JPS6210010B2 - - Google Patents
Info
- Publication number
- JPS6210010B2 JPS6210010B2 JP6425879A JP6425879A JPS6210010B2 JP S6210010 B2 JPS6210010 B2 JP S6210010B2 JP 6425879 A JP6425879 A JP 6425879A JP 6425879 A JP6425879 A JP 6425879A JP S6210010 B2 JPS6210010 B2 JP S6210010B2
- Authority
- JP
- Japan
- Prior art keywords
- resist
- electron beam
- pattern
- burrs
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 claims description 22
- 238000000034 method Methods 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 13
- 238000005530 etching Methods 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 238000001514 detection method Methods 0.000 description 7
- 238000000992 sputter etching Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910000889 permalloy Inorganic materials 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000002223 garnet Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6425879A JPS55156328A (en) | 1979-05-24 | 1979-05-24 | Manufacture for integrated element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6425879A JPS55156328A (en) | 1979-05-24 | 1979-05-24 | Manufacture for integrated element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55156328A JPS55156328A (en) | 1980-12-05 |
| JPS6210010B2 true JPS6210010B2 (enrdf_load_stackoverflow) | 1987-03-04 |
Family
ID=13252974
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6425879A Granted JPS55156328A (en) | 1979-05-24 | 1979-05-24 | Manufacture for integrated element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55156328A (enrdf_load_stackoverflow) |
-
1979
- 1979-05-24 JP JP6425879A patent/JPS55156328A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55156328A (en) | 1980-12-05 |
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