JPS55152109A - Method for low temperature bonding - Google Patents
Method for low temperature bondingInfo
- Publication number
- JPS55152109A JPS55152109A JP5868779A JP5868779A JPS55152109A JP S55152109 A JPS55152109 A JP S55152109A JP 5868779 A JP5868779 A JP 5868779A JP 5868779 A JP5868779 A JP 5868779A JP S55152109 A JPS55152109 A JP S55152109A
- Authority
- JP
- Japan
- Prior art keywords
- low temperature
- substrate
- adhesive
- sintered
- solder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 abstract 5
- 239000000853 adhesive Substances 0.000 abstract 3
- 230000001070 adhesive effect Effects 0.000 abstract 3
- 239000011347 resin Substances 0.000 abstract 2
- 229920005989 resin Polymers 0.000 abstract 2
- 229910000679 solder Inorganic materials 0.000 abstract 2
- 239000013077 target material Substances 0.000 abstract 2
- 229910000881 Cu alloy Inorganic materials 0.000 abstract 1
- 238000011109 contamination Methods 0.000 abstract 1
- 238000001816 cooling Methods 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
- 230000008020 evaporation Effects 0.000 abstract 1
- 230000004907 flux Effects 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000000843 powder Substances 0.000 abstract 1
- 238000005245 sintering Methods 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 abstract 1
Landscapes
- Pressure Welding/Diffusion-Bonding (AREA)
- Powder Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5868779A JPS5944956B2 (ja) | 1979-05-15 | 1979-05-15 | 低温接着法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5868779A JPS5944956B2 (ja) | 1979-05-15 | 1979-05-15 | 低温接着法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55152109A true JPS55152109A (en) | 1980-11-27 |
| JPS5944956B2 JPS5944956B2 (ja) | 1984-11-02 |
Family
ID=13091455
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5868779A Expired JPS5944956B2 (ja) | 1979-05-15 | 1979-05-15 | 低温接着法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5944956B2 (ja) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58217656A (ja) * | 1982-06-08 | 1983-12-17 | Hitachi Metals Ltd | 超硬質合金の製造方法 |
| JPS58217657A (ja) * | 1982-06-08 | 1983-12-17 | Hitachi Metals Ltd | 超硬質合金の製造方法 |
| JPS59110704A (ja) * | 1982-12-17 | 1984-06-26 | Res Dev Corp Of Japan | 金属被覆物の製造法 |
| JPS60130887A (ja) * | 1983-12-19 | 1985-07-12 | アルプス電気株式会社 | 基板に配線パタ−ンを形成する方法 |
| WO2014007151A1 (ja) | 2012-07-04 | 2014-01-09 | Jx日鉱日石金属株式会社 | スパッタリングターゲット |
| US9062371B2 (en) | 2009-11-20 | 2015-06-23 | Jx Nippon Mining & Metals Corporation | Sputtering target-backing plate assembly, and its production method |
| US10006117B2 (en) | 2010-10-27 | 2018-06-26 | Jx Nippon Mining & Metals Corporation | Sputtering target-backing plate assembly and method for producing same |
-
1979
- 1979-05-15 JP JP5868779A patent/JPS5944956B2/ja not_active Expired
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58217656A (ja) * | 1982-06-08 | 1983-12-17 | Hitachi Metals Ltd | 超硬質合金の製造方法 |
| JPS58217657A (ja) * | 1982-06-08 | 1983-12-17 | Hitachi Metals Ltd | 超硬質合金の製造方法 |
| JPS59110704A (ja) * | 1982-12-17 | 1984-06-26 | Res Dev Corp Of Japan | 金属被覆物の製造法 |
| JPS60130887A (ja) * | 1983-12-19 | 1985-07-12 | アルプス電気株式会社 | 基板に配線パタ−ンを形成する方法 |
| US9062371B2 (en) | 2009-11-20 | 2015-06-23 | Jx Nippon Mining & Metals Corporation | Sputtering target-backing plate assembly, and its production method |
| US10006117B2 (en) | 2010-10-27 | 2018-06-26 | Jx Nippon Mining & Metals Corporation | Sputtering target-backing plate assembly and method for producing same |
| WO2014007151A1 (ja) | 2012-07-04 | 2014-01-09 | Jx日鉱日石金属株式会社 | スパッタリングターゲット |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5944956B2 (ja) | 1984-11-02 |
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