JPS5555534A - Method of making pattern by electron beam - Google Patents

Method of making pattern by electron beam

Info

Publication number
JPS5555534A
JPS5555534A JP12798978A JP12798978A JPS5555534A JP S5555534 A JPS5555534 A JP S5555534A JP 12798978 A JP12798978 A JP 12798978A JP 12798978 A JP12798978 A JP 12798978A JP S5555534 A JPS5555534 A JP S5555534A
Authority
JP
Japan
Prior art keywords
patterns
directions
electron beam
prevent
making pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12798978A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6243334B2 (enrdf_load_stackoverflow
Inventor
Hisashi Sugiyama
Kazunori Saito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP12798978A priority Critical patent/JPS5555534A/ja
Publication of JPS5555534A publication Critical patent/JPS5555534A/ja
Publication of JPS6243334B2 publication Critical patent/JPS6243334B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
JP12798978A 1978-10-18 1978-10-18 Method of making pattern by electron beam Granted JPS5555534A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12798978A JPS5555534A (en) 1978-10-18 1978-10-18 Method of making pattern by electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12798978A JPS5555534A (en) 1978-10-18 1978-10-18 Method of making pattern by electron beam

Publications (2)

Publication Number Publication Date
JPS5555534A true JPS5555534A (en) 1980-04-23
JPS6243334B2 JPS6243334B2 (enrdf_load_stackoverflow) 1987-09-12

Family

ID=14973689

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12798978A Granted JPS5555534A (en) 1978-10-18 1978-10-18 Method of making pattern by electron beam

Country Status (1)

Country Link
JP (1) JPS5555534A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0391716A (ja) * 1989-09-05 1991-04-17 Nec Home Electron Ltd 冷却装置及びこの冷却装置を用いた液晶プロジェクター

Also Published As

Publication number Publication date
JPS6243334B2 (enrdf_load_stackoverflow) 1987-09-12

Similar Documents

Publication Publication Date Title
GB1483171A (en) Producing patterns with an electron beam
JPS5412675A (en) Electon beam exposure method
JPS52151568A (en) Electron beam exposure apparatus
JPS57138757A (en) Correction of deflection distortion
JPS5316578A (en) Electron beam exposure apparatus
JPS5391532A (en) Pattern generating equipment
JPS52143776A (en) Electron beam exposure apparatus
JPS5555534A (en) Method of making pattern by electron beam
JPS51147262A (en) Electronic beam exposure method
JPS52119179A (en) Electron beam exposing method
JPS5437685A (en) Electron beam exposure unit
JPS52130570A (en) Electron beam exposing device
JPS57172734A (en) Exposing process for electronic beam
JPS51148370A (en) Electron ray exposure method
JPS5442979A (en) Electron beam exposure device
JPS53120379A (en) Electron beam exposure apparatus
JPS53117384A (en) Photoetching mask
JPS5348677A (en) Electron beam exposure method
JPS53135580A (en) Electron beam exposing method
JPS5322368A (en) Pattern inspection method
JPS53127267A (en) Inspection method for pattern
JPS53120277A (en) Electron beam exposure device
JPS54150082A (en) Method of drawing pattern with electron beam
JPS5377176A (en) Pattern forming method
JPS5650512A (en) Pattern drawing method using beam of charged particle