JPS55141780A - Multiple wavelength integrated semiconductor laser array - Google Patents
Multiple wavelength integrated semiconductor laser arrayInfo
- Publication number
- JPS55141780A JPS55141780A JP4981479A JP4981479A JPS55141780A JP S55141780 A JPS55141780 A JP S55141780A JP 4981479 A JP4981479 A JP 4981479A JP 4981479 A JP4981479 A JP 4981479A JP S55141780 A JPS55141780 A JP S55141780A
- Authority
- JP
- Japan
- Prior art keywords
- film
- mixed crystal
- crystal ratio
- substrate
- alxga1
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
- H01S5/4031—Edge-emitting structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1028—Coupling to elements in the cavity, e.g. coupling to waveguides adjacent the active region, e.g. forward coupled [DFC] structures
- H01S5/1032—Coupling to elements comprising an optical axis that is not aligned with the optical axis of the active region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/125—Distributed Bragg reflector [DBR] lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
- H01S5/4031—Edge-emitting structures
- H01S5/4056—Edge-emitting structures emitting light in more than one direction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
- H01S5/4087—Array arrangements, e.g. constituted by discrete laser diodes or laser bar emitting more than one wavelength
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
- Led Devices (AREA)
Abstract
PURPOSE:To form more than two LDs having separate wavelengths on one substrate by forming an active layer partially on an AlXGa1-XAs film varying in one direction in mixed crystal ratio X and a plurality of semiconductor lasers having vertical varying direction of X in resonance axial direction. CONSTITUTION:An n-type Al0.35Ga0.65As film 12 is formed on an n-type GaAs substrate 11, molecular beam is irradiated thereto, and an AlXGa1-XAs film 16 increasing gradually in the mixed crystal ratio X in X direction uniformly in Y direction is grown thereon. Then, with the film 16 as an active layer a p-type Al0.35Ga0.65As film 17 and a p-type GaAs film 18 are laminated thereon, and an AlXGa1-XAs multilayer film substrate of double hetero architecture varying in mixed crystal ratio X of AlAs in the film 16 is provided. The film 16 has uniform mixed crystal ratio X in Y direction and veries from 0-0.1 in X direction in single mode. Then, inter- element isolation grooves 21-25 are formed at equal interval as extented in Y direction reaching the film 12 are formed on a multilayer film substrate, and electrodes 41-45 are formed thereon.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4981479A JPS55141780A (en) | 1979-04-24 | 1979-04-24 | Multiple wavelength integrated semiconductor laser array |
US06/142,743 US4318058A (en) | 1979-04-24 | 1980-04-22 | Semiconductor diode laser array |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4981479A JPS55141780A (en) | 1979-04-24 | 1979-04-24 | Multiple wavelength integrated semiconductor laser array |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55141780A true JPS55141780A (en) | 1980-11-05 |
Family
ID=12841582
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4981479A Pending JPS55141780A (en) | 1979-04-24 | 1979-04-24 | Multiple wavelength integrated semiconductor laser array |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55141780A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57133691A (en) * | 1981-02-10 | 1982-08-18 | Matsushita Electric Ind Co Ltd | Semiconductor device and manufacture thereof |
JPS58190089A (en) * | 1982-04-08 | 1983-11-05 | ヌルデイン・ブアドマ | Method of producing semiconductor laser with plural independent wavelengths and lasers made by same method |
JPS61187268A (en) * | 1985-02-14 | 1986-08-20 | Matsushita Electric Ind Co Ltd | Photoelectric conversion integrated circuit |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52155078A (en) * | 1976-06-18 | 1977-12-23 | Toshiba Corp | Semiconductor light emitting device |
JPS5321589A (en) * | 1976-08-12 | 1978-02-28 | Gni I Puroekutonui I Redokomet | Hetero junction semiconductor device and method of producing same |
-
1979
- 1979-04-24 JP JP4981479A patent/JPS55141780A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52155078A (en) * | 1976-06-18 | 1977-12-23 | Toshiba Corp | Semiconductor light emitting device |
JPS5321589A (en) * | 1976-08-12 | 1978-02-28 | Gni I Puroekutonui I Redokomet | Hetero junction semiconductor device and method of producing same |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57133691A (en) * | 1981-02-10 | 1982-08-18 | Matsushita Electric Ind Co Ltd | Semiconductor device and manufacture thereof |
JPS58190089A (en) * | 1982-04-08 | 1983-11-05 | ヌルデイン・ブアドマ | Method of producing semiconductor laser with plural independent wavelengths and lasers made by same method |
JPS61187268A (en) * | 1985-02-14 | 1986-08-20 | Matsushita Electric Ind Co Ltd | Photoelectric conversion integrated circuit |
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