JPS5556629A - Pattern forming method - Google Patents
Pattern forming methodInfo
- Publication number
- JPS5556629A JPS5556629A JP12907078A JP12907078A JPS5556629A JP S5556629 A JPS5556629 A JP S5556629A JP 12907078 A JP12907078 A JP 12907078A JP 12907078 A JP12907078 A JP 12907078A JP S5556629 A JPS5556629 A JP S5556629A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- resist
- width
- exposure
- size smaller
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP12907078A JPS5556629A (en) | 1978-10-21 | 1978-10-21 | Pattern forming method | 
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP12907078A JPS5556629A (en) | 1978-10-21 | 1978-10-21 | Pattern forming method | 
Publications (2)
| Publication Number | Publication Date | 
|---|---|
| JPS5556629A true JPS5556629A (en) | 1980-04-25 | 
| JPS621246B2 JPS621246B2 (OSRAM) | 1987-01-12 | 
Family
ID=15000328
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date | 
|---|---|---|---|
| JP12907078A Granted JPS5556629A (en) | 1978-10-21 | 1978-10-21 | Pattern forming method | 
Country Status (1)
| Country | Link | 
|---|---|
| JP (1) | JPS5556629A (OSRAM) | 
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JPS5839015A (ja) * | 1981-09-01 | 1983-03-07 | Pioneer Electronic Corp | 半導体装置の製造方法 | 
| JPS59117214A (ja) * | 1982-12-20 | 1984-07-06 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 電子ビ−ム及び光による露光パタ−ンの形成方法 | 
| US4520269A (en) * | 1982-11-03 | 1985-05-28 | International Business Machines Corporation | Electron beam lithography proximity correction method | 
| US4610948A (en) * | 1984-01-25 | 1986-09-09 | The United States Of America As Represented By The Secretary Of The Army | Electron beam peripheral patterning of integrated circuits | 
| WO2006129374A1 (ja) * | 2005-06-03 | 2006-12-07 | Advantest Corporation | パターニング方法 | 
- 
        1978
        - 1978-10-21 JP JP12907078A patent/JPS5556629A/ja active Granted
 
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JPS5839015A (ja) * | 1981-09-01 | 1983-03-07 | Pioneer Electronic Corp | 半導体装置の製造方法 | 
| US4520269A (en) * | 1982-11-03 | 1985-05-28 | International Business Machines Corporation | Electron beam lithography proximity correction method | 
| JPS59117214A (ja) * | 1982-12-20 | 1984-07-06 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 電子ビ−ム及び光による露光パタ−ンの形成方法 | 
| US4610948A (en) * | 1984-01-25 | 1986-09-09 | The United States Of America As Represented By The Secretary Of The Army | Electron beam peripheral patterning of integrated circuits | 
| WO2006129374A1 (ja) * | 2005-06-03 | 2006-12-07 | Advantest Corporation | パターニング方法 | 
| JPWO2006129374A1 (ja) * | 2005-06-03 | 2008-12-25 | 株式会社アドバンテスト | パターニング方法 | 
| JP4533931B2 (ja) * | 2005-06-03 | 2010-09-01 | 株式会社アドバンテスト | パターニング方法 | 
Also Published As
| Publication number | Publication date | 
|---|---|
| JPS621246B2 (OSRAM) | 1987-01-12 | 
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