JPS55123165A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS55123165A JPS55123165A JP3090179A JP3090179A JPS55123165A JP S55123165 A JPS55123165 A JP S55123165A JP 3090179 A JP3090179 A JP 3090179A JP 3090179 A JP3090179 A JP 3090179A JP S55123165 A JPS55123165 A JP S55123165A
- Authority
- JP
- Japan
- Prior art keywords
- regions
- region
- type
- thyristor
- junctions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 238000009792 diffusion process Methods 0.000 abstract 1
- 230000005669 field effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/1012—Base regions of thyristors
- H01L29/102—Cathode base regions of thyristors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/74—Thyristor-type devices, e.g. having four-zone regenerative action
- H01L29/744—Gate-turn-off devices
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Thyristors (AREA)
- Junction Field-Effect Transistors (AREA)
Abstract
PURPOSE:To obtain a thyristor, thermally stable and capable of operating at high speed, by providing a region having the effect of a field effect transistor in a thyristor structure. CONSTITUTION:An n<->-type base region 2 is formed on a p<+>-type semiconductor substrate 1, which is to become an anode region. Further, on top of this, a p-type base region 3 is provided. A plurality of n<+>-type emitter regions 4 are formed inside this by diffusion, pn-junctions J2 and J3 are formed respectively between regions 2 and 3 and between regions 3 and 4, thereby forming a thyristor. In this structure, a plurality of p-type regions 8 are provided in a similar manner in the region 3 extending to the boundary between regions 2 and 3 and opposite the gaps of regions 4, forming pn-junctions J4 with the layer 2. In this way, bipolar type transistor 100 is formed of regions 4, 3, 2, and FET element 101 is formed of the part of region 2 adjacent to region 3, regions 8, and the part of region 2 adjacent to substrate 1. By this, neither current concentration nor thermal runaway occurs.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3090179A JPS6013310B2 (en) | 1979-03-15 | 1979-03-15 | semiconductor equipment |
CA000347701A CA1135875A (en) | 1979-03-15 | 1980-03-14 | Thyristor type semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3090179A JPS6013310B2 (en) | 1979-03-15 | 1979-03-15 | semiconductor equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55123165A true JPS55123165A (en) | 1980-09-22 |
JPS6013310B2 JPS6013310B2 (en) | 1985-04-06 |
Family
ID=12316625
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3090179A Expired JPS6013310B2 (en) | 1979-03-15 | 1979-03-15 | semiconductor equipment |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS6013310B2 (en) |
CA (1) | CA1135875A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5895866A (en) * | 1981-12-02 | 1983-06-07 | Hitachi Ltd | Optical trigger switching element |
US7816706B2 (en) | 2005-07-22 | 2010-10-19 | Abb Technology Ag | Power semiconductor device |
CN101901832A (en) * | 2010-06-28 | 2010-12-01 | 启东吉莱电子有限公司 | Controlled silicon punchthrough structure formed by gallium diffusion and production method thereof |
-
1979
- 1979-03-15 JP JP3090179A patent/JPS6013310B2/en not_active Expired
-
1980
- 1980-03-14 CA CA000347701A patent/CA1135875A/en not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5895866A (en) * | 1981-12-02 | 1983-06-07 | Hitachi Ltd | Optical trigger switching element |
JPH026232B2 (en) * | 1981-12-02 | 1990-02-08 | Hitachi Ltd | |
US7816706B2 (en) | 2005-07-22 | 2010-10-19 | Abb Technology Ag | Power semiconductor device |
CN101901832A (en) * | 2010-06-28 | 2010-12-01 | 启东吉莱电子有限公司 | Controlled silicon punchthrough structure formed by gallium diffusion and production method thereof |
Also Published As
Publication number | Publication date |
---|---|
JPS6013310B2 (en) | 1985-04-06 |
CA1135875A (en) | 1982-11-16 |
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