JPS551186A - Electron beam exposure apparatus - Google Patents

Electron beam exposure apparatus

Info

Publication number
JPS551186A
JPS551186A JP4909479A JP4909479A JPS551186A JP S551186 A JPS551186 A JP S551186A JP 4909479 A JP4909479 A JP 4909479A JP 4909479 A JP4909479 A JP 4909479A JP S551186 A JPS551186 A JP S551186A
Authority
JP
Japan
Prior art keywords
electron beam
magnetic field
projection means
exposure apparatus
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4909479A
Other languages
Japanese (ja)
Inventor
Tadahiro Takigawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP4909479A priority Critical patent/JPS551186A/en
Publication of JPS551186A publication Critical patent/JPS551186A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To adjust the rotation of the beam with a simple construction by a magnetic field generating means for generating forward and reverse magnetic field with respect to the direction of the electron beam using two magnets in a scanning electron beam exposure apparatus. CONSTITUTION:A non-rotary electronic lens is composed of an electron beam projection means for projecting the electron beam to the optical axis comprising coils 2 and 3 and a DC power source 5a and pole pieces 7 to 10 which are adapted to form an electron lens on which the electron beam forms an image after projected from the projection means. Deflecting plates 26a and 26b are arranged between a rectangular aperture 32 and the electronic lens 23 and 24 to deflect the electron beam between the projection means and the lenses. A magnetic field is generated toward the electronic lenses 23 and 24 in the forward or reverse direction with respect to the electron beam. Information from a detector 12 is applied to an calculator 16 through an amplifier 14 and the output of the calculator 16 controls the deflecting plates 26a and 26b to adjust the rotation of the beam.
JP4909479A 1979-04-23 1979-04-23 Electron beam exposure apparatus Pending JPS551186A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4909479A JPS551186A (en) 1979-04-23 1979-04-23 Electron beam exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4909479A JPS551186A (en) 1979-04-23 1979-04-23 Electron beam exposure apparatus

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP3418176A Division JPS52117574A (en) 1976-03-30 1976-03-30 Electronic beam exposure unit

Publications (1)

Publication Number Publication Date
JPS551186A true JPS551186A (en) 1980-01-07

Family

ID=12821501

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4909479A Pending JPS551186A (en) 1979-04-23 1979-04-23 Electron beam exposure apparatus

Country Status (1)

Country Link
JP (1) JPS551186A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4400622A (en) * 1980-01-30 1983-08-23 Nippon Telegraph & Telephone Public Corporation Electron lens equipment
US4577111A (en) * 1982-07-28 1986-03-18 Hitachi, Ltd. Apparatus for electron beam lithography
US5587074A (en) * 1995-02-17 1996-12-24 H-Tech, Inc. Fluid filter with enhanced backflush flow

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4400622A (en) * 1980-01-30 1983-08-23 Nippon Telegraph & Telephone Public Corporation Electron lens equipment
US4577111A (en) * 1982-07-28 1986-03-18 Hitachi, Ltd. Apparatus for electron beam lithography
US5587074A (en) * 1995-02-17 1996-12-24 H-Tech, Inc. Fluid filter with enhanced backflush flow

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