JPS5565481A - Manufacture of high-frequency diode - Google Patents

Manufacture of high-frequency diode

Info

Publication number
JPS5565481A
JPS5565481A JP13895278A JP13895278A JPS5565481A JP S5565481 A JPS5565481 A JP S5565481A JP 13895278 A JP13895278 A JP 13895278A JP 13895278 A JP13895278 A JP 13895278A JP S5565481 A JPS5565481 A JP S5565481A
Authority
JP
Japan
Prior art keywords
layer
mesa
type
unstableness
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13895278A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6118874B2 (enrdf_load_stackoverflow
Inventor
Masahiro Kuroda
Kenji Kanema
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP13895278A priority Critical patent/JPS5565481A/ja
Publication of JPS5565481A publication Critical patent/JPS5565481A/ja
Publication of JPS6118874B2 publication Critical patent/JPS6118874B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
JP13895278A 1978-11-13 1978-11-13 Manufacture of high-frequency diode Granted JPS5565481A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13895278A JPS5565481A (en) 1978-11-13 1978-11-13 Manufacture of high-frequency diode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13895278A JPS5565481A (en) 1978-11-13 1978-11-13 Manufacture of high-frequency diode

Publications (2)

Publication Number Publication Date
JPS5565481A true JPS5565481A (en) 1980-05-16
JPS6118874B2 JPS6118874B2 (enrdf_load_stackoverflow) 1986-05-14

Family

ID=15233986

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13895278A Granted JPS5565481A (en) 1978-11-13 1978-11-13 Manufacture of high-frequency diode

Country Status (1)

Country Link
JP (1) JPS5565481A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003077306A1 (en) * 2002-03-08 2003-09-18 Sankan Electric Co., Ltd. Semiconductor device and its manufacturing method
JP2005340484A (ja) * 2004-05-27 2005-12-08 Renesas Technology Corp 半導体装置及びその製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003077306A1 (en) * 2002-03-08 2003-09-18 Sankan Electric Co., Ltd. Semiconductor device and its manufacturing method
JP2005340484A (ja) * 2004-05-27 2005-12-08 Renesas Technology Corp 半導体装置及びその製造方法

Also Published As

Publication number Publication date
JPS6118874B2 (enrdf_load_stackoverflow) 1986-05-14

Similar Documents

Publication Publication Date Title
JPS5269587A (en) Device and manufacture for high voltage resisting semiconductor
JPS52116185A (en) Mesa-type semiconductor laser
JPS5710992A (en) Semiconductor device and manufacture therefor
JPS54158880A (en) Compound semiconductor device and its manufacture
JPS577959A (en) Semiconductor device
JPS5565481A (en) Manufacture of high-frequency diode
JPS5324277A (en) Semiconductor devic e and its production
JPS54149465A (en) Production of semiconductor device
JPS5565427A (en) Semiconductor device
JPS5469079A (en) Manufacture of semiconductor device
JPS5536927A (en) Manufacturing of semiconductor device
JPS54101666A (en) Semiconductor device
JPH036069A (ja) 半導体発光素子の保護膜形成方法
JPS5735368A (en) Manufacture of semiconductor device
JPS52113156A (en) Vapor phase epitaxial growth process of semiconductor of groups iii-v
JPS5255471A (en) Impurity doping method of gallium arsenide vapor growth crystal
JPS5244165A (en) Process for production of semiconductor device
JPS5586122A (en) Semiconductor device
JPS54106175A (en) Manufacture of semiconductor device
JPS5263066A (en) Production of semiconductor device
JPS5784168A (en) Semiconductor device
JPS54116882A (en) Manufacture of semiconductor device
JPS5654086A (en) Manufacture of semiconductor laser apparatus
JPS5349967A (en) Manufacture of semiconductor device
JPS5251877A (en) Production of semiconductor device