hydrocarbon compound layer film. In this process, the electron beam used has acted on the residual gas from the oil diffusion pump and transformed it to the hydrocarbon film layer on the SiO2 layer. The process provides a high accuracy etching to SiO2 layer without causing side-way etching.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14622178A JPS5572036A (en) | 1978-11-27 | 1978-11-27 | Preparing semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14622178A JPS5572036A (en) | 1978-11-27 | 1978-11-27 | Preparing semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5572036A true JPS5572036A (en) | 1980-05-30 |
JPS641930B2 JPS641930B2 (en) | 1989-01-13 |
Family
ID=15402839
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14622178A Granted JPS5572036A (en) | 1978-11-27 | 1978-11-27 | Preparing semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5572036A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012157776A1 (en) * | 2011-05-19 | 2012-11-22 | ダイヤニトリックス株式会社 | Acrylamide aqueous solution, stabilization agent for acrylamide aqueous solution, and stabilization method for acrylamide aqueous solution |
-
1978
- 1978-11-27 JP JP14622178A patent/JPS5572036A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS641930B2 (en) | 1989-01-13 |
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