JPS5550635A - Preparation of semiconductor device - Google Patents

Preparation of semiconductor device

Info

Publication number
JPS5550635A
JPS5550635A JP12362778A JP12362778A JPS5550635A JP S5550635 A JPS5550635 A JP S5550635A JP 12362778 A JP12362778 A JP 12362778A JP 12362778 A JP12362778 A JP 12362778A JP S5550635 A JPS5550635 A JP S5550635A
Authority
JP
Japan
Prior art keywords
film
separation layers
sic
oxidation
minute
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12362778A
Other languages
English (en)
Other versions
JPS6136380B2 (ja
Inventor
Hisao Nakajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12362778A priority Critical patent/JPS5550635A/ja
Publication of JPS5550635A publication Critical patent/JPS5550635A/ja
Publication of JPS6136380B2 publication Critical patent/JPS6136380B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Local Oxidation Of Silicon (AREA)
  • Element Separation (AREA)
JP12362778A 1978-10-09 1978-10-09 Preparation of semiconductor device Granted JPS5550635A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12362778A JPS5550635A (en) 1978-10-09 1978-10-09 Preparation of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12362778A JPS5550635A (en) 1978-10-09 1978-10-09 Preparation of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5550635A true JPS5550635A (en) 1980-04-12
JPS6136380B2 JPS6136380B2 (ja) 1986-08-18

Family

ID=14865260

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12362778A Granted JPS5550635A (en) 1978-10-09 1978-10-09 Preparation of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5550635A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01162351A (ja) * 1987-12-19 1989-06-26 Fujitsu Ltd 半導体装置の製造方法
KR100388458B1 (ko) * 1999-12-24 2003-06-25 주식회사 하이닉스반도체 트렌치 소자분리 공정을 사용하는 반도체 소자 제조방법

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01162351A (ja) * 1987-12-19 1989-06-26 Fujitsu Ltd 半導体装置の製造方法
KR100388458B1 (ko) * 1999-12-24 2003-06-25 주식회사 하이닉스반도체 트렌치 소자분리 공정을 사용하는 반도체 소자 제조방법

Also Published As

Publication number Publication date
JPS6136380B2 (ja) 1986-08-18

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