JPS552257A - Photo mask used when grooves of specified shapes are photoetched on curved face and production thereof - Google Patents

Photo mask used when grooves of specified shapes are photoetched on curved face and production thereof

Info

Publication number
JPS552257A
JPS552257A JP7476878A JP7476878A JPS552257A JP S552257 A JPS552257 A JP S552257A JP 7476878 A JP7476878 A JP 7476878A JP 7476878 A JP7476878 A JP 7476878A JP S552257 A JPS552257 A JP S552257A
Authority
JP
Japan
Prior art keywords
film
mask
metal mask
steel ball
curved face
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7476878A
Other languages
Japanese (ja)
Inventor
Masahiko Nagasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTN Corp
Original Assignee
NTN Toyo Bearing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NTN Toyo Bearing Co Ltd filed Critical NTN Toyo Bearing Co Ltd
Priority to JP7476878A priority Critical patent/JPS552257A/en
Publication of JPS552257A publication Critical patent/JPS552257A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To enable the photo mask to make close contact well to the original spherical or curved face and obviate its deformation by forming a mask body by a metal mask of copper or the like and a film of plastics transparent to ultraviolet rays to be fitted to the outside circumference of said mask. CONSTITUTION:A polished steel ball is dipped in a copper sulfate solution to form a plating layer 12 of about 15 to 20mu on the surface through copper electroforming and further photoresist 13 is coated on the outside circumference of the plating layer, after which an arbitrary pattern is transferred and etched, whereby a metal mask 14 which has no internal stress and will not deform is formed. Next, a film 15 of about 0.5 mm which is composed of vinyl chloride or the like and is transparent to ultraviolet rays is restrained in a mold frame 16. A steel ball 17 which is larger by about 20 to 30mu from the previously used steel ball is heated to 200 to 300 deg.C, and is then slowly forced into this film to form the film in hemispherical form, after which it is water-cooled. The mold of this film is fitted to the metal mask 14 and the assembly is held for a short time at temperatures of 150 to 200 deg.C, after which it is cooled. Thereby, the mask body 18 in which the metal mask and film are integrated is obtained.
JP7476878A 1978-06-19 1978-06-19 Photo mask used when grooves of specified shapes are photoetched on curved face and production thereof Pending JPS552257A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7476878A JPS552257A (en) 1978-06-19 1978-06-19 Photo mask used when grooves of specified shapes are photoetched on curved face and production thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7476878A JPS552257A (en) 1978-06-19 1978-06-19 Photo mask used when grooves of specified shapes are photoetched on curved face and production thereof

Publications (1)

Publication Number Publication Date
JPS552257A true JPS552257A (en) 1980-01-09

Family

ID=13556783

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7476878A Pending JPS552257A (en) 1978-06-19 1978-06-19 Photo mask used when grooves of specified shapes are photoetched on curved face and production thereof

Country Status (1)

Country Link
JP (1) JPS552257A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60263155A (en) * 1984-06-12 1985-12-26 Sono Kogyo Kk Special screen engraging method and spherical surface printing method
JPS61209550A (en) * 1985-03-14 1986-09-17 Uegaki Beika Kk Production of rice cracker
EP0575849A2 (en) * 1992-06-26 1993-12-29 Martin Marietta Corporation Conformal photomask for three-dimensional printed circuit board technology

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60263155A (en) * 1984-06-12 1985-12-26 Sono Kogyo Kk Special screen engraging method and spherical surface printing method
JPS61209550A (en) * 1985-03-14 1986-09-17 Uegaki Beika Kk Production of rice cracker
JPS6354341B2 (en) * 1985-03-14 1988-10-27 Uegaki Beika Kk
EP0575849A2 (en) * 1992-06-26 1993-12-29 Martin Marietta Corporation Conformal photomask for three-dimensional printed circuit board technology
EP0575849A3 (en) * 1992-06-26 1994-05-18 Martin Marietta Corp Conformal photomask for three-dimensional printed circuit board technology

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