JPS5568610A - Preparing magnetic bubble memory element - Google Patents
Preparing magnetic bubble memory elementInfo
- Publication number
- JPS5568610A JPS5568610A JP14237278A JP14237278A JPS5568610A JP S5568610 A JPS5568610 A JP S5568610A JP 14237278 A JP14237278 A JP 14237278A JP 14237278 A JP14237278 A JP 14237278A JP S5568610 A JPS5568610 A JP S5568610A
- Authority
- JP
- Japan
- Prior art keywords
- film
- mask
- permalloy
- patterns
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/32—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film
- H01F41/34—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film in patterns, e.g. by lithography
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Thin Magnetic Films (AREA)
Abstract
PURPOSE:To provide precisely defined conductor and permalloy patterns by using a mask having different light transmittance for ultraviolet and X rays to perform irradiation with different strength, and then follwed by chemical and physical etchings. CONSTITUTION:The substrate 1 having a magnetic garnet layer is applied in sequence with deposited layers of a first insulating film 2, a conductor film 3, a second insulating film 4, a permalloy film 5, a mask film 6, and a resist film. The resist film is irradiated with light locally different in strength through a mask having locally different light transmittance. The resist is then developed to provide resist patterns 7, 8. The patterns 7, 8 are used as a mask to allow the exposed parts of the permalloy film 5 to be removed by etching. Next, eaching of the exposed parts of the mask film 6 and the second insulating film 4 is removed by etching by use of Freon gas plasma. In this manner, precisely defined conductor and permalloy patterns are provided.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14237278A JPS5568610A (en) | 1978-11-20 | 1978-11-20 | Preparing magnetic bubble memory element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14237278A JPS5568610A (en) | 1978-11-20 | 1978-11-20 | Preparing magnetic bubble memory element |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5568610A true JPS5568610A (en) | 1980-05-23 |
JPS6217367B2 JPS6217367B2 (en) | 1987-04-17 |
Family
ID=15313843
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14237278A Granted JPS5568610A (en) | 1978-11-20 | 1978-11-20 | Preparing magnetic bubble memory element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5568610A (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51110930A (en) * | 1975-03-05 | 1976-09-30 | Ibm | Bishodenshisochi noseizohoho |
-
1978
- 1978-11-20 JP JP14237278A patent/JPS5568610A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51110930A (en) * | 1975-03-05 | 1976-09-30 | Ibm | Bishodenshisochi noseizohoho |
Also Published As
Publication number | Publication date |
---|---|
JPS6217367B2 (en) | 1987-04-17 |
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