JPS5546746A - Positive type photosensitive composition and product thereof - Google Patents
Positive type photosensitive composition and product thereofInfo
- Publication number
- JPS5546746A JPS5546746A JP11470279A JP11470279A JPS5546746A JP S5546746 A JPS5546746 A JP S5546746A JP 11470279 A JP11470279 A JP 11470279A JP 11470279 A JP11470279 A JP 11470279A JP S5546746 A JPS5546746 A JP S5546746A
- Authority
- JP
- Japan
- Prior art keywords
- product
- photosensitive composition
- positive type
- type photosensitive
- positive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polyurethanes Or Polyureas (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US93998978A | 1978-09-06 | 1978-09-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5546746A true JPS5546746A (en) | 1980-04-02 |
JPS6244256B2 JPS6244256B2 (fr) | 1987-09-18 |
Family
ID=25474042
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11470279A Granted JPS5546746A (en) | 1978-09-06 | 1979-09-06 | Positive type photosensitive composition and product thereof |
Country Status (9)
Country | Link |
---|---|
JP (1) | JPS5546746A (fr) |
BR (1) | BR7905714A (fr) |
CA (1) | CA1119447A (fr) |
DE (1) | DE2935904A1 (fr) |
FR (1) | FR2435741B1 (fr) |
GB (1) | GB2031442B (fr) |
IT (1) | IT1162658B (fr) |
LU (1) | LU81652A1 (fr) |
NL (1) | NL7906588A (fr) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56140342A (en) * | 1980-04-02 | 1981-11-02 | Tokyo Ohka Kogyo Co Ltd | Image forming composition and formation of resist image |
JPS58152236A (ja) * | 1982-03-05 | 1983-09-09 | Toray Ind Inc | 感光性組成物 |
JPS6120939A (ja) * | 1984-07-10 | 1986-01-29 | Fuji Photo Film Co Ltd | 平版印刷版用感光性組成物 |
JPS6325646A (ja) * | 1986-07-18 | 1988-02-03 | Tokyo Ohka Kogyo Co Ltd | 高耐熱性ポジ型ホトレジスト組成物 |
JPS6380254A (ja) * | 1986-09-24 | 1988-04-11 | Fuji Photo Film Co Ltd | 感光性組成物 |
JPH0358050A (ja) * | 1989-07-20 | 1991-03-13 | Internatl Business Mach Corp <Ibm> | 感光性組成物 |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4680346A (en) * | 1985-12-13 | 1987-07-14 | Ppg Industries, Inc. | Flexible primer composition and method of providing a substrate with a flexible multilayer coating |
JPS6463856A (en) * | 1987-05-12 | 1989-03-09 | Sumitomo Metal Ind | Method and apparatus for automatic ultrasonic flaw detection of pipe end |
DE3927631A1 (de) * | 1989-08-22 | 1991-02-28 | Basf Ag | Umsetzungsprodukt, verfahren zu dessen herstellung und damit herstellbares strahlungsempfindliches gemisch |
DE69612867T3 (de) * | 1995-11-24 | 2006-11-23 | Kodak Polychrome Graphics Co. Ltd., Norwalk | Hydrophilierter träger für flachdruckplatten und verfahren zu seiner herstellung |
GB9624224D0 (en) | 1996-11-21 | 1997-01-08 | Horsell Graphic Ind Ltd | Planographic printing |
GB9702568D0 (en) * | 1997-02-07 | 1997-03-26 | Horsell Graphic Ind Ltd | Planographic printing |
US6357351B1 (en) | 1997-05-23 | 2002-03-19 | Kodak Polychrome Graphics Llc | Substrate for planographic printing |
GB9710552D0 (en) | 1997-05-23 | 1997-07-16 | Horsell Graphic Ind Ltd | Planographic printing |
US6293197B1 (en) | 1999-08-17 | 2001-09-25 | Kodak Polychrome Graphics | Hydrophilized substrate for planographic printing |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1538320A (fr) * | 1965-11-02 | 1968-09-06 | Ferrania Spa | Procédé de fabrication de matrices présensibilisées pour l'impression offset |
BE789196A (fr) * | 1971-09-25 | 1973-03-22 | Kalle Ag | Matiere a copier photosensible |
CH576739A5 (fr) * | 1972-08-25 | 1976-06-15 | Ciba Geigy Ag | |
AR205345A1 (es) * | 1973-06-20 | 1976-04-30 | Minnesota Mining & Mfg | Composicion organofilica fotosensible y placa litografica preparada con la misma |
DE2617088A1 (de) * | 1975-04-29 | 1976-11-11 | Hoechst Co American | Lichtempfindliche kopiermasse |
-
1979
- 1979-08-10 CA CA000333505A patent/CA1119447A/fr not_active Expired
- 1979-09-03 NL NL7906588A patent/NL7906588A/nl not_active Application Discontinuation
- 1979-09-05 DE DE19792935904 patent/DE2935904A1/de active Granted
- 1979-09-05 GB GB7930761A patent/GB2031442B/en not_active Expired
- 1979-09-05 BR BR7905714A patent/BR7905714A/pt not_active IP Right Cessation
- 1979-09-05 LU LU81652A patent/LU81652A1/fr unknown
- 1979-09-05 IT IT50175/79A patent/IT1162658B/it active
- 1979-09-05 FR FR7922164A patent/FR2435741B1/fr not_active Expired
- 1979-09-06 JP JP11470279A patent/JPS5546746A/ja active Granted
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56140342A (en) * | 1980-04-02 | 1981-11-02 | Tokyo Ohka Kogyo Co Ltd | Image forming composition and formation of resist image |
JPH0128370B2 (fr) * | 1980-04-02 | 1989-06-02 | Tokyo Ohka Kogyo Co Ltd | |
JPS58152236A (ja) * | 1982-03-05 | 1983-09-09 | Toray Ind Inc | 感光性組成物 |
JPS6120939A (ja) * | 1984-07-10 | 1986-01-29 | Fuji Photo Film Co Ltd | 平版印刷版用感光性組成物 |
JPH0462574B2 (fr) * | 1984-07-10 | 1992-10-06 | Fuji Photo Film Co Ltd | |
JPS6325646A (ja) * | 1986-07-18 | 1988-02-03 | Tokyo Ohka Kogyo Co Ltd | 高耐熱性ポジ型ホトレジスト組成物 |
JPS6380254A (ja) * | 1986-09-24 | 1988-04-11 | Fuji Photo Film Co Ltd | 感光性組成物 |
JPH0358050A (ja) * | 1989-07-20 | 1991-03-13 | Internatl Business Mach Corp <Ibm> | 感光性組成物 |
Also Published As
Publication number | Publication date |
---|---|
GB2031442A (en) | 1980-04-23 |
NL7906588A (nl) | 1980-03-10 |
FR2435741B1 (fr) | 1986-10-03 |
DE2935904C2 (fr) | 1991-03-07 |
GB2031442B (en) | 1982-11-10 |
DE2935904A1 (de) | 1980-03-20 |
CA1119447A (fr) | 1982-03-09 |
IT7950175A0 (it) | 1979-09-05 |
JPS6244256B2 (fr) | 1987-09-18 |
FR2435741A1 (fr) | 1980-04-04 |
BR7905714A (pt) | 1980-05-13 |
LU81652A1 (fr) | 1980-04-21 |
IT1162658B (it) | 1987-04-01 |
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