JPS5555533A - Method of manufacturing semiconductor device - Google Patents

Method of manufacturing semiconductor device

Info

Publication number
JPS5555533A
JPS5555533A JP12798878A JP12798878A JPS5555533A JP S5555533 A JPS5555533 A JP S5555533A JP 12798878 A JP12798878 A JP 12798878A JP 12798878 A JP12798878 A JP 12798878A JP S5555533 A JPS5555533 A JP S5555533A
Authority
JP
Japan
Prior art keywords
resist
film
sio
pattern
utilizing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12798878A
Other languages
English (en)
Japanese (ja)
Other versions
JPS627688B2 (enrdf_load_stackoverflow
Inventor
Hisashi Sugiyama
Kyozo Shimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP12798878A priority Critical patent/JPS5555533A/ja
Publication of JPS5555533A publication Critical patent/JPS5555533A/ja
Publication of JPS627688B2 publication Critical patent/JPS627688B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
JP12798878A 1978-10-18 1978-10-18 Method of manufacturing semiconductor device Granted JPS5555533A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12798878A JPS5555533A (en) 1978-10-18 1978-10-18 Method of manufacturing semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12798878A JPS5555533A (en) 1978-10-18 1978-10-18 Method of manufacturing semiconductor device

Publications (2)

Publication Number Publication Date
JPS5555533A true JPS5555533A (en) 1980-04-23
JPS627688B2 JPS627688B2 (enrdf_load_stackoverflow) 1987-02-18

Family

ID=14973662

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12798878A Granted JPS5555533A (en) 1978-10-18 1978-10-18 Method of manufacturing semiconductor device

Country Status (1)

Country Link
JP (1) JPS5555533A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012204723A (ja) * 2011-03-28 2012-10-22 Canon Inc 荷電粒子線描画方法、およびそれを用いた物品の製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52119872A (en) * 1976-03-31 1977-10-07 Fujitsu Ltd Manufacture of semi-conductor device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52119872A (en) * 1976-03-31 1977-10-07 Fujitsu Ltd Manufacture of semi-conductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012204723A (ja) * 2011-03-28 2012-10-22 Canon Inc 荷電粒子線描画方法、およびそれを用いた物品の製造方法

Also Published As

Publication number Publication date
JPS627688B2 (enrdf_load_stackoverflow) 1987-02-18

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