JPS55156328A - Manufacture for integrated element - Google Patents

Manufacture for integrated element

Info

Publication number
JPS55156328A
JPS55156328A JP6425879A JP6425879A JPS55156328A JP S55156328 A JPS55156328 A JP S55156328A JP 6425879 A JP6425879 A JP 6425879A JP 6425879 A JP6425879 A JP 6425879A JP S55156328 A JPS55156328 A JP S55156328A
Authority
JP
Japan
Prior art keywords
film
mark
pattern
burr
hollow portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6425879A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6210010B2 (enrdf_load_stackoverflow
Inventor
Masaki Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP6425879A priority Critical patent/JPS55156328A/ja
Publication of JPS55156328A publication Critical patent/JPS55156328A/ja
Publication of JPS6210010B2 publication Critical patent/JPS6210010B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Beam Exposure (AREA)
JP6425879A 1979-05-24 1979-05-24 Manufacture for integrated element Granted JPS55156328A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6425879A JPS55156328A (en) 1979-05-24 1979-05-24 Manufacture for integrated element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6425879A JPS55156328A (en) 1979-05-24 1979-05-24 Manufacture for integrated element

Publications (2)

Publication Number Publication Date
JPS55156328A true JPS55156328A (en) 1980-12-05
JPS6210010B2 JPS6210010B2 (enrdf_load_stackoverflow) 1987-03-04

Family

ID=13252974

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6425879A Granted JPS55156328A (en) 1979-05-24 1979-05-24 Manufacture for integrated element

Country Status (1)

Country Link
JP (1) JPS55156328A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS6210010B2 (enrdf_load_stackoverflow) 1987-03-04

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