JPS55141778A - Semiconductor laser and manufacturing the same - Google Patents
Semiconductor laser and manufacturing the sameInfo
- Publication number
- JPS55141778A JPS55141778A JP4952079A JP4952079A JPS55141778A JP S55141778 A JPS55141778 A JP S55141778A JP 4952079 A JP4952079 A JP 4952079A JP 4952079 A JP4952079 A JP 4952079A JP S55141778 A JPS55141778 A JP S55141778A
- Authority
- JP
- Japan
- Prior art keywords
- thickness
- groove
- clad layer
- light
- semiconductor laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2232—Buried stripe structure with inner confining structure between the active layer and the lower electrode
- H01S5/2234—Buried stripe structure with inner confining structure between the active layer and the lower electrode having a structured substrate surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2237—Buried stripe structure with a non-planar active layer
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To oscillate a semiconductor laser in circular spot state without occuring a mode variation by forming a clad layer increased partially in thickness between the light emitting active region and a light absorbing region. CONSTITUTION:A ridge 11 having a groove 10 of 10mum wide is formed along the cavity surface using a solution containing H2O:H2O2:H2SO4=8:8:1 on an n-type GaAs substrate 1. Then, an n-type Ga1-xAlXAs layers 3 having thickness of 0.3mum and 1.5mum on the ridge and on the other flat surface containing a groove 10, respectively. Subsequently, a Ga1-YAlYAs active region layer 4 having a thickness of 0.1mum is formed thereon. Since the clad layer 4 having a thickness of 0.1mum is formed thereon. Since the clad layer 3 has a sufficient thickness for enclosing the light only at the portion of the groove 10, the oscillation light to be irradiated from the portion except the groove 10 is absorbed to the substrate 1, so that only single substrate mode is oscillated.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4952079A JPS55141778A (en) | 1979-04-20 | 1979-04-20 | Semiconductor laser and manufacturing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4952079A JPS55141778A (en) | 1979-04-20 | 1979-04-20 | Semiconductor laser and manufacturing the same |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55141778A true JPS55141778A (en) | 1980-11-05 |
Family
ID=12833403
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4952079A Pending JPS55141778A (en) | 1979-04-20 | 1979-04-20 | Semiconductor laser and manufacturing the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55141778A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5957487A (en) * | 1982-09-27 | 1984-04-03 | Mitsubishi Electric Corp | Semiconductor laser device |
-
1979
- 1979-04-20 JP JP4952079A patent/JPS55141778A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5957487A (en) * | 1982-09-27 | 1984-04-03 | Mitsubishi Electric Corp | Semiconductor laser device |
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