JPS55156355A - Capacitor usable for semiconductor device - Google Patents

Capacitor usable for semiconductor device

Info

Publication number
JPS55156355A
JPS55156355A JP6424079A JP6424079A JPS55156355A JP S55156355 A JPS55156355 A JP S55156355A JP 6424079 A JP6424079 A JP 6424079A JP 6424079 A JP6424079 A JP 6424079A JP S55156355 A JPS55156355 A JP S55156355A
Authority
JP
Japan
Prior art keywords
sio2
capacitor
film
plasma
hour
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6424079A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6242392B2 (cg-RX-API-DMAC7.html
Inventor
Takashi Ito
Takao Nozaki
Hajime Ishikawa
Masaichi Shinoda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP6424079A priority Critical patent/JPS55156355A/ja
Publication of JPS55156355A publication Critical patent/JPS55156355A/ja
Publication of JPS6242392B2 publication Critical patent/JPS6242392B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00—Resistors, capacitors or inductors
    • H10D1/60—Capacitors
    • H10D1/62—Capacitors having potential barriers
    • H10D1/66—Conductor-insulator-semiconductor capacitors, e.g. MOS capacitors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/022—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being a laminate, i.e. composed of sublayers, e.g. stacks of alternating high-k metal oxides

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Semiconductor Memories (AREA)
JP6424079A 1979-05-24 1979-05-24 Capacitor usable for semiconductor device Granted JPS55156355A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6424079A JPS55156355A (en) 1979-05-24 1979-05-24 Capacitor usable for semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6424079A JPS55156355A (en) 1979-05-24 1979-05-24 Capacitor usable for semiconductor device

Publications (2)

Publication Number Publication Date
JPS55156355A true JPS55156355A (en) 1980-12-05
JPS6242392B2 JPS6242392B2 (cg-RX-API-DMAC7.html) 1987-09-08

Family

ID=13252411

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6424079A Granted JPS55156355A (en) 1979-05-24 1979-05-24 Capacitor usable for semiconductor device

Country Status (1)

Country Link
JP (1) JPS55156355A (cg-RX-API-DMAC7.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5771806A (en) * 1980-10-17 1982-05-04 Nec Corp Forming method of nitrided film
JPS59181574A (ja) * 1983-03-31 1984-10-16 Oki Electric Ind Co Ltd 半導体装置の製造方法
JPS6151832A (ja) * 1984-08-22 1986-03-14 Nippon Telegr & Teleph Corp <Ntt> 半導体装置およびその製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5771806A (en) * 1980-10-17 1982-05-04 Nec Corp Forming method of nitrided film
JPS59181574A (ja) * 1983-03-31 1984-10-16 Oki Electric Ind Co Ltd 半導体装置の製造方法
JPS6151832A (ja) * 1984-08-22 1986-03-14 Nippon Telegr & Teleph Corp <Ntt> 半導体装置およびその製造方法

Also Published As

Publication number Publication date
JPS6242392B2 (cg-RX-API-DMAC7.html) 1987-09-08

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