JPS55130173A - Insulated gate field effect transistor - Google Patents
Insulated gate field effect transistorInfo
- Publication number
- JPS55130173A JPS55130173A JP3752379A JP3752379A JPS55130173A JP S55130173 A JPS55130173 A JP S55130173A JP 3752379 A JP3752379 A JP 3752379A JP 3752379 A JP3752379 A JP 3752379A JP S55130173 A JPS55130173 A JP S55130173A
- Authority
- JP
- Japan
- Prior art keywords
- region
- diffused
- gate
- type
- effect transistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/64—Double-diffused metal-oxide semiconductor [DMOS] FETs
- H10D30/66—Vertical DMOS [VDMOS] FETs
- H10D30/664—Inverted VDMOS transistors, i.e. source-down VDMOS transistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/611—Insulated-gate field-effect transistors [IGFET] having multiple independently-addressable gate electrodes influencing the same channel
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/64—Double-diffused metal-oxide semiconductor [DMOS] FETs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/64—Double-diffused metal-oxide semiconductor [DMOS] FETs
- H10D30/66—Vertical DMOS [VDMOS] FETs
- H10D30/668—Vertical DMOS [VDMOS] FETs having trench gate electrodes, e.g. UMOS transistors
Landscapes
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3752379A JPS55130173A (en) | 1979-03-29 | 1979-03-29 | Insulated gate field effect transistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3752379A JPS55130173A (en) | 1979-03-29 | 1979-03-29 | Insulated gate field effect transistor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55130173A true JPS55130173A (en) | 1980-10-08 |
JPS6152591B2 JPS6152591B2 (enrdf_load_stackoverflow) | 1986-11-13 |
Family
ID=12499895
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3752379A Granted JPS55130173A (en) | 1979-03-29 | 1979-03-29 | Insulated gate field effect transistor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55130173A (enrdf_load_stackoverflow) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6780713B2 (en) | 2001-06-29 | 2004-08-24 | Atmel Germany Gmbh | Process for manufacturing a DMOS transistor |
US6806131B2 (en) | 2001-06-29 | 2004-10-19 | Atmel Germany Gmbh | Process for manufacturing a DMOS transistor |
US6878603B2 (en) | 2001-06-29 | 2005-04-12 | Atmel Germany Gmbh | Process for manufacturing a DMOS transistor |
US6933215B2 (en) | 2001-06-29 | 2005-08-23 | Atmel Germany Gmbh | Process for doping a semiconductor body |
US7064385B2 (en) | 2003-09-19 | 2006-06-20 | Atmel Germany Gmbh | DMOS-transistor with lateral dopant gradient in drift region and method of producing the same |
CN102637722A (zh) * | 2011-02-12 | 2012-08-15 | 飞思卡尔半导体公司 | 半导体器件及相关制作方法 |
WO2012106833A1 (en) | 2011-02-12 | 2012-08-16 | Freescale Semiconductor, Inc. Are | Semiconductor device and related fabrication methods |
CN103489864A (zh) * | 2012-06-13 | 2014-01-01 | 株式会社东芝 | 功率用半导体装置 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61129699U (enrdf_load_stackoverflow) * | 1985-02-01 | 1986-08-14 |
-
1979
- 1979-03-29 JP JP3752379A patent/JPS55130173A/ja active Granted
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6780713B2 (en) | 2001-06-29 | 2004-08-24 | Atmel Germany Gmbh | Process for manufacturing a DMOS transistor |
US6806131B2 (en) | 2001-06-29 | 2004-10-19 | Atmel Germany Gmbh | Process for manufacturing a DMOS transistor |
US6878603B2 (en) | 2001-06-29 | 2005-04-12 | Atmel Germany Gmbh | Process for manufacturing a DMOS transistor |
US6933215B2 (en) | 2001-06-29 | 2005-08-23 | Atmel Germany Gmbh | Process for doping a semiconductor body |
US7064385B2 (en) | 2003-09-19 | 2006-06-20 | Atmel Germany Gmbh | DMOS-transistor with lateral dopant gradient in drift region and method of producing the same |
CN102637722A (zh) * | 2011-02-12 | 2012-08-15 | 飞思卡尔半导体公司 | 半导体器件及相关制作方法 |
WO2012106833A1 (en) | 2011-02-12 | 2012-08-16 | Freescale Semiconductor, Inc. Are | Semiconductor device and related fabrication methods |
JP2014508408A (ja) * | 2011-02-12 | 2014-04-03 | フリースケール セミコンダクター インコーポレイテッド | 半導体装置及び関連する製造方法 |
TWI557807B (zh) * | 2011-02-12 | 2016-11-11 | 飛思卡爾半導體公司 | 半導體裝置及相關製造方法 |
EP2673806A4 (en) * | 2011-02-12 | 2017-12-06 | NXP USA, Inc. | Semiconductor device and related fabrication methods |
CN103489864A (zh) * | 2012-06-13 | 2014-01-01 | 株式会社东芝 | 功率用半导体装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS6152591B2 (enrdf_load_stackoverflow) | 1986-11-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS6450554A (en) | Manufacture of complementary semiconductor device | |
JPS6442176A (en) | Semiconductor device and manufacture thereof | |
GB1423183A (en) | Complemenatry field effect transistors | |
GB1529023A (en) | Self-aligned cmos process for bulk silicon device | |
GB1488151A (en) | Field effect devices | |
GB1451096A (en) | Semiconductor devices | |
GB1442693A (en) | Method of manufacturing a junction field effect transistor | |
GB1210090A (en) | Insulated gate field effect transistor | |
JPS5232277A (en) | Insulated gate type field-effect transistor | |
JPS55130173A (en) | Insulated gate field effect transistor | |
JPS55151363A (en) | Mos semiconductor device and fabricating method of the same | |
JPS5458386A (en) | Mos semiconductor device | |
JPS55130171A (en) | Mos field effect transistor | |
GB1499548A (en) | Process for fabricating complementary insulated gate field effect transistor structure and the structure fabricated by the process | |
JPS55148466A (en) | Cmos semiconductor device and its manufacture | |
JPS5640280A (en) | Mos transistor | |
JPS5723259A (en) | Complementary type mos semiconductor device | |
JPS54107270A (en) | Semiconductor device and its production | |
GB1045429A (en) | Transistors | |
JPS5654071A (en) | Insulated gate field-effect transistor | |
JPS55166965A (en) | Junction type fet | |
JPS572579A (en) | Manufacture of junction type field effect transistor | |
JPS5546585A (en) | Complementary insulated gate field effect semiconductor device | |
JPS5636165A (en) | Insulated gate type field-effect transistor | |
JPS5499578A (en) | Field effect transistor |