JPS5541918A - Suppying method of mixed reaction gas for etching - Google Patents
Suppying method of mixed reaction gas for etchingInfo
- Publication number
- JPS5541918A JPS5541918A JP11330878A JP11330878A JPS5541918A JP S5541918 A JPS5541918 A JP S5541918A JP 11330878 A JP11330878 A JP 11330878A JP 11330878 A JP11330878 A JP 11330878A JP S5541918 A JPS5541918 A JP S5541918A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- mixture
- heated
- liquid
- reaction gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To form electrode wiring patterns of high quality at high efficiency, by mixing at least one kind of liquid mixture gases, PCl3, CCl4, BBr3, to liquid reaction gas BCl3, heating the mixture to specified temperature, and generating and supplying gas mixture gas of specified ratio.
CONSTITUTION: A liquid reaction gas BCl3, and at least one kind of liquid mixture gases, PCl3, CCl4, BBr3, are preliminarily mixed in a container 44, and this liquid mixture gas is heated to a specified temperature in an oil bath 45. By generating gas mixture gas of the mixing ratio proportional to the vapor pressure of each component at such temperature, this mixture gas is adjusted of the flow rate by means of a needle valve 41 and a flow meter 42, and, not changing the composition of this mixture gas, is supplied to a vacuum sputtering chamber 34 through a heated supply tube 39 which is heated to the same temperature as the bath 45. Sputtering is performed between upper and lower electrodes 36, 35 while adjusting the gas pressure in the chamber 34 by means of a vacuum exhaust valve 38, and Al or Al alloy film on a substrate 37 is etched.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11330878A JPS5541918A (en) | 1978-09-14 | 1978-09-14 | Suppying method of mixed reaction gas for etching |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11330878A JPS5541918A (en) | 1978-09-14 | 1978-09-14 | Suppying method of mixed reaction gas for etching |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5541918A true JPS5541918A (en) | 1980-03-25 |
Family
ID=14608934
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11330878A Pending JPS5541918A (en) | 1978-09-14 | 1978-09-14 | Suppying method of mixed reaction gas for etching |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5541918A (en) |
-
1978
- 1978-09-14 JP JP11330878A patent/JPS5541918A/en active Pending
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