JPS5533081A - Method of measuring impurity amount in semiconductor wafer - Google Patents

Method of measuring impurity amount in semiconductor wafer

Info

Publication number
JPS5533081A
JPS5533081A JP10679278A JP10679278A JPS5533081A JP S5533081 A JPS5533081 A JP S5533081A JP 10679278 A JP10679278 A JP 10679278A JP 10679278 A JP10679278 A JP 10679278A JP S5533081 A JPS5533081 A JP S5533081A
Authority
JP
Japan
Prior art keywords
wafer
silicon wafer
parallelogram
semiconductor wafer
impurities
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10679278A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6122896B2 (enrdf_load_stackoverflow
Inventor
Koji Yakeno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP10679278A priority Critical patent/JPS5533081A/ja
Publication of JPS5533081A publication Critical patent/JPS5533081A/ja
Publication of JPS6122896B2 publication Critical patent/JPS6122896B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP10679278A 1978-08-30 1978-08-30 Method of measuring impurity amount in semiconductor wafer Granted JPS5533081A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10679278A JPS5533081A (en) 1978-08-30 1978-08-30 Method of measuring impurity amount in semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10679278A JPS5533081A (en) 1978-08-30 1978-08-30 Method of measuring impurity amount in semiconductor wafer

Publications (2)

Publication Number Publication Date
JPS5533081A true JPS5533081A (en) 1980-03-08
JPS6122896B2 JPS6122896B2 (enrdf_load_stackoverflow) 1986-06-03

Family

ID=14442735

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10679278A Granted JPS5533081A (en) 1978-08-30 1978-08-30 Method of measuring impurity amount in semiconductor wafer

Country Status (1)

Country Link
JP (1) JPS5533081A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04105046A (ja) * 1990-08-27 1992-04-07 Toshiba Ceramics Co Ltd 引上シリコンウェーハの格子間酸素濃度測定方法
JPH04109145A (ja) * 1990-08-29 1992-04-10 Toshiba Ceramics Co Ltd 引上シリコンウェーハの置換型炭素濃度測定方法
JPH04109146A (ja) * 1990-08-29 1992-04-10 Toshiba Ceramics Co Ltd 引上シリコンウェーハの置換型炭素濃度測定方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04105046A (ja) * 1990-08-27 1992-04-07 Toshiba Ceramics Co Ltd 引上シリコンウェーハの格子間酸素濃度測定方法
JPH04109145A (ja) * 1990-08-29 1992-04-10 Toshiba Ceramics Co Ltd 引上シリコンウェーハの置換型炭素濃度測定方法
JPH04109146A (ja) * 1990-08-29 1992-04-10 Toshiba Ceramics Co Ltd 引上シリコンウェーハの置換型炭素濃度測定方法

Also Published As

Publication number Publication date
JPS6122896B2 (enrdf_load_stackoverflow) 1986-06-03

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